JPH09330862A - 露光装置の調整方法 - Google Patents

露光装置の調整方法

Info

Publication number
JPH09330862A
JPH09330862A JP8145729A JP14572996A JPH09330862A JP H09330862 A JPH09330862 A JP H09330862A JP 8145729 A JP8145729 A JP 8145729A JP 14572996 A JP14572996 A JP 14572996A JP H09330862 A JPH09330862 A JP H09330862A
Authority
JP
Japan
Prior art keywords
exposure apparatus
reference plate
parameter
substrate
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8145729A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09330862A5 (enExample
Inventor
Muneyasu Yokota
宗泰 横田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8145729A priority Critical patent/JPH09330862A/ja
Publication of JPH09330862A publication Critical patent/JPH09330862A/ja
Publication of JPH09330862A5 publication Critical patent/JPH09330862A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP8145729A 1996-06-07 1996-06-07 露光装置の調整方法 Pending JPH09330862A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8145729A JPH09330862A (ja) 1996-06-07 1996-06-07 露光装置の調整方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8145729A JPH09330862A (ja) 1996-06-07 1996-06-07 露光装置の調整方法

Publications (2)

Publication Number Publication Date
JPH09330862A true JPH09330862A (ja) 1997-12-22
JPH09330862A5 JPH09330862A5 (enExample) 2004-12-24

Family

ID=15391794

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8145729A Pending JPH09330862A (ja) 1996-06-07 1996-06-07 露光装置の調整方法

Country Status (1)

Country Link
JP (1) JPH09330862A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008046628A (ja) * 2007-08-02 2008-02-28 Seiko Epson Corp アライメントマスクおよびドット位置認識方法
WO2008139955A1 (ja) * 2007-05-07 2008-11-20 Mejiro Precision, Inc. 投影露光方法、アライメント方法及び投影露光装置
JP2009049412A (ja) * 2007-08-22 2009-03-05 Brion Technologies Inc モデルベーススキャナ調整を実行する方法
JP2013520020A (ja) * 2010-02-19 2013-05-30 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びデバイス製造方法
KR20180085353A (ko) * 2017-01-18 2018-07-26 캐논 가부시끼가이샤 평가 방법, 물품 제조 방법 및 프로그램

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0794405A (ja) * 1993-04-26 1995-04-07 Mitsubishi Electric Corp 積層型半導体装置のパターン形成方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0794405A (ja) * 1993-04-26 1995-04-07 Mitsubishi Electric Corp 積層型半導体装置のパターン形成方法

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2008139955A1 (ja) * 2007-05-07 2010-08-05 株式会社目白プレシジョン 投影露光方法、アライメント方法及び投影露光装置
WO2008139955A1 (ja) * 2007-05-07 2008-11-20 Mejiro Precision, Inc. 投影露光方法、アライメント方法及び投影露光装置
JP2008046628A (ja) * 2007-08-02 2008-02-28 Seiko Epson Corp アライメントマスクおよびドット位置認識方法
US9921485B2 (en) 2007-08-22 2018-03-20 Asml Netherlands B.V. Method of performing model-based scanner tuning
US7999920B2 (en) 2007-08-22 2011-08-16 Asml Netherlands B.V. Method of performing model-based scanner tuning
JP2011193022A (ja) * 2007-08-22 2011-09-29 Asml Netherlands Bv モデルベーススキャナ調整を実行する方法
US9158208B2 (en) 2007-08-22 2015-10-13 Asml Netherlands B.V. Method of performing model-based scanner tuning
JP2009049412A (ja) * 2007-08-22 2009-03-05 Brion Technologies Inc モデルベーススキャナ調整を実行する方法
US10795266B2 (en) 2007-08-22 2020-10-06 Asml Netherlands B.V. Method of performing model-based scanner tuning
US11372337B2 (en) 2007-08-22 2022-06-28 Asml Netherlands B.V. Method of performing model-based scanner tuning
JP2013520020A (ja) * 2010-02-19 2013-05-30 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びデバイス製造方法
US8687167B2 (en) 2010-02-19 2014-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR20180085353A (ko) * 2017-01-18 2018-07-26 캐논 가부시끼가이샤 평가 방법, 물품 제조 방법 및 프로그램
JP2018116155A (ja) * 2017-01-18 2018-07-26 キヤノン株式会社 評価方法、物品製造方法およびプログラム

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