JP2570560Y2 - 電子ビーム蒸発源 - Google Patents
電子ビーム蒸発源Info
- Publication number
- JP2570560Y2 JP2570560Y2 JP1991003773U JP377391U JP2570560Y2 JP 2570560 Y2 JP2570560 Y2 JP 2570560Y2 JP 1991003773 U JP1991003773 U JP 1991003773U JP 377391 U JP377391 U JP 377391U JP 2570560 Y2 JP2570560 Y2 JP 2570560Y2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- evaporation source
- aluminum
- beam evaporation
- crucible
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1991003773U JP2570560Y2 (ja) | 1991-01-10 | 1991-01-10 | 電子ビーム蒸発源 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1991003773U JP2570560Y2 (ja) | 1991-01-10 | 1991-01-10 | 電子ビーム蒸発源 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0497848U JPH0497848U (enExample) | 1992-08-25 |
| JP2570560Y2 true JP2570560Y2 (ja) | 1998-05-06 |
Family
ID=31733006
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1991003773U Expired - Fee Related JP2570560Y2 (ja) | 1991-01-10 | 1991-01-10 | 電子ビーム蒸発源 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2570560Y2 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8733248B2 (en) | 2006-02-21 | 2014-05-27 | R.R. Donnelley & Sons Company | Method and apparatus for transferring a principal substance and printing system |
| CA2643244C (en) | 2006-02-21 | 2015-11-24 | Moore Wallace North America, Inc. | Systems and methods for high speed variable printing |
| US9463643B2 (en) | 2006-02-21 | 2016-10-11 | R.R. Donnelley & Sons Company | Apparatus and methods for controlling application of a substance to a substrate |
| US8869698B2 (en) | 2007-02-21 | 2014-10-28 | R.R. Donnelley & Sons Company | Method and apparatus for transferring a principal substance |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3986185A (en) * | 1974-12-23 | 1976-10-12 | Texas Instruments | Gas discharge display with control cells |
| JPS54127878A (en) * | 1978-03-29 | 1979-10-04 | Hitachi Ltd | Deposition source for electronic beam deposition apparatus |
| JPH0387360A (ja) * | 1989-08-29 | 1991-04-12 | Sumitomo Metal Ind Ltd | 真空蒸着装置 |
-
1991
- 1991-01-10 JP JP1991003773U patent/JP2570560Y2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0497848U (enExample) | 1992-08-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |