CN115930820A - 用于表征光学元件的表面形状的方法和装置 - Google Patents

用于表征光学元件的表面形状的方法和装置 Download PDF

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Publication number
CN115930820A
CN115930820A CN202211222503.4A CN202211222503A CN115930820A CN 115930820 A CN115930820 A CN 115930820A CN 202211222503 A CN202211222503 A CN 202211222503A CN 115930820 A CN115930820 A CN 115930820A
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CN
China
Prior art keywords
measurement
pattern
test
corrected
test object
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202211222503.4A
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English (en)
Chinese (zh)
Inventor
R.库尔斯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of CN115930820A publication Critical patent/CN115930820A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02061—Reduction or prevention of effects of tilts or misalignment
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02059—Reducing effect of parasitic reflections, e.g. cyclic errors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02083—Interferometers characterised by particular signal processing and presentation
    • G01B9/02087—Combining two or more images of the same region
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/005—Testing of reflective surfaces, e.g. mirrors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
    • G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
    • G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Geometry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Character Input (AREA)
CN202211222503.4A 2021-10-04 2022-10-08 用于表征光学元件的表面形状的方法和装置 Pending CN115930820A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102021211172.6A DE102021211172B3 (de) 2021-10-04 2021-10-04 Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements
DE102021211172.6 2021-10-04

Publications (1)

Publication Number Publication Date
CN115930820A true CN115930820A (zh) 2023-04-07

Family

ID=85383786

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202211222503.4A Pending CN115930820A (zh) 2021-10-04 2022-10-08 用于表征光学元件的表面形状的方法和装置

Country Status (6)

Country Link
US (1) US12292281B2 (enExample)
JP (1) JP2023054782A (enExample)
CN (1) CN115930820A (enExample)
DE (1) DE102021211172B3 (enExample)
NL (1) NL2033224B1 (enExample)
TW (1) TW202323765A (enExample)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5982490A (en) 1997-02-04 1999-11-09 Nikon Corporation Apparatus and method for wavefront absolute calibration and method of synthesizing wavefronts
US7277186B2 (en) * 2000-11-25 2007-10-02 Carl Zeiss Smt Ag Method for the interferometric measurement of non-rotationally symmetric wavefront errors
DE10058650A1 (de) 2000-11-25 2002-05-29 Zeiss Carl Verfahren zur interferometrischen Messung von nichtrotationssymmetrischen Wellenfrontfehlern
US7324214B2 (en) * 2003-03-06 2008-01-29 Zygo Corporation Interferometer and method for measuring characteristics of optically unresolved surface features
WO2006049638A2 (en) 2004-02-06 2006-05-11 Zygo Corporation Precision surface measurement
JP5027450B2 (ja) * 2006-06-15 2012-09-19 パナソニック株式会社 形状測定方法
DE102017217371A1 (de) 2017-09-29 2019-04-04 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements

Also Published As

Publication number Publication date
US20230108466A1 (en) 2023-04-06
NL2033224B1 (en) 2024-05-30
JP2023054782A (ja) 2023-04-14
DE102021211172B3 (de) 2023-03-23
TW202323765A (zh) 2023-06-16
US12292281B2 (en) 2025-05-06
NL2033224A (en) 2023-04-13

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