JP2023118312A - 蒸着装置 - Google Patents
蒸着装置 Download PDFInfo
- Publication number
- JP2023118312A JP2023118312A JP2022021203A JP2022021203A JP2023118312A JP 2023118312 A JP2023118312 A JP 2023118312A JP 2022021203 A JP2022021203 A JP 2022021203A JP 2022021203 A JP2022021203 A JP 2022021203A JP 2023118312 A JP2023118312 A JP 2023118312A
- Authority
- JP
- Japan
- Prior art keywords
- collimator
- substrate
- holder
- vapor deposition
- deposition apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007740 vapor deposition Methods 0.000 title claims abstract description 50
- 239000000758 substrate Substances 0.000 claims abstract description 152
- 238000001704 evaporation Methods 0.000 claims abstract description 45
- 239000000463 material Substances 0.000 claims abstract description 43
- 230000008020 evaporation Effects 0.000 claims abstract description 41
- 230000008021 deposition Effects 0.000 claims description 11
- 239000000126 substance Substances 0.000 claims description 6
- 238000000151 deposition Methods 0.000 description 11
- 238000010586 diagram Methods 0.000 description 10
- 239000000470 constituent Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 239000011364 vaporized material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/543—Controlling the film thickness or evaporation rate using measurement on the vapor source
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022021203A JP2023118312A (ja) | 2022-02-15 | 2022-02-15 | 蒸着装置 |
| CN202310108079.9A CN116607110A (zh) | 2022-02-15 | 2023-02-14 | 蒸镀装置 |
| TW112105315A TW202346625A (zh) | 2022-02-15 | 2023-02-15 | 蒸鍍裝置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022021203A JP2023118312A (ja) | 2022-02-15 | 2022-02-15 | 蒸着装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2023118312A true JP2023118312A (ja) | 2023-08-25 |
Family
ID=87663352
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022021203A Pending JP2023118312A (ja) | 2022-02-15 | 2022-02-15 | 蒸着装置 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2023118312A (zh) |
| CN (1) | CN116607110A (zh) |
| TW (1) | TW202346625A (zh) |
-
2022
- 2022-02-15 JP JP2022021203A patent/JP2023118312A/ja active Pending
-
2023
- 2023-02-14 CN CN202310108079.9A patent/CN116607110A/zh active Pending
- 2023-02-15 TW TW112105315A patent/TW202346625A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TW202346625A (zh) | 2023-12-01 |
| CN116607110A (zh) | 2023-08-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100216542B1 (ko) | 펄스 레이저 증착장치용 멀티 타겟 구동장치 | |
| JP4001296B2 (ja) | 有機材料の真空蒸着方法およびその装置 | |
| WO2005111259A1 (ja) | 有機材料用蒸発源及び有機蒸着装置 | |
| JPH11200017A (ja) | 光学薄膜成膜装置およびこの光学薄膜成膜装置により成膜された光学素子 | |
| JP2023118312A (ja) | 蒸着装置 | |
| US20220195581A1 (en) | Source arrangement, deposition apparatus and method for depositing source material | |
| JP6008321B2 (ja) | 蒸着用シャッター装置及びこれを用いた成膜装置 | |
| JP6017799B2 (ja) | 電子ビーム蒸着装置 | |
| KR101846692B1 (ko) | 스피팅 방지 구조체를 구비한 증착장치용 증발원 | |
| JP4555638B2 (ja) | 薄膜蒸着装置 | |
| KR102337434B1 (ko) | 전자 빔 증발기, 코팅 장치 및 코팅 방법 | |
| JPWO2006075401A1 (ja) | 蒸発源及び蒸着装置 | |
| JP5193368B2 (ja) | 材料を蒸着する方法 | |
| JP4841872B2 (ja) | 蒸発源及び蒸着装置 | |
| JP2007100123A (ja) | 真空蒸着装置 | |
| JP2005082872A (ja) | 蒸着装置並びに蒸着方法 | |
| JP7454874B2 (ja) | 基板ホルダー搬送システム | |
| JP2006312765A (ja) | 真空蒸着装置 | |
| JP7223604B2 (ja) | 真空蒸着装置 | |
| JP2825822B2 (ja) | 蒸着膜形成装置、蒸着膜形成方法及びこれらにより形成された基板 | |
| JP6635492B1 (ja) | 基板回転装置 | |
| JP7253352B2 (ja) | 成膜装置、下地膜形成方法、および成膜方法 | |
| KR101958190B1 (ko) | 대형 코팅제품의 증착이 가능한 진공증착장치 | |
| JP2019002038A (ja) | 間接加熱蒸着源 | |
| JP4562493B2 (ja) | レーザーアブレーション装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20230331 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20231211 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20240105 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20240305 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20240507 |