NL2033224B1 - Method and device for characterizing the surface shape of an optical element - Google Patents
Method and device for characterizing the surface shape of an optical element Download PDFInfo
- Publication number
- NL2033224B1 NL2033224B1 NL2033224A NL2033224A NL2033224B1 NL 2033224 B1 NL2033224 B1 NL 2033224B1 NL 2033224 A NL2033224 A NL 2033224A NL 2033224 A NL2033224 A NL 2033224A NL 2033224 B1 NL2033224 B1 NL 2033224B1
- Authority
- NL
- Netherlands
- Prior art keywords
- test
- corrected
- measurement
- test object
- measured values
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 92
- 230000003287 optical effect Effects 0.000 title claims abstract description 46
- 238000012360 testing method Methods 0.000 claims abstract description 195
- 238000005259 measurement Methods 0.000 claims abstract description 115
- 238000011156 evaluation Methods 0.000 claims description 17
- 238000012935 Averaging Methods 0.000 description 10
- 238000012937 correction Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 4
- 238000004364 calculation method Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 239000002346 layers by function Substances 0.000 description 3
- 238000013459 approach Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000001393 microlithography Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000004441 surface measurement Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
- G01B9/02061—Reduction or prevention of effects of tilts or misalignment
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
- G01B9/02059—Reducing effect of parasitic reflections, e.g. cyclic errors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02083—Interferometers characterised by particular signal processing and presentation
- G01B9/02087—Combining two or more images of the same region
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/005—Testing of reflective surfaces, e.g. mirrors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
- G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
- G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
- G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Signal Processing (AREA)
- Geometry (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Character Input (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102021211172.6A DE102021211172B3 (de) | 2021-10-04 | 2021-10-04 | Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| NL2033224A NL2033224A (en) | 2023-04-13 |
| NL2033224B1 true NL2033224B1 (en) | 2024-05-30 |
Family
ID=85383786
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2033224A NL2033224B1 (en) | 2021-10-04 | 2022-10-04 | Method and device for characterizing the surface shape of an optical element |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US12292281B2 (enExample) |
| JP (1) | JP2023054782A (enExample) |
| CN (1) | CN115930820A (enExample) |
| DE (1) | DE102021211172B3 (enExample) |
| NL (1) | NL2033224B1 (enExample) |
| TW (1) | TW202323765A (enExample) |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5982490A (en) | 1997-02-04 | 1999-11-09 | Nikon Corporation | Apparatus and method for wavefront absolute calibration and method of synthesizing wavefronts |
| DE10058650A1 (de) | 2000-11-25 | 2002-05-29 | Zeiss Carl | Verfahren zur interferometrischen Messung von nichtrotationssymmetrischen Wellenfrontfehlern |
| US7277186B2 (en) * | 2000-11-25 | 2007-10-02 | Carl Zeiss Smt Ag | Method for the interferometric measurement of non-rotationally symmetric wavefront errors |
| US7324214B2 (en) * | 2003-03-06 | 2008-01-29 | Zygo Corporation | Interferometer and method for measuring characteristics of optically unresolved surface features |
| WO2006049638A2 (en) | 2004-02-06 | 2006-05-11 | Zygo Corporation | Precision surface measurement |
| JP5027450B2 (ja) * | 2006-06-15 | 2012-09-19 | パナソニック株式会社 | 形状測定方法 |
| DE102017217371A1 (de) | 2017-09-29 | 2019-04-04 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements |
-
2021
- 2021-10-04 DE DE102021211172.6A patent/DE102021211172B3/de active Active
-
2022
- 2022-10-03 JP JP2022159447A patent/JP2023054782A/ja active Pending
- 2022-10-03 TW TW111137542A patent/TW202323765A/zh unknown
- 2022-10-04 NL NL2033224A patent/NL2033224B1/en active
- 2022-10-04 US US17/959,779 patent/US12292281B2/en active Active
- 2022-10-08 CN CN202211222503.4A patent/CN115930820A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE102021211172B3 (de) | 2023-03-23 |
| NL2033224A (en) | 2023-04-13 |
| JP2023054782A (ja) | 2023-04-14 |
| CN115930820A (zh) | 2023-04-07 |
| US12292281B2 (en) | 2025-05-06 |
| TW202323765A (zh) | 2023-06-16 |
| US20230108466A1 (en) | 2023-04-06 |
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