JP2023513120A5 - - Google Patents
Info
- Publication number
- JP2023513120A5 JP2023513120A5 JP2022547193A JP2022547193A JP2023513120A5 JP 2023513120 A5 JP2023513120 A5 JP 2023513120A5 JP 2022547193 A JP2022547193 A JP 2022547193A JP 2022547193 A JP2022547193 A JP 2022547193A JP 2023513120 A5 JP2023513120 A5 JP 2023513120A5
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- structures
- period
- during
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202062971811P | 2020-02-07 | 2020-02-07 | |
| US62/971,811 | 2020-02-07 | ||
| PCT/US2021/013086 WO2021158338A1 (en) | 2020-02-07 | 2021-01-12 | Etch improvement |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2023513120A JP2023513120A (ja) | 2023-03-30 |
| JP2023513120A5 true JP2023513120A5 (https=) | 2023-12-13 |
| JP7431339B2 JP7431339B2 (ja) | 2024-02-14 |
Family
ID=77177991
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022547193A Active JP7431339B2 (ja) | 2020-02-07 | 2021-01-12 | エッチング改善 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US11852853B2 (https=) |
| EP (1) | EP4100987A4 (https=) |
| JP (1) | JP7431339B2 (https=) |
| KR (1) | KR102791914B1 (https=) |
| CN (1) | CN115152001B (https=) |
| TW (1) | TWI908760B (https=) |
| WO (1) | WO2021158338A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11487058B2 (en) | 2020-08-13 | 2022-11-01 | Applied Materials, Inc. | Method for manufacturing optical device structures |
| WO2023205288A1 (en) * | 2022-04-20 | 2023-10-26 | Applied Materials, Inc. | Method for roughness reduction in manufacturing optical device structures |
| US12255067B2 (en) * | 2022-05-23 | 2025-03-18 | Applied Materials, Inc. | Method for depositing layers directly adjacent uncovered vias or contact holes |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61245452A (ja) | 1985-04-24 | 1986-10-31 | Nippon Telegr & Teleph Corp <Ntt> | 電子ビ−ム溶接機 |
| JP2841441B2 (ja) * | 1989-03-27 | 1998-12-24 | 株式会社島津製作所 | 回折格子およびその製作方法 |
| US5116461A (en) * | 1991-04-22 | 1992-05-26 | Motorola, Inc. | Method for fabricating an angled diffraction grating |
| JP4157654B2 (ja) * | 1999-08-23 | 2008-10-01 | 独立行政法人 日本原子力研究開発機構 | 円錐回折斜入射分光器及び該分光器用回折格子 |
| CN102396025B (zh) * | 2009-04-13 | 2015-09-30 | 应用材料公司 | 使用激光、e束或聚焦离子束的hdd图案化设备 |
| US8907307B2 (en) | 2011-03-11 | 2014-12-09 | Varian Semiconductor Equipment Associates, Inc. | Apparatus and method for maskless patterned implantation |
| CN102540298B (zh) * | 2012-02-01 | 2013-10-16 | 中国科学技术大学 | 软x射线双频光栅及其制作方法 |
| US20160033784A1 (en) | 2014-07-30 | 2016-02-04 | Tapani Levola | Optical Components |
| US20160035539A1 (en) | 2014-07-30 | 2016-02-04 | Lauri SAINIEMI | Microfabrication |
| US9536748B2 (en) | 2014-10-21 | 2017-01-03 | Lam Research Corporation | Use of ion beam etching to generate gate-all-around structure |
| DE102016111998B4 (de) * | 2016-06-30 | 2024-01-18 | Infineon Technologies Ag | Ausbilden von Elektrodengräben unter Verwendung eines gerichteten Ionenstrahls und Halbleitervorrichtung mit Graben-Elektrodenstrukturen |
| KR102673632B1 (ko) * | 2016-12-06 | 2024-06-13 | 삼성전자주식회사 | 이온 빔 추출을 위한 슬릿 구조체를 포함하는 이온 빔 장비, 및 이를 이용한 식각 방법 및 자기기억소자의 제조방법 |
| US10818499B2 (en) | 2018-02-21 | 2020-10-27 | Varian Semiconductor Equipment Associates, Inc. | Optical component having variable depth gratings and method of formation |
| US10302826B1 (en) | 2018-05-30 | 2019-05-28 | Applied Materials, Inc. | Controlling etch angles by substrate rotation in angled etch tools |
| US10761334B2 (en) * | 2018-07-13 | 2020-09-01 | Varian Semiconductor Equipment Associates, Inc. | System and method for optimally forming gratings of diffracted optical elements |
| US11137536B2 (en) * | 2018-07-26 | 2021-10-05 | Facebook Technologies, Llc | Bragg-like gratings on high refractive index material |
| CN110632689B (zh) * | 2019-08-16 | 2021-11-16 | 诚瑞光学(常州)股份有限公司 | 表面浮雕光栅结构的制作方法 |
-
2021
- 2021-01-12 WO PCT/US2021/013086 patent/WO2021158338A1/en not_active Ceased
- 2021-01-12 JP JP2022547193A patent/JP7431339B2/ja active Active
- 2021-01-12 KR KR1020227030762A patent/KR102791914B1/ko active Active
- 2021-01-12 CN CN202180016019.3A patent/CN115152001B/zh active Active
- 2021-01-12 EP EP21750582.5A patent/EP4100987A4/en active Pending
- 2021-01-12 US US17/147,338 patent/US11852853B2/en active Active
- 2021-01-29 TW TW110103417A patent/TWI908760B/zh active
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