JP2023036721A5 - - Google Patents

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Publication number
JP2023036721A5
JP2023036721A5 JP2022199852A JP2022199852A JP2023036721A5 JP 2023036721 A5 JP2023036721 A5 JP 2023036721A5 JP 2022199852 A JP2022199852 A JP 2022199852A JP 2022199852 A JP2022199852 A JP 2022199852A JP 2023036721 A5 JP2023036721 A5 JP 2023036721A5
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JP
Japan
Prior art keywords
support table
support
support element
reaction chamber
substrate
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JP2022199852A
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English (en)
Japanese (ja)
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JP2023036721A (ja
JP7556927B2 (ja
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Priority claimed from FI20215556A external-priority patent/FI130021B/en
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Publication of JP2023036721A publication Critical patent/JP2023036721A/ja
Publication of JP2023036721A5 publication Critical patent/JP2023036721A5/ja
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Publication of JP7556927B2 publication Critical patent/JP7556927B2/ja
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JP2022199852A 2021-05-10 2022-12-15 基板処理装置及び方法 Active JP7556927B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FI20215556A FI130021B (en) 2021-05-10 2021-05-10 Substrate processing apparatus and method
FI20215556 2021-05-10
JP2022071232A JP7197739B2 (ja) 2021-05-10 2022-04-25 基板処理装置及び方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2022071232A Division JP7197739B2 (ja) 2021-05-10 2022-04-25 基板処理装置及び方法

Publications (3)

Publication Number Publication Date
JP2023036721A JP2023036721A (ja) 2023-03-14
JP2023036721A5 true JP2023036721A5 (https=) 2023-04-21
JP7556927B2 JP7556927B2 (ja) 2024-09-26

Family

ID=81654699

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2022071232A Active JP7197739B2 (ja) 2021-05-10 2022-04-25 基板処理装置及び方法
JP2022199852A Active JP7556927B2 (ja) 2021-05-10 2022-12-15 基板処理装置及び方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2022071232A Active JP7197739B2 (ja) 2021-05-10 2022-04-25 基板処理装置及び方法

Country Status (8)

Country Link
US (1) US12247288B2 (https=)
EP (1) EP4338191A1 (https=)
JP (2) JP7197739B2 (https=)
KR (2) KR102527108B1 (https=)
CN (2) CN118360593A (https=)
FI (1) FI130021B (https=)
TW (2) TWI892012B (https=)
WO (1) WO2022238622A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI130020B (en) * 2021-05-10 2022-12-30 Picosun Oy Substrate processing apparatus and method

Family Cites Families (39)

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US20100101491A1 (en) * 2008-10-29 2010-04-29 Asm Japan K.K. Wafer lift pins suspended and supported at underside of susceptor
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US11725279B2 (en) * 2017-02-08 2023-08-15 Picosun Oy Deposition or cleaning apparatus with movable structure
KR102585074B1 (ko) 2017-11-11 2023-10-04 마이크로머티어리얼즈 엘엘씨 고압 프로세싱 챔버를 위한 가스 전달 시스템
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JP7403234B2 (ja) * 2019-04-25 2023-12-22 東京エレクトロン株式会社 基板処理装置、及び基板処理方法
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