JP2024016703A - 基板洗浄装置および基板洗浄方法 - Google Patents

基板洗浄装置および基板洗浄方法 Download PDF

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Publication number
JP2024016703A
JP2024016703A JP2022119010A JP2022119010A JP2024016703A JP 2024016703 A JP2024016703 A JP 2024016703A JP 2022119010 A JP2022119010 A JP 2022119010A JP 2022119010 A JP2022119010 A JP 2022119010A JP 2024016703 A JP2024016703 A JP 2024016703A
Authority
JP
Japan
Prior art keywords
cleaning
substrate
bevel
contact
cleaning surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022119010A
Other languages
English (en)
Japanese (ja)
Inventor
克典 田中
Katsunori Tanaka
良平 帆角
Ryohei Hokaku
航 矢野
Wataru Yano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Screen Holdings Co Ltd
Original Assignee
Screen Holdings Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Screen Holdings Co Ltd filed Critical Screen Holdings Co Ltd
Priority to JP2022119010A priority Critical patent/JP2024016703A/ja
Priority to PCT/JP2023/025415 priority patent/WO2024024474A1/fr
Priority to TW112126707A priority patent/TW202407851A/zh
Publication of JP2024016703A publication Critical patent/JP2024016703A/ja
Pending legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)
JP2022119010A 2022-07-26 2022-07-26 基板洗浄装置および基板洗浄方法 Pending JP2024016703A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2022119010A JP2024016703A (ja) 2022-07-26 2022-07-26 基板洗浄装置および基板洗浄方法
PCT/JP2023/025415 WO2024024474A1 (fr) 2022-07-26 2023-07-10 Dispositif de nettoyage de substrat et procédé de nettoyage de substrat
TW112126707A TW202407851A (zh) 2022-07-26 2023-07-18 基板洗淨裝置及基板洗淨方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2022119010A JP2024016703A (ja) 2022-07-26 2022-07-26 基板洗浄装置および基板洗浄方法

Publications (1)

Publication Number Publication Date
JP2024016703A true JP2024016703A (ja) 2024-02-07

Family

ID=89706201

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022119010A Pending JP2024016703A (ja) 2022-07-26 2022-07-26 基板洗浄装置および基板洗浄方法

Country Status (3)

Country Link
JP (1) JP2024016703A (fr)
TW (1) TW202407851A (fr)
WO (1) WO2024024474A1 (fr)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10242092A (ja) * 1997-02-25 1998-09-11 Dainippon Screen Mfg Co Ltd 基板洗浄装置
JP2003031541A (ja) * 2001-07-18 2003-01-31 Speedfam Co Ltd 洗浄装置
JP4755519B2 (ja) * 2006-03-30 2011-08-24 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
JP5039468B2 (ja) * 2007-07-26 2012-10-03 株式会社Ｓｏｋｕｄｏ 基板洗浄装置およびそれを備えた基板処理装置
JP5031525B2 (ja) * 2007-11-12 2012-09-19 大日本スクリーン製造株式会社 基板処理装置
JP5143933B2 (ja) * 2011-07-28 2013-02-13 大日本スクリーン製造株式会社 基板処理装置および基板処理方法

Also Published As

Publication number Publication date
TW202407851A (zh) 2024-02-16
WO2024024474A1 (fr) 2024-02-01

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