JPH09330862A5 - - Google Patents

Info

Publication number
JPH09330862A5
JPH09330862A5 JP1996145729A JP14572996A JPH09330862A5 JP H09330862 A5 JPH09330862 A5 JP H09330862A5 JP 1996145729 A JP1996145729 A JP 1996145729A JP 14572996 A JP14572996 A JP 14572996A JP H09330862 A5 JPH09330862 A5 JP H09330862A5
Authority
JP
Japan
Prior art keywords
adjusting
reference plate
exposure apparatus
check pattern
apparatus adjustment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996145729A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09330862A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8145729A priority Critical patent/JPH09330862A/ja
Priority claimed from JP8145729A external-priority patent/JPH09330862A/ja
Publication of JPH09330862A publication Critical patent/JPH09330862A/ja
Publication of JPH09330862A5 publication Critical patent/JPH09330862A5/ja
Pending legal-status Critical Current

Links

JP8145729A 1996-06-07 1996-06-07 露光装置の調整方法 Pending JPH09330862A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8145729A JPH09330862A (ja) 1996-06-07 1996-06-07 露光装置の調整方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8145729A JPH09330862A (ja) 1996-06-07 1996-06-07 露光装置の調整方法

Publications (2)

Publication Number Publication Date
JPH09330862A JPH09330862A (ja) 1997-12-22
JPH09330862A5 true JPH09330862A5 (enExample) 2004-12-24

Family

ID=15391794

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8145729A Pending JPH09330862A (ja) 1996-06-07 1996-06-07 露光装置の調整方法

Country Status (1)

Country Link
JP (1) JPH09330862A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2008139955A1 (ja) * 2007-05-07 2010-08-05 株式会社目白プレシジョン 投影露光方法、アライメント方法及び投影露光装置
JP4661840B2 (ja) * 2007-08-02 2011-03-30 セイコーエプソン株式会社 アライメントマスクおよびドット位置認識方法
US7999920B2 (en) 2007-08-22 2011-08-16 Asml Netherlands B.V. Method of performing model-based scanner tuning
JP5583791B2 (ja) * 2010-02-19 2014-09-03 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びデバイス製造方法
JP6860353B2 (ja) * 2017-01-18 2021-04-14 キヤノン株式会社 評価方法、物品製造方法およびプログラム

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3229118B2 (ja) * 1993-04-26 2001-11-12 三菱電機株式会社 積層型半導体装置のパターン形成方法

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