JP5010495B2 - 半導体素子接続用金線 - Google Patents
半導体素子接続用金線 Download PDFInfo
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- JP5010495B2 JP5010495B2 JP2008026050A JP2008026050A JP5010495B2 JP 5010495 B2 JP5010495 B2 JP 5010495B2 JP 2008026050 A JP2008026050 A JP 2008026050A JP 2008026050 A JP2008026050 A JP 2008026050A JP 5010495 B2 JP5010495 B2 JP 5010495B2
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Description
カルシウム、ランタン、セリウム、ベリリウム及びニッケルのうちから任意に選択した元素を含有した複数種類の金線を製造し、リーニング不良と圧着ボール形状とをそれぞれ評価した。
カルシウム、ランタン、ベリリウム、ニッケル、チタン及びバナジウムのうちから任意に選択した元素を含有した複数種類の金線を製造し、リーニング不良と圧着ボール形状とをそれぞれ評価した。
プラセオジウム、カルシウム、ランタン、ベリリウム、ニッケル、チタン及びバナジウムのうちから任意に選択した元素を含有した複数種類の金線を製造し、リーニング不良と圧着ボール形状とをそれぞれ評価した。
次に、インジウム、ガリウム及びパラジウムの添加効果について調べた。
次に、マグネシウム、ゲルマニウム、鉄、リチウム、鉛、銀、銅、白金の添加による影響を調べた。
2c、2d パッド
3c 圧着ボール
Claims (7)
- ニッケルの含有量が0.0007質量%以上0.005質量%以下、かつ、チタン及びバナジウムのうちいずれか一方又は両方の添加量が0.0005質量%以上0.005質量%以下、かつ、カルシウム及び希土類元素のうちから選ばれる1種以上の元素の含有量が0.0009質量%超0.02質量%以下であることを特徴とする半導体素子接続用金線。
- ニッケルの含有量が0.0007質量%以上0.007質量%以下、かつ、ベリリウムの含有量が0.0003質量%以上0.0008質量%以下、かつ、チタン及びバナジウムのうちいずれか一方又は両方の添加量が0.0005質量%以上0.005質量%以下、かつ、カルシウム及び希土類元素のうちから選ばれる1種以上の元素の含有量が0.0009質量%超0.02質量%以下であることを特徴とする半導体素子接続用金線。
- プラセオジウムを0.0016質量%以上0.02質量%以下含有することを特徴とする請求項1又は2に記載の半導体素子接続用金線。
- さらに、インジウム及びガリウムのうちいずれか一方又は両方を0.0005質量%以上0.005質量%以下含有することを特徴とする請求項1〜3のいずれかに記載の半導体素子接続用金線。
- パラジウムを0.001質量%以上2質量%以下含有することを特徴とする請求項1〜4のいずれかに記載の半導体素子接続用金線。
- さらに、マグネシウムを0.001質量%以上0.005質量%以下含有することを特徴とする請求項1〜5のいずれかに記載の半導体素子接続用金線。
- 線材を構成する個々の結晶粒の(111)面法線の1つが、線材の長さ方向に対して、15°以下の角度を有する結晶粒の割合が、全体に対して、断面面積比で50%以上を占める、長さ方向に<111>配向したことを特徴とする請求項1〜6のいずれかに記載の半導体素子接続用金線。
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TW201028227A (en) * | 2009-01-23 | 2010-08-01 | jun-de Li | Method for manufacturing composite metal wire and product thereof |
SG190370A1 (en) * | 2011-03-01 | 2013-06-28 | Tanaka Electronics Ind | Gold alloy bonding wire |
JP6416055B2 (ja) * | 2015-08-24 | 2018-10-31 | 三菱電機株式会社 | 半導体装置 |
SG11202109960TA (en) | 2019-03-13 | 2021-10-28 | Nippon Micrometal Corp | Bonding wire |
JP7377256B2 (ja) | 2019-03-13 | 2023-11-09 | 日鉄マイクロメタル株式会社 | Alボンディングワイヤ |
CN115280475A (zh) * | 2020-03-13 | 2022-11-01 | 日铁新材料股份有限公司 | Al接合线 |
CN112086365B (zh) * | 2020-09-02 | 2023-04-11 | 贵研铂业股份有限公司 | 一种提高超细金丝单根丝长度的方法及装置 |
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JPS5613740A (en) * | 1979-07-16 | 1981-02-10 | Tanaka Kikinzoku Kogyo Kk | Bonding wire for semiconductor element |
JPS63145729A (ja) * | 1986-03-28 | 1988-06-17 | Nittetsu Micro Metal:Kk | 半導体素子ボンデイング用金線 |
JP2661249B2 (ja) * | 1989-03-24 | 1997-10-08 | 三菱マテリアル株式会社 | 半導体素子ボンディング用金合金線 |
JP2814660B2 (ja) * | 1990-03-06 | 1998-10-27 | 三菱マテリアル株式会社 | 半導体装置のボンディング用金合金線 |
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JP3090548B2 (ja) * | 1992-09-30 | 2000-09-25 | 田中電子工業株式会社 | 半導体素子用ボンディング線 |
JPH09321075A (ja) * | 1996-05-28 | 1997-12-12 | Sumitomo Metal Mining Co Ltd | ボンディングワイヤ |
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