JP2023036721A5 - - Google Patents
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- Publication number
- JP2023036721A5 JP2023036721A5 JP2022199852A JP2022199852A JP2023036721A5 JP 2023036721 A5 JP2023036721 A5 JP 2023036721A5 JP 2022199852 A JP2022199852 A JP 2022199852A JP 2022199852 A JP2022199852 A JP 2022199852A JP 2023036721 A5 JP2023036721 A5 JP 2023036721A5
- Authority
- JP
- Japan
- Prior art keywords
- support table
- support
- support element
- reaction chamber
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FI20215556A FI130021B (en) | 2021-05-10 | 2021-05-10 | Substrate processing apparatus and method |
| FI20215556 | 2021-05-10 | ||
| JP2022071232A JP7197739B2 (ja) | 2021-05-10 | 2022-04-25 | 基板処理装置及び方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022071232A Division JP7197739B2 (ja) | 2021-05-10 | 2022-04-25 | 基板処理装置及び方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2023036721A JP2023036721A (ja) | 2023-03-14 |
| JP2023036721A5 true JP2023036721A5 (cg-RX-API-DMAC7.html) | 2023-04-21 |
| JP7556927B2 JP7556927B2 (ja) | 2024-09-26 |
Family
ID=81654699
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022071232A Active JP7197739B2 (ja) | 2021-05-10 | 2022-04-25 | 基板処理装置及び方法 |
| JP2022199852A Active JP7556927B2 (ja) | 2021-05-10 | 2022-12-15 | 基板処理装置及び方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022071232A Active JP7197739B2 (ja) | 2021-05-10 | 2022-04-25 | 基板処理装置及び方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US12247288B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP4338191A1 (cg-RX-API-DMAC7.html) |
| JP (2) | JP7197739B2 (cg-RX-API-DMAC7.html) |
| KR (2) | KR102527108B1 (cg-RX-API-DMAC7.html) |
| CN (2) | CN118360593A (cg-RX-API-DMAC7.html) |
| FI (1) | FI130021B (cg-RX-API-DMAC7.html) |
| TW (2) | TWI892012B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2022238622A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FI130020B (en) * | 2021-05-10 | 2022-12-30 | Picosun Oy | Substrate processing apparatus and method |
Family Cites Families (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1275535A (en) | 1971-03-03 | 1972-05-24 | Ibm | Improvements in digital electric data processing apparatus |
| US5156820A (en) * | 1989-05-15 | 1992-10-20 | Rapro Technology, Inc. | Reaction chamber with controlled radiant energy heating and distributed reactant flow |
| US5148714A (en) * | 1990-10-24 | 1992-09-22 | Ag Processing Technology, Inc. | Rotary/linear actuator for closed chamber, and reaction chamber utilizing same |
| US5730801A (en) * | 1994-08-23 | 1998-03-24 | Applied Materials, Inc. | Compartnetalized substrate processing chamber |
| US5558717A (en) | 1994-11-30 | 1996-09-24 | Applied Materials | CVD Processing chamber |
| US5772770A (en) * | 1995-01-27 | 1998-06-30 | Kokusai Electric Co, Ltd. | Substrate processing apparatus |
| JPH0913172A (ja) * | 1995-06-28 | 1997-01-14 | Ulvac Japan Ltd | 真空装置用昇降機構 |
| US6527865B1 (en) | 1997-09-11 | 2003-03-04 | Applied Materials, Inc. | Temperature controlled gas feedthrough |
| US6146504A (en) | 1998-05-21 | 2000-11-14 | Applied Materials, Inc. | Substrate support and lift apparatus and method |
| JP3398936B2 (ja) * | 1999-04-09 | 2003-04-21 | 日本エー・エス・エム株式会社 | 半導体処理装置 |
| US6767176B2 (en) | 2001-06-29 | 2004-07-27 | Applied Materials, Inc. | Lift pin actuating mechanism for semiconductor processing chamber |
| US20040177813A1 (en) | 2003-03-12 | 2004-09-16 | Applied Materials, Inc. | Substrate support lift mechanism |
| US7070661B2 (en) | 2003-08-22 | 2006-07-04 | Axcelis Technologies, Inc. | Uniform gas cushion wafer support |
| KR100550803B1 (ko) | 2004-06-17 | 2006-02-09 | 주식회사 에이디피엔지니어링 | 플라즈마 식각장비 |
| US20100136773A1 (en) * | 2005-08-10 | 2010-06-03 | Naonori Akae | Semiconductor Device Manufacturing Method and Substrate Processing Apparatus |
| US7959735B2 (en) | 2007-02-08 | 2011-06-14 | Applied Materials, Inc. | Susceptor with insulative inserts |
| US8435379B2 (en) * | 2007-05-08 | 2013-05-07 | Applied Materials, Inc. | Substrate cleaning chamber and cleaning and conditioning methods |
| JP5412759B2 (ja) | 2008-07-31 | 2014-02-12 | 株式会社Ｓｕｍｃｏ | エピタキシャルウェーハの保持具及びそのウェーハの製造方法 |
| US20100101491A1 (en) * | 2008-10-29 | 2010-04-29 | Asm Japan K.K. | Wafer lift pins suspended and supported at underside of susceptor |
| US8404048B2 (en) | 2011-03-11 | 2013-03-26 | Applied Materials, Inc. | Off-angled heating of the underside of a substrate using a lamp assembly |
| US20140007808A1 (en) | 2011-07-05 | 2014-01-09 | Epicrew Corporation | Susceptor Device And Deposition Apparatus Having The Same |
| WO2013162774A1 (en) | 2012-04-27 | 2013-10-31 | Applied Materials, Inc. | Method and apparatus for independent wafer handling |
| US20130333616A1 (en) | 2012-06-18 | 2013-12-19 | Tel Solar Ag | Plasma processing system with movable chamber housing parts |
| US9117866B2 (en) | 2012-07-31 | 2015-08-25 | Asm Ip Holding B.V. | Apparatus and method for calculating a wafer position in a processing chamber under process conditions |
| RU2620230C2 (ru) | 2012-11-23 | 2017-05-23 | Пикосан Ой | Способ загрузки подложки в реактор асо |
| JP6112474B2 (ja) | 2013-05-09 | 2017-04-12 | 信越半導体株式会社 | ウェーハ昇降装置、エピタキシャルウェーハの製造方法 |
| SG11201610311SA (en) | 2014-07-11 | 2017-01-27 | Applied Materials Inc | Apparatus and methods for alignment of a susceptor |
| KR102425455B1 (ko) | 2015-01-09 | 2022-07-27 | 어플라이드 머티어리얼스, 인코포레이티드 | 기판 이송 메커니즘들 |
| JP6596362B2 (ja) | 2015-12-02 | 2019-10-23 | 東京エレクトロン株式会社 | 減圧された空間において被加工物を処理する処理装置 |
| US11725279B2 (en) * | 2017-02-08 | 2023-08-15 | Picosun Oy | Deposition or cleaning apparatus with movable structure |
| KR102585074B1 (ko) | 2017-11-11 | 2023-10-04 | 마이크로머티어리얼즈 엘엘씨 | 고압 프로세싱 챔버를 위한 가스 전달 시스템 |
| US20190341233A1 (en) | 2018-05-02 | 2019-11-07 | Applied Materials, Inc. | Semiconductor substrate processing apparatus and method |
| US11434569B2 (en) * | 2018-05-25 | 2022-09-06 | Applied Materials, Inc. | Ground path systems for providing a shorter and symmetrical ground path |
| JP7135841B2 (ja) | 2018-12-25 | 2022-09-13 | 株式会社Sumco | ウェーハ移載装置、気相成長装置、ウェーハ移載方法およびエピタキシャルシリコンウェーハの製造方法 |
| JP7403234B2 (ja) * | 2019-04-25 | 2023-12-22 | 東京エレクトロン株式会社 | 基板処理装置、及び基板処理方法 |
| US11887878B2 (en) | 2019-06-28 | 2024-01-30 | Applied Materials, Inc. | Detachable biasable electrostatic chuck for high temperature applications |
| JP2021012944A (ja) | 2019-07-05 | 2021-02-04 | 東京エレクトロン株式会社 | 基板処理装置及び基板の受け渡し方法 |
| FI129609B (en) * | 2020-01-10 | 2022-05-31 | Picosun Oy | Substrate processing apparatus |
| KR200495807Y1 (ko) | 2020-03-13 | 2022-08-24 | 주식회사 지아이엘 | 독서대 |
-
2021
- 2021-05-10 FI FI20215556A patent/FI130021B/en active
-
2022
- 2022-04-25 JP JP2022071232A patent/JP7197739B2/ja active Active
- 2022-05-02 US US17/734,615 patent/US12247288B2/en active Active
- 2022-05-05 CN CN202410507817.1A patent/CN118360593A/zh active Pending
- 2022-05-05 CN CN202210483077.3A patent/CN115323356B/zh active Active
- 2022-05-06 TW TW111117191A patent/TWI892012B/zh active
- 2022-05-06 KR KR1020220055863A patent/KR102527108B1/ko active Active
- 2022-05-06 TW TW114126174A patent/TW202543039A/zh unknown
- 2022-05-10 EP EP22723708.8A patent/EP4338191A1/en not_active Withdrawn
- 2022-05-10 WO PCT/FI2022/050315 patent/WO2022238622A1/en not_active Ceased
- 2022-12-15 JP JP2022199852A patent/JP7556927B2/ja active Active
-
2023
- 2023-04-25 KR KR1020230053873A patent/KR20230061314A/ko active Pending
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