JP2539732Y2 - ウェーハ洗浄装置 - Google Patents

ウェーハ洗浄装置

Info

Publication number
JP2539732Y2
JP2539732Y2 JP172591U JP172591U JP2539732Y2 JP 2539732 Y2 JP2539732 Y2 JP 2539732Y2 JP 172591 U JP172591 U JP 172591U JP 172591 U JP172591 U JP 172591U JP 2539732 Y2 JP2539732 Y2 JP 2539732Y2
Authority
JP
Japan
Prior art keywords
pure water
water
vortex chamber
wafer cleaning
nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP172591U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0499534U (enExample
Inventor
和彦 山口
Original Assignee
関西日本電気株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 関西日本電気株式会社 filed Critical 関西日本電気株式会社
Priority to JP172591U priority Critical patent/JP2539732Y2/ja
Publication of JPH0499534U publication Critical patent/JPH0499534U/ja
Application granted granted Critical
Publication of JP2539732Y2 publication Critical patent/JP2539732Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
JP172591U 1991-01-24 1991-01-24 ウェーハ洗浄装置 Expired - Lifetime JP2539732Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP172591U JP2539732Y2 (ja) 1991-01-24 1991-01-24 ウェーハ洗浄装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP172591U JP2539732Y2 (ja) 1991-01-24 1991-01-24 ウェーハ洗浄装置

Publications (2)

Publication Number Publication Date
JPH0499534U JPH0499534U (enExample) 1992-08-27
JP2539732Y2 true JP2539732Y2 (ja) 1997-06-25

Family

ID=31729281

Family Applications (1)

Application Number Title Priority Date Filing Date
JP172591U Expired - Lifetime JP2539732Y2 (ja) 1991-01-24 1991-01-24 ウェーハ洗浄装置

Country Status (1)

Country Link
JP (1) JP2539732Y2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018160506A (ja) * 2017-03-22 2018-10-11 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置およびノズル構造

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018160506A (ja) * 2017-03-22 2018-10-11 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置およびノズル構造

Also Published As

Publication number Publication date
JPH0499534U (enExample) 1992-08-27

Similar Documents

Publication Publication Date Title
US5850841A (en) Cleaning apparatus of semiconductor device
JPH05291228A (ja) ウェーハ洗浄装置及び洗浄方法
TW434668B (en) Wafer rinse apparatus and rinse method of the same
US6619301B2 (en) Ultrasonic processing device and electronic parts fabrication method using the same
JP2539732Y2 (ja) ウェーハ洗浄装置
JPH0456321A (ja) 半導体ウエハの洗浄装置
JP3254716B2 (ja) ウェーハ洗浄装置
JP2504916B2 (ja) 基板洗浄装置
JP2988366B2 (ja) 洗浄装置
JPH10242105A (ja) ウェット処理装置
JP3185387B2 (ja) 洗浄装置及びこれを用いた半導体ウエハなどの基板の洗浄方法
KR100189778B1 (ko) 웨이퍼세정장치
JPH06196466A (ja) ウェハ洗浄装置
JP2001000924A (ja) 洗滌槽
JP3080031B2 (ja) 洗浄装置
JP3190124B2 (ja) 基板洗浄装置
KR20070033129A (ko) 웨이퍼용 척 세정장치
KR0161865B1 (ko) 제트노즐을 이용한 반도체웨이퍼 세정장치
JP3247322B2 (ja) 洗浄装置
JPH05315312A (ja) ウェットエッチング装置
JPS6072234A (ja) 半導体ウエハ−の水洗装置
KR0121319Y1 (ko) 세정액 분사노즐
KR200248000Y1 (ko) 웨이퍼 세정장치
KR960007315Y1 (ko) 웨이퍼 세정용 순수공급 노즐
KR20050065168A (ko) 웨이퍼 카세트 및 이를 이용한 습식 세정 방법