JP2677460B2 - アルカリ現像性感光性樹脂組成物 - Google Patents

アルカリ現像性感光性樹脂組成物

Info

Publication number
JP2677460B2
JP2677460B2 JP3020919A JP2091991A JP2677460B2 JP 2677460 B2 JP2677460 B2 JP 2677460B2 JP 3020919 A JP3020919 A JP 3020919A JP 2091991 A JP2091991 A JP 2091991A JP 2677460 B2 JP2677460 B2 JP 2677460B2
Authority
JP
Japan
Prior art keywords
resin
group
photosensitive
parts
acrylate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP3020919A
Other languages
English (en)
Japanese (ja)
Other versions
JPH04258956A (ja
Inventor
和典 神田
佳史 一瀬
正治 有松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Nippon Paint Holdings Co Ltd
Original Assignee
Nippon Paint Co Ltd
Nippon Paint Holdings Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd, Nippon Paint Holdings Co Ltd filed Critical Nippon Paint Co Ltd
Priority to JP3020919A priority Critical patent/JP2677460B2/ja
Priority to AU10857/92A priority patent/AU649305B2/en
Priority to EP92301136A priority patent/EP0499447A1/en
Priority to CA002061070A priority patent/CA2061070A1/en
Priority to KR1019920002216A priority patent/KR920016265A/ko
Priority to TW081101080A priority patent/TW223152B/zh
Publication of JPH04258956A publication Critical patent/JPH04258956A/ja
Priority to US08/366,444 priority patent/US5478690A/en
Application granted granted Critical
Publication of JP2677460B2 publication Critical patent/JP2677460B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/124—Duplicating or marking methods; Sheet materials for use therein using pressure to make a masked colour visible, e.g. to make a coloured support visible, to create an opaque or transparent pattern, or to form colour by uniting colour-forming components
    • B41M5/132—Chemical colour-forming components; Additives or binders therefor
    • B41M5/155—Colour-developing components, e.g. acidic compounds; Additives or binders therefor; Layers containing such colour-developing components, additives or binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP3020919A 1991-02-14 1991-02-14 アルカリ現像性感光性樹脂組成物 Expired - Lifetime JP2677460B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP3020919A JP2677460B2 (ja) 1991-02-14 1991-02-14 アルカリ現像性感光性樹脂組成物
AU10857/92A AU649305B2 (en) 1991-02-14 1992-02-11 Alkali developable photosensitive resin compositon
EP92301136A EP0499447A1 (en) 1991-02-14 1992-02-11 Alkali developable photosensitive resin composition
CA002061070A CA2061070A1 (en) 1991-02-14 1992-02-12 Alkali developable photosensitive resin composition
KR1019920002216A KR920016265A (ko) 1991-02-14 1992-02-14 알칼리 현상가능한 감광성 수지 조성물
TW081101080A TW223152B (enExample) 1991-02-14 1992-02-15
US08/366,444 US5478690A (en) 1991-02-14 1994-12-30 Alkali developable photosensitive resin composition comprising a binder having betaine side groups

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3020919A JP2677460B2 (ja) 1991-02-14 1991-02-14 アルカリ現像性感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPH04258956A JPH04258956A (ja) 1992-09-14
JP2677460B2 true JP2677460B2 (ja) 1997-11-17

Family

ID=12040634

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3020919A Expired - Lifetime JP2677460B2 (ja) 1991-02-14 1991-02-14 アルカリ現像性感光性樹脂組成物

Country Status (7)

Country Link
US (1) US5478690A (enExample)
EP (1) EP0499447A1 (enExample)
JP (1) JP2677460B2 (enExample)
KR (1) KR920016265A (enExample)
AU (1) AU649305B2 (enExample)
CA (1) CA2061070A1 (enExample)
TW (1) TW223152B (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5712022A (en) * 1992-09-14 1998-01-27 Yoshino Kogyosho Co., Ltd. Printed thermoplastic resin products and method for printing such products
JP3317574B2 (ja) * 1994-03-15 2002-08-26 富士写真フイルム株式会社 ネガ型画像記録材料
DE4430680A1 (de) * 1994-08-29 1996-03-07 Hoechst Ag Lichtempfindliches Gemisch
US5853957A (en) * 1995-05-08 1998-12-29 Tamura Kaken Co., Ltd Photosensitive resin compositions, cured films thereof, and circuit boards
DE19533608A1 (de) * 1995-09-11 1997-03-13 Basf Ag Positivarbeitendes strahlungsempfindliches Gemisch und Verfahren zur Herstellung von Reliefstrukturen
US6140022A (en) * 1996-07-19 2000-10-31 Agfa-Gevaert, N.V. Radiation sensitive imaging element and a method for producing lithographic plates therewith
US5846685A (en) * 1997-01-31 1998-12-08 Kodak Polychrome Graphics, Llc Radiation sensitive diazo sulfo-acrylic adducts and method for producing a printing plate
TW550438B (en) * 1999-04-26 2003-09-01 Jsr Corp Radiation-sensitive resin composition
DE10064889A1 (de) 2000-12-23 2002-07-18 Agfa Gevaert Nv Aufzeichnungsmaterial mit negativ arbeitender, strahlungsempfindlicher Schicht, die Zusätze zur Förderung der Entwickelbarkeit enthält
US7008751B2 (en) * 2004-08-04 2006-03-07 Eastman Kodak Company Thermally switchable imageable elements containing betaine-containing co-polymers
US7029805B2 (en) * 2004-09-07 2006-04-18 Eastman Kodak Company Imageable element with masking layer comprising betaine-containing co-polymers
JP2008089712A (ja) * 2006-09-29 2008-04-17 Fujifilm Corp 感光性平版印刷版の製造方法
US8257907B2 (en) * 2009-06-12 2012-09-04 Eastman Kodak Company Negative-working imageable elements
WO2018168309A1 (ja) * 2017-03-15 2018-09-20 Jsr株式会社 感放射線性樹脂組成物、パターン膜およびその製造方法、パターン基板、細胞培養器具、マイクロ流路デバイス、ならびに細胞塊の製造方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3497482A (en) * 1963-10-14 1970-02-24 Rohm & Haas Polymers of quaternary ammonium compounds
US3411912A (en) * 1965-04-21 1968-11-19 Eastman Kodak Co Novel polymers and their use in photographic applications
DE1595589A1 (de) * 1966-02-02 1970-04-30 Bayer Ag Verfahren zur Herstellung von Acrylnitrilmischpolymeren
US3671502A (en) * 1970-11-12 1972-06-20 Kendall & Co Betaine copolymers with hydroxyalkylacrylates and hydroxyalkylmethacrylates
US4207109A (en) * 1978-04-05 1980-06-10 Eastman Kodak Company Element for photographic use containing crosslinkable polymers having acrylamidophenol units
GB1603700A (en) * 1978-05-31 1981-11-25 Vickers Ltd Developers for lithographic printing plates
JPS56142528A (en) * 1980-04-08 1981-11-06 Mitsubishi Chem Ind Ltd Developing solution for o-quinone diazide photosensitive material
JPS56151727A (en) * 1980-04-26 1981-11-24 Nippon Paint Co Ltd Novel oil free-polyester and its preparation
US4379872A (en) * 1980-08-22 1983-04-12 Nippon Paint Co., Ltd. Amphoteric amino sulfonate derivatives of epoxy resins
JPS57178242A (en) * 1981-04-27 1982-11-02 Konishiroku Photo Ind Co Ltd Photosensitive lithographic plate
US4749762A (en) * 1982-05-12 1988-06-07 E. I. Du Pont De Nemours And Company Acrylic amphoteric polymers
US4574110A (en) * 1983-07-28 1986-03-04 Mitsui Toatsu Chemicals, Incorporated Process for producing microcapsules and microcapsule slurry
DE3516387A1 (de) * 1984-05-07 1985-11-07 Fuji Photo Film Co., Ltd., Minami-Ashigara, Kanagawa Lichtempfindliche zusammensetzungen und aufzeichnungsmaterialien
US4614701A (en) * 1984-09-28 1986-09-30 Sekisui Fine Chemical Co., Ltd. Photocurable diazo or azide composition with acrylic copolymer having hydroxy and amino groups on separate acrylic monomer units
EP0662636A3 (en) * 1986-10-23 1995-11-22 Ciba Geigy Ag Imaging processes.
US5028516A (en) * 1986-12-04 1991-07-02 Fuji Photo Film Co., Ltd. Method of forming an image comprising rapidly developing an infrared sensitized photographic material comprising surfactants
JPH02294646A (ja) * 1989-05-10 1990-12-05 Mitsubishi Kasei Corp 感光性平版印刷版
JPH0368946A (ja) * 1989-08-08 1991-03-25 Konica Corp 湿し水不要の感光性平版印刷版

Also Published As

Publication number Publication date
CA2061070A1 (en) 1992-08-15
AU1085792A (en) 1992-08-20
JPH04258956A (ja) 1992-09-14
US5478690A (en) 1995-12-26
AU649305B2 (en) 1994-05-19
EP0499447A1 (en) 1992-08-19
KR920016265A (ko) 1992-09-24
TW223152B (enExample) 1994-05-01

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