JP2023054782A5 - - Google Patents
Info
- Publication number
- JP2023054782A5 JP2023054782A5 JP2022159447A JP2022159447A JP2023054782A5 JP 2023054782 A5 JP2023054782 A5 JP 2023054782A5 JP 2022159447 A JP2022159447 A JP 2022159447A JP 2022159447 A JP2022159447 A JP 2022159447A JP 2023054782 A5 JP2023054782 A5 JP 2023054782A5
- Authority
- JP
- Japan
- Prior art keywords
- measurement
- error
- test
- error amount
- shape
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102021211172.6 | 2021-10-04 | ||
| DE102021211172.6A DE102021211172B3 (de) | 2021-10-04 | 2021-10-04 | Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2023054782A JP2023054782A (ja) | 2023-04-14 |
| JP2023054782A5 true JP2023054782A5 (enExample) | 2025-10-15 |
Family
ID=85383786
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022159447A Pending JP2023054782A (ja) | 2021-10-04 | 2022-10-03 | 光学素子の表面形状を評価する方法及び装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US12292281B2 (enExample) |
| JP (1) | JP2023054782A (enExample) |
| CN (1) | CN115930820A (enExample) |
| DE (1) | DE102021211172B3 (enExample) |
| NL (1) | NL2033224B1 (enExample) |
| TW (1) | TW202323765A (enExample) |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5982490A (en) | 1997-02-04 | 1999-11-09 | Nikon Corporation | Apparatus and method for wavefront absolute calibration and method of synthesizing wavefronts |
| DE10058650A1 (de) | 2000-11-25 | 2002-05-29 | Zeiss Carl | Verfahren zur interferometrischen Messung von nichtrotationssymmetrischen Wellenfrontfehlern |
| US7277186B2 (en) * | 2000-11-25 | 2007-10-02 | Carl Zeiss Smt Ag | Method for the interferometric measurement of non-rotationally symmetric wavefront errors |
| US7324214B2 (en) * | 2003-03-06 | 2008-01-29 | Zygo Corporation | Interferometer and method for measuring characteristics of optically unresolved surface features |
| WO2006049638A2 (en) | 2004-02-06 | 2006-05-11 | Zygo Corporation | Precision surface measurement |
| JP5027450B2 (ja) * | 2006-06-15 | 2012-09-19 | パナソニック株式会社 | 形状測定方法 |
| DE102017217371A1 (de) | 2017-09-29 | 2019-04-04 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements |
-
2021
- 2021-10-04 DE DE102021211172.6A patent/DE102021211172B3/de active Active
-
2022
- 2022-10-03 JP JP2022159447A patent/JP2023054782A/ja active Pending
- 2022-10-03 TW TW111137542A patent/TW202323765A/zh unknown
- 2022-10-04 NL NL2033224A patent/NL2033224B1/en active
- 2022-10-04 US US17/959,779 patent/US12292281B2/en active Active
- 2022-10-08 CN CN202211222503.4A patent/CN115930820A/zh active Pending
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