JP2814660B2 - 半導体装置のボンディング用金合金線 - Google Patents
半導体装置のボンディング用金合金線Info
- Publication number
- JP2814660B2 JP2814660B2 JP2054610A JP5461090A JP2814660B2 JP 2814660 B2 JP2814660 B2 JP 2814660B2 JP 2054610 A JP2054610 A JP 2054610A JP 5461090 A JP5461090 A JP 5461090A JP 2814660 B2 JP2814660 B2 JP 2814660B2
- Authority
- JP
- Japan
- Prior art keywords
- gold alloy
- bonding
- alloy wire
- wire
- loop
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L24/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/4501—Shape
- H01L2224/45012—Cross-sectional shape
- H01L2224/45015—Cross-sectional shape being circular
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- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/45144—Gold (Au) as principal constituent
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- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
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- H01L2224/484—Connecting portions
- H01L2224/48463—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
- H01L2224/48465—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
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- H01L2924/20—Parameters
- H01L2924/207—Diameter ranges
- H01L2924/20752—Diameter ranges larger or equal to 20 microns less than 30 microns
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Wire Bonding (AREA)
Description
用い、例えば140〜180μmの低いループ高さで半導体素
子と外部リードとのボンディングを行なった場合にも、
特にループ高さのバラツキを著しく抑制することができ
る金合金線に関するものである。
れる通りの、 La,Ce,Pr,Nd、およびSmからなるセリウム族希土類元
素のうちの1種または2種以上:3〜100ppm、 Ca,Be、およびGeのうちの1種または2種以上:1〜60p
pm、 を含有し、残りがAuと不可避不純物からなる組成を有す
る半導体装置のボンディング用金合金線を提案した。
いICカードや、VSOPおよびTSOPなどの薄型パッケージの
普及はめざましく、これには、例えば140〜180μmとい
った低いループ高さでのボンディングが要求されるが、
上記の従来金合金線はじめ、その他多くの従来金合金線
の場合、これを薄型パッケージのボンディングワイヤと
して用いた場合、ループ高さのバラツキを小さくするこ
とができず、この結果樹脂モールド後のパッケージ表面
へのループ露出がしばしば発生し、高い製品歩留りを確
保することができないのが現状である。
低いループ高さが要求される薄型パッケージのボンディ
ングワイヤとして用いた場合、ボンディング後のループ
高さのバラツキを小さくすることができる金合金線を開
発すべく、上記の従来金合金線に着目し研究を行なった
結果、上記の従来金合金線に、合金成分として、 B,Ni,Fe,Co,TiおよびZrのうちの1種または2種以上:
1〜100ppm、を含有させると、この結果の金合金線は、
結晶粒径が均一化するので、低いループ高さを維持しつ
つ、ループ高さのバラツキが著しく抑制されるようにな
り、さらに高温強度、ボンディング後のループ変形の有
無、および樹脂モールド時のトレープ流れについては上
記従来金合金線と同等のすぐれた性質を具備するという
研究結果を得たのである。
であって、 La,Ce,Pr,Nd、およびSmからなるセリウム族希土類元
素のうちの1種または2種以上:1〜100ppm、 CaおよびBeのうちの1種または2種:1〜100ppm、 B,NI,Fe,Co,TiおよびZrのうちの1種または2種以上:
1〜100ppm、 を含有し、残りがAuと不可避不純物からなる組成を有す
る半導体装置のボンディング用金合金線に特徴を有する
ものである。
に限定した理由を説明する。
せる作用があるが、その含有量が1ppm未満では所望の強
度向上効果が得られず、一方その含有量が100ppmを越え
ると線が脆化するようになることから、その含有量を1
〜100ppmと定めた。
おいて、線の軟化温度を高め、もってボンディング時の
線自体の脆化および変形ループの発生、さらに樹脂モー
ルド時のループ流れを抑制すると共に、ボンディングの
接合強度を高め、さらに常温および高温強度を一段と向
上させる作用があるが、その含有量が1ppm未満では前記
作用に所望の効果が得られず、一方その含有量が100ppm
を越えると、脆化して線引加工性などが劣化するように
なるばかりでなく、ボンディング時の加熱温度で結晶粒
界破断を起し易くなることから、その含有量を1〜100p
pmと定めた。
と、Ca,Beとの共存において、線の結晶粒径を均一化
し、これによって低いループ高さを維持しつつ、ループ
高さのバラツキが著しく抑制されるようになる作用を発
揮するが、その含有量が1ppm未満では前記作用に所望の
効果が得られず、一方その含有量が100ppmを越えると、
脆化して線引加工性などが低下すようになることから、
その含有量を1〜100ppmと定めた。
説明する。
成をもった溶湯を調製し、鋳造した後、公知の溝型圧延
機を用いて圧延し、引続いて線引加工を行なうことによ
り、直径:0.025mmを有する本発明金合金線1〜4および
従来金合金線1〜13をそれぞれ製造した。
線がボンディング時にさらされる条件に相当する条件、
すなわち250℃に20秒間保持した条件で高温引張試験を
行ない、破断強度と伸びを測定し、高温強度を評価し
た。
用い、高速自動ボンダにて、特に薄型パッケージに対応
させる目的で、ループ高さを140〜180μmに低くした状
態でボンディングを行ない、ループ高さ、ループ高さの
バラツキ、ループ変形の有無、および樹脂モールド後の
ループ流れ量をそれぞれ測定した。これらの測定結果を
第2表に示した。
に、半導体素子Sと外部リードLを金合金線Wでボンデ
ィングした場合のhをz軸測微計を用いて測定し、80個
の測定値の平均値をもって表わし、ループ高さのバラツ
キは、前記の80個のループ高さ測定値より標準偏差を求
め、3σの値で表わした。
線Wを顕微鏡を用いて観察し、第1図に点線で示される
ように金合金線が垂れ下がって半導体素子Sのエッジに
接触(エッジショート)している場合を「有」とし、接
触していない場合を「無」として判定した。
Wを直上からX線撮影し、この結果のX線写真にもとづ
いて4つのコーナー部における半導体素子と外部リード
のボンディング点を結んだ直線に対する金合金線の最大
膨量を測定し、これらの平均値をもって表わした。
金線1〜4は、いずれも140〜180μmの低いループ高さ
でのループ高さのバラツキが、従来金合金線1〜13に比
してきわめて小さく、かつ従来金合金線1〜13と同等の
高い高温強度をもち、さらに同じくループ変形の発生が
なく、樹脂モールド時のループ流れ量もきわめて小さ
く、現在許容最大値といわれている100μmより小さい
値を示したいることが明らかである。
装置のうち、特に低いループ高さが要求される薄肉パッ
ケージのボンディングワイヤとして用いた場合、ループ
高さのバラツキがきわめて小さいので、樹脂モールド後
のパッケージ表面にループが露出することがなく、さら
に高い高温強度をもつと共に、ボンディング時のループ
変形の発生がなく、かつ樹脂モールド時のループ流れも
小さいので、タブショートやエッジショートなどの不良
発生も著しく抑制されるようになることと合まって、製
品不良が激減し、歩留りの飛躍的向上をはかることがで
きるなど工業上有用な特性を有するのである。
ある。 S……半導体素子、L……外部リード W……金合金線
Claims (1)
- 【請求項1】La,Ce,Pr,Nd、およびSmからなるセリウム
族希土類元素のうちの1種または2種以上:1〜100ppm、 CaおよびBeのうちの1種または2種:1〜100ppm、 B,Ni,Fe,Co,TiおよびZrのうちの1種または2種以上:1
〜100ppm、 を含有し、残りがAuと不可避不純物からなる組成を有す
ることを特徴とする半導体装置のボンディング用金合金
線。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2054610A JP2814660B2 (ja) | 1990-03-06 | 1990-03-06 | 半導体装置のボンディング用金合金線 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2054610A JP2814660B2 (ja) | 1990-03-06 | 1990-03-06 | 半導体装置のボンディング用金合金線 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH03257129A JPH03257129A (ja) | 1991-11-15 |
JP2814660B2 true JP2814660B2 (ja) | 1998-10-27 |
Family
ID=12975511
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2054610A Expired - Fee Related JP2814660B2 (ja) | 1990-03-06 | 1990-03-06 | 半導体装置のボンディング用金合金線 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2814660B2 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7830008B2 (en) | 2005-01-24 | 2010-11-09 | Nippon Steel Materials Co., Ltd. | Gold wire for connecting semiconductor chip |
US8440137B2 (en) | 2004-11-26 | 2013-05-14 | Tanaka Denshi Kogyo K.K. | Au bonding wire for semiconductor device |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2780611B2 (ja) * | 1993-09-06 | 1998-07-30 | 三菱マテリアル株式会社 | 少量成分の合金化で硬質化した金装飾品材 |
KR100618052B1 (ko) * | 2003-04-14 | 2006-08-30 | 엠케이전자 주식회사 | 반도체 소자 본딩용 금 합금세선 |
JP3994113B2 (ja) * | 2004-09-30 | 2007-10-17 | 田中電子工業株式会社 | ワイヤバンプ |
JP5166738B2 (ja) | 2006-03-24 | 2013-03-21 | 新日鉄住金マテリアルズ株式会社 | 半導体素子接続用金線 |
CN100394592C (zh) * | 2006-07-11 | 2008-06-11 | 中国印钞造币总公司 | 一种键合金丝及其制造方法 |
JP5010495B2 (ja) * | 2007-02-06 | 2012-08-29 | 新日鉄マテリアルズ株式会社 | 半導体素子接続用金線 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6179741A (ja) * | 1984-09-27 | 1986-04-23 | Sumitomo Metal Mining Co Ltd | ボンデイングワイヤ− |
JPS62228440A (ja) * | 1986-03-28 | 1987-10-07 | Matsuda Kikinzoku Kogyo Kk | 半導体素子ボンデイング用金線 |
JPH0726167B2 (ja) * | 1986-06-09 | 1995-03-22 | 三菱マテリアル株式会社 | 半導体装置のボンデイングワイヤ用Au合金極細線 |
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1990
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8440137B2 (en) | 2004-11-26 | 2013-05-14 | Tanaka Denshi Kogyo K.K. | Au bonding wire for semiconductor device |
US7830008B2 (en) | 2005-01-24 | 2010-11-09 | Nippon Steel Materials Co., Ltd. | Gold wire for connecting semiconductor chip |
Also Published As
Publication number | Publication date |
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JPH03257129A (ja) | 1991-11-15 |
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