TW202323765A - 用於特徵化光學元件之表面形狀的方法與裝置 - Google Patents

用於特徵化光學元件之表面形狀的方法與裝置 Download PDF

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Publication number
TW202323765A
TW202323765A TW111137542A TW111137542A TW202323765A TW 202323765 A TW202323765 A TW 202323765A TW 111137542 A TW111137542 A TW 111137542A TW 111137542 A TW111137542 A TW 111137542A TW 202323765 A TW202323765 A TW 202323765A
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TW
Taiwan
Prior art keywords
test
measurements
corrected
error
measurement
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TW111137542A
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English (en)
Chinese (zh)
Inventor
雷吉娜 克魯斯
Original Assignee
德商卡爾蔡司Ｓｍｔ有限公司
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Publication of TW202323765A publication Critical patent/TW202323765A/zh

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02061—Reduction or prevention of effects of tilts or misalignment
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02059—Reducing effect of parasitic reflections, e.g. cyclic errors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02083—Interferometers characterised by particular signal processing and presentation
    • G01B9/02087—Combining two or more images of the same region
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/005—Testing of reflective surfaces, e.g. mirrors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
    • G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
    • G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Geometry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Character Input (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
TW111137542A 2021-10-04 2022-10-03 用於特徵化光學元件之表面形狀的方法與裝置 TW202323765A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102021211172.6 2021-10-04
DE102021211172.6A DE102021211172B3 (de) 2021-10-04 2021-10-04 Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements

Publications (1)

Publication Number Publication Date
TW202323765A true TW202323765A (zh) 2023-06-16

Family

ID=85383786

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111137542A TW202323765A (zh) 2021-10-04 2022-10-03 用於特徵化光學元件之表面形狀的方法與裝置

Country Status (6)

Country Link
US (1) US12292281B2 (enExample)
JP (1) JP2023054782A (enExample)
CN (1) CN115930820A (enExample)
DE (1) DE102021211172B3 (enExample)
NL (1) NL2033224B1 (enExample)
TW (1) TW202323765A (enExample)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5982490A (en) 1997-02-04 1999-11-09 Nikon Corporation Apparatus and method for wavefront absolute calibration and method of synthesizing wavefronts
DE10058650A1 (de) 2000-11-25 2002-05-29 Zeiss Carl Verfahren zur interferometrischen Messung von nichtrotationssymmetrischen Wellenfrontfehlern
US7277186B2 (en) * 2000-11-25 2007-10-02 Carl Zeiss Smt Ag Method for the interferometric measurement of non-rotationally symmetric wavefront errors
US7324214B2 (en) * 2003-03-06 2008-01-29 Zygo Corporation Interferometer and method for measuring characteristics of optically unresolved surface features
WO2006049638A2 (en) 2004-02-06 2006-05-11 Zygo Corporation Precision surface measurement
JP5027450B2 (ja) * 2006-06-15 2012-09-19 パナソニック株式会社 形状測定方法
DE102017217371A1 (de) 2017-09-29 2019-04-04 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements

Also Published As

Publication number Publication date
DE102021211172B3 (de) 2023-03-23
NL2033224A (en) 2023-04-13
JP2023054782A (ja) 2023-04-14
CN115930820A (zh) 2023-04-07
US12292281B2 (en) 2025-05-06
NL2033224B1 (en) 2024-05-30
US20230108466A1 (en) 2023-04-06

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