JP3929635B2 - 露光方法 - Google Patents

露光方法 Download PDF

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Publication number
JP3929635B2
JP3929635B2 JP06070899A JP6070899A JP3929635B2 JP 3929635 B2 JP3929635 B2 JP 3929635B2 JP 06070899 A JP06070899 A JP 06070899A JP 6070899 A JP6070899 A JP 6070899A JP 3929635 B2 JP3929635 B2 JP 3929635B2
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JP
Japan
Prior art keywords
magnification
linear error
error
reticle
linear
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP06070899A
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English (en)
Japanese (ja)
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JP2000260689A (ja
JP2000260689A5 (enExample
Inventor
帥現 姜
巌 東川
壮一 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
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Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP06070899A priority Critical patent/JP3929635B2/ja
Priority to US09/520,630 priority patent/US6542237B1/en
Publication of JP2000260689A publication Critical patent/JP2000260689A/ja
Publication of JP2000260689A5 publication Critical patent/JP2000260689A5/ja
Application granted granted Critical
Publication of JP3929635B2 publication Critical patent/JP3929635B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP06070899A 1999-03-08 1999-03-08 露光方法 Expired - Fee Related JP3929635B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP06070899A JP3929635B2 (ja) 1999-03-08 1999-03-08 露光方法
US09/520,630 US6542237B1 (en) 1999-03-08 2000-03-07 Exposure method for making precision patterns on a substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP06070899A JP3929635B2 (ja) 1999-03-08 1999-03-08 露光方法

Publications (3)

Publication Number Publication Date
JP2000260689A JP2000260689A (ja) 2000-09-22
JP2000260689A5 JP2000260689A5 (enExample) 2005-06-30
JP3929635B2 true JP3929635B2 (ja) 2007-06-13

Family

ID=13150070

Family Applications (1)

Application Number Title Priority Date Filing Date
JP06070899A Expired - Fee Related JP3929635B2 (ja) 1999-03-08 1999-03-08 露光方法

Country Status (2)

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US (1) US6542237B1 (enExample)
JP (1) JP3929635B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002224604A (ja) * 2001-01-31 2002-08-13 Hitachi Ltd パターン転写装置，パターン転写方法および転写用原版の製造方法
US7171637B2 (en) * 2005-01-14 2007-01-30 Intel Corporation Translation generation for a mask pattern
JP2017090817A (ja) * 2015-11-16 2017-05-25 キヤノン株式会社 露光装置、及び物品の製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4918320A (en) 1987-03-20 1990-04-17 Canon Kabushiki Kaisha Alignment method usable in a step-and-repeat type exposure apparatus for either global or dye-by-dye alignment
US5243195A (en) * 1991-04-25 1993-09-07 Nikon Corporation Projection exposure apparatus having an off-axis alignment system and method of alignment therefor
US5798195A (en) * 1993-09-24 1998-08-25 Nikon Corporation Stepping accuracy measuring method
KR100377887B1 (ko) * 1994-02-10 2003-06-18 가부시키가이샤 니콘 정렬방법
JPH07260472A (ja) * 1994-03-22 1995-10-13 Nikon Corp ステージ装置の直交度測定方法
JPH0845814A (ja) * 1994-07-27 1996-02-16 Nikon Corp 露光装置および位置決め方法
JP3261948B2 (ja) * 1995-03-28 2002-03-04 キヤノン株式会社 Ｘ線露光用マスク及びそれを用いた半導体素子の製造方法
KR100471461B1 (ko) * 1996-05-16 2005-07-07 가부시키가이샤 니콘 노광방법및노광장치
WO2000019497A1 (en) * 1998-09-30 2000-04-06 Nikon Corporation Alignment method and method for producing device using the alignment method
JP3751762B2 (ja) * 1998-12-08 2006-03-01 株式会社東芝 半導体装置の製造方法および原板
JP3831138B2 (ja) * 1999-01-28 2006-10-11 株式会社東芝 パターン形成方法

Also Published As

Publication number Publication date
US6542237B1 (en) 2003-04-01
JP2000260689A (ja) 2000-09-22

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