JP2025500345A5 - - Google Patents
Info
- Publication number
- JP2025500345A5 JP2025500345A5 JP2024537376A JP2024537376A JP2025500345A5 JP 2025500345 A5 JP2025500345 A5 JP 2025500345A5 JP 2024537376 A JP2024537376 A JP 2024537376A JP 2024537376 A JP2024537376 A JP 2024537376A JP 2025500345 A5 JP2025500345 A5 JP 2025500345A5
- Authority
- JP
- Japan
- Prior art keywords
- precursor
- group
- substituted
- alkyl group
- bismuth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202163265795P | 2021-12-21 | 2021-12-21 | |
| US63/265,795 | 2021-12-21 | ||
| PCT/US2022/081630 WO2023122470A1 (en) | 2021-12-21 | 2022-12-15 | Precursors for deposition of bismuth-containing films |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2025500345A JP2025500345A (ja) | 2025-01-09 |
| JP2025500345A5 true JP2025500345A5 (https=) | 2025-10-23 |
Family
ID=85036277
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024537376A Pending JP2025500345A (ja) | 2021-12-21 | 2022-12-15 | ビスマス含有膜の堆積のための前駆体 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20250051378A1 (https=) |
| EP (1) | EP4430054A1 (https=) |
| JP (1) | JP2025500345A (https=) |
| KR (1) | KR20240125642A (https=) |
| CN (1) | CN118647624A (https=) |
| TW (1) | TW202337892A (https=) |
| WO (1) | WO2023122470A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW202534085A (zh) * | 2023-09-29 | 2025-09-01 | 德商馬克專利公司 | 光阻劑材料之沉積製程 |
| KR20250152024A (ko) * | 2024-04-15 | 2025-10-22 | 주식회사 유피케미칼 | 비스무스 전구체 화합물, 이의 제조방법, 및 이를 이용한 비스무스-함유 막의 형성 방법 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5902639A (en) | 1997-03-31 | 1999-05-11 | Advanced Technology Materials, Inc | Method of forming bismuth-containing films by using bismuth amide compounds |
| KR100721365B1 (ko) * | 2003-04-08 | 2007-05-23 | 토소가부시키가이샤 | 신규 비스무트 화합물, 그 제조방법 및 막의 제조방법 |
| US7618681B2 (en) | 2003-10-28 | 2009-11-17 | Asm International N.V. | Process for producing bismuth-containing oxide films |
| WO2009059237A2 (en) | 2007-10-31 | 2009-05-07 | Advanced Technology Materials, Inc. | Novel bismuth precursors for cvd/ald of thin films |
| US10186570B2 (en) | 2013-02-08 | 2019-01-22 | Entegris, Inc. | ALD processes for low leakage current and low equivalent oxide thickness BiTaO films |
| DE102016001494A1 (de) * | 2015-09-23 | 2017-03-23 | Merck Patent Gmbh | Bismutverbindungen enthaltend Perfluoralkylgruppen als Lewis-Säure Katalysatoren |
| EP3292876A1 (en) * | 2016-09-12 | 2018-03-14 | Technische Universität Graz | Compounds for use as contrast agents in magnetic resonance imaging |
| AU2021103847A4 (en) * | 2021-07-03 | 2021-09-09 | Keshav Lalit Ameta | Bismuthino for biomedicinal application and its analytical synthesis thereof |
-
2022
- 2022-12-15 US US18/720,937 patent/US20250051378A1/en active Pending
- 2022-12-15 WO PCT/US2022/081630 patent/WO2023122470A1/en not_active Ceased
- 2022-12-15 EP EP22847242.9A patent/EP4430054A1/en active Pending
- 2022-12-15 JP JP2024537376A patent/JP2025500345A/ja active Pending
- 2022-12-15 CN CN202280090253.5A patent/CN118647624A/zh active Pending
- 2022-12-15 KR KR1020247024330A patent/KR20240125642A/ko active Pending
- 2022-12-19 TW TW111148698A patent/TW202337892A/zh unknown
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6600074B2 (ja) | 窒化ケイ素膜を堆積するための組成物及び方法 | |
| JP5711300B2 (ja) | 第4族金属含有膜を堆積させるための前駆体 | |
| KR101349888B1 (ko) | 금속 함유 막을 증착시키기 위한 금속 에놀레이트 전구체 | |
| JP2025500345A5 (https=) | ||
| KR101726946B1 (ko) | 반도체 장치의 제조 방법, 기판 처리 장치 및 프로그램 | |
| JP5855691B2 (ja) | 半導体装置の製造方法、基板処理装置、プログラム及び記録媒体 | |
| TW202118890A (zh) | 使用表面保護材料來形成薄膜的方法 | |
| JP2016147861A5 (https=) | ||
| KR102829813B1 (ko) | 금속 함유 박막 형성을 위한 신규 전구체 및 이를 이용한 금속 함유 박막 형성 방법 및 상기 금속 함유 박막을 포함하는 반도체 소자. | |
| JP2015153825A (ja) | 半導体装置の製造方法、基板処理装置およびプログラム | |
| JP2024500630A5 (https=) | ||
| JP6302081B2 (ja) | ゲルマニウムまたは酸化ゲルマニウムの原子層堆積 | |
| KR102858491B1 (ko) | 5족 금속 함유 박막 형성용 전구체 및 이를 이용한 5족 금속 함유 박막 형성 방법 및 상기 5족 금속 함유 박막을 포함하는 반도체 소자. | |
| JP2025500345A (ja) | ビスマス含有膜の堆積のための前駆体 | |
| KR101003700B1 (ko) | 원자층 증착을 이용한 금속 산화막 형성 방법 | |
| TWI906456B (zh) | 形成金屬薄膜之方法 | |
| WO2023171489A1 (ja) | 原子層堆積法用薄膜形成用原料、薄膜及び薄膜の製造方法 | |
| JP2024507177A5 (https=) | ||
| JP2025512614A5 (https=) | ||
| US20050276922A1 (en) | Method of forming thin dielectric layers | |
| JP2013145787A (ja) | アルミニウム化合物、薄膜形成用原料及び薄膜の製造方法 | |
| KR102173384B1 (ko) | SiO2 박막 형성용 전구체 및 이를 이용한 SiO2 박막 형성. | |
| KR102952715B1 (ko) | 박막 증착을 위한 유기 금속 화합물 및 이를 이용한 4족 금속 함유 박막의 형성 방법 | |
| JP7587873B2 (ja) | 薄膜形成方法およびそれを含むメモリ素子の製造方法 | |
| JP2025510329A5 (https=) |