JP2024507524A5 - - Google Patents
Info
- Publication number
- JP2024507524A5 JP2024507524A5 JP2023550199A JP2023550199A JP2024507524A5 JP 2024507524 A5 JP2024507524 A5 JP 2024507524A5 JP 2023550199 A JP2023550199 A JP 2023550199A JP 2023550199 A JP2023550199 A JP 2023550199A JP 2024507524 A5 JP2024507524 A5 JP 2024507524A5
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- euv
- gas
- processing chamber
- reducing agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202163153753P | 2021-02-25 | 2021-02-25 | |
| US63/153,753 | 2021-02-25 | ||
| PCT/US2022/015554 WO2022182510A1 (en) | 2021-02-25 | 2022-02-08 | Methods and apparatus for ruthenium oxide reduction on extreme ultraviolet photomasks |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2024507524A JP2024507524A (ja) | 2024-02-20 |
| JP2024507524A5 true JP2024507524A5 (enExample) | 2024-10-21 |
| JP7583953B2 JP7583953B2 (ja) | 2024-11-14 |
Family
ID=83048389
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023550199A Active JP7583953B2 (ja) | 2021-02-25 | 2022-02-08 | 極紫外線フォトマスク上でのルテニウム酸化物還元のための方法及び装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20240118603A1 (enExample) |
| EP (1) | EP4298479A4 (enExample) |
| JP (1) | JP7583953B2 (enExample) |
| KR (1) | KR102959585B1 (enExample) |
| CN (1) | CN117043674A (enExample) |
| TW (1) | TW202238249A (enExample) |
| WO (1) | WO2022182510A1 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN120345049A (zh) * | 2022-12-12 | 2025-07-18 | 朗姆研究公司 | 处理工具中的气流控制 |
| US20260099087A1 (en) * | 2024-10-07 | 2026-04-09 | Taiwan Semiconductor Manufacturing Company, Ltd. | Methods of manufacturing semiconductor device and extreme ultraviolet photolithography systems |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101457338B (zh) | 2003-02-14 | 2011-04-27 | 应用材料股份有限公司 | 利用含氢自由基清洁自生氧化物的方法和设备 |
| US7547505B2 (en) * | 2005-01-20 | 2009-06-16 | Infineon Technologies Ag | Methods of forming capping layers on reflective materials |
| KR101163221B1 (ko) * | 2010-09-10 | 2012-07-11 | 에스케이하이닉스 주식회사 | 극자외선 광학 소자의 반사율을 회복시키는 방법 및 이를 이용한 세정 방법 |
| CN110735181A (zh) * | 2013-08-09 | 2020-01-31 | 应用材料公司 | 于外延生长之前预清洁基板表面的方法和设备 |
| KR101976249B1 (ko) | 2014-03-11 | 2019-05-07 | 시바우라 메카트로닉스 가부시끼가이샤 | 반사형 마스크의 세정 장치 및 반사형 마스크의 세정 방법 |
| US20150376792A1 (en) * | 2014-06-30 | 2015-12-31 | Lam Research Corporation | Atmospheric plasma apparatus for semiconductor processing |
| US9739913B2 (en) * | 2014-07-11 | 2017-08-22 | Applied Materials, Inc. | Extreme ultraviolet capping layer and method of manufacturing and lithography thereof |
| US20170017146A1 (en) | 2015-07-13 | 2017-01-19 | Applied Materials, Inc. | Process for removing contamination on ruthenium surface |
| KR102355875B1 (ko) | 2017-12-18 | 2022-02-08 | 세키스이가가쿠 고교가부시키가이샤 | 표면 처리 방법 및 장치 |
-
2022
- 2022-02-08 WO PCT/US2022/015554 patent/WO2022182510A1/en not_active Ceased
- 2022-02-08 US US18/276,760 patent/US20240118603A1/en active Pending
- 2022-02-08 KR KR1020237032164A patent/KR102959585B1/ko active Active
- 2022-02-08 EP EP22760197.8A patent/EP4298479A4/en active Pending
- 2022-02-08 JP JP2023550199A patent/JP7583953B2/ja active Active
- 2022-02-08 CN CN202280015706.8A patent/CN117043674A/zh active Pending
- 2022-02-10 TW TW111104880A patent/TW202238249A/zh unknown
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