JP2025005509A5 - - Google Patents

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Publication number
JP2025005509A5
JP2025005509A5 JP2023105693A JP2023105693A JP2025005509A5 JP 2025005509 A5 JP2025005509 A5 JP 2025005509A5 JP 2023105693 A JP2023105693 A JP 2023105693A JP 2023105693 A JP2023105693 A JP 2023105693A JP 2025005509 A5 JP2025005509 A5 JP 2025005509A5
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JP
Japan
Prior art keywords
resist
substrate
residue
composition according
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023105693A
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English (en)
Japanese (ja)
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JP2025005509A (ja
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Publication date
Application filed filed Critical
Priority to JP2023105693A priority Critical patent/JP2025005509A/ja
Priority claimed from JP2023105693A external-priority patent/JP2025005509A/ja
Priority to PCT/JP2024/023322 priority patent/WO2025005178A1/ja
Priority to TW113123954A priority patent/TW202505318A/zh
Publication of JP2025005509A publication Critical patent/JP2025005509A/ja
Publication of JP2025005509A5 publication Critical patent/JP2025005509A5/ja
Pending legal-status Critical Current

Links

JP2023105693A 2023-06-28 2023-06-28 ポリマー除去組成物および除去方法 Pending JP2025005509A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2023105693A JP2025005509A (ja) 2023-06-28 2023-06-28 ポリマー除去組成物および除去方法
PCT/JP2024/023322 WO2025005178A1 (ja) 2023-06-28 2024-06-27 ポリマー除去組成物および除去方法
TW113123954A TW202505318A (zh) 2023-06-28 2024-06-27 聚合物去除組成物及去除方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2023105693A JP2025005509A (ja) 2023-06-28 2023-06-28 ポリマー除去組成物および除去方法

Publications (2)

Publication Number Publication Date
JP2025005509A JP2025005509A (ja) 2025-01-17
JP2025005509A5 true JP2025005509A5 (enExample) 2026-03-25

Family

ID=93939181

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023105693A Pending JP2025005509A (ja) 2023-06-28 2023-06-28 ポリマー除去組成物および除去方法

Country Status (3)

Country Link
JP (1) JP2025005509A (enExample)
TW (1) TW202505318A (enExample)
WO (1) WO2025005178A1 (enExample)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4310624B2 (ja) * 2003-05-30 2009-08-12 三菱瓦斯化学株式会社 表面処理液
JP5195063B2 (ja) * 2008-06-19 2013-05-08 東ソー株式会社 レジスト剥離液
KR102213779B1 (ko) * 2014-08-26 2021-02-08 동우 화인켐 주식회사 레지스트 박리액 조성물 및 이를 이용한 레지스트의 박리방법
TWI690780B (zh) * 2014-12-30 2020-04-11 美商富士軟片電子材料美國股份有限公司 用於自半導體基板去除光阻之剝離組成物
KR102051346B1 (ko) * 2016-06-03 2019-12-03 후지필름 가부시키가이샤 처리액, 기판 세정 방법 및 레지스트의 제거 방법

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