JP2023020517A - 転写フィルム及び導体パターンを有する積層体の製造方法 - Google Patents

転写フィルム及び導体パターンを有する積層体の製造方法 Download PDF

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Publication number
JP2023020517A
JP2023020517A JP2021125917A JP2021125917A JP2023020517A JP 2023020517 A JP2023020517 A JP 2023020517A JP 2021125917 A JP2021125917 A JP 2021125917A JP 2021125917 A JP2021125917 A JP 2021125917A JP 2023020517 A JP2023020517 A JP 2023020517A
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JP
Japan
Prior art keywords
group
photosensitive composition
transfer film
mass
composition layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2021125917A
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English (en)
Japanese (ja)
Inventor
邦彦 児玉
Kunihiko Kodama
知樹 松田
Tomoki Matsuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2021125917A priority Critical patent/JP2023020517A/ja
Priority to TW111123660A priority patent/TW202307026A/zh
Priority to KR1020220078738A priority patent/KR20230019012A/ko
Priority to CN202210805407.6A priority patent/CN115685672A/zh
Publication of JP2023020517A publication Critical patent/JP2023020517A/ja
Abandoned legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP2021125917A 2021-07-30 2021-07-30 転写フィルム及び導体パターンを有する積層体の製造方法 Abandoned JP2023020517A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2021125917A JP2023020517A (ja) 2021-07-30 2021-07-30 転写フィルム及び導体パターンを有する積層体の製造方法
TW111123660A TW202307026A (zh) 2021-07-30 2022-06-24 轉印膜及具有導體圖案之積層體之製造方法
KR1020220078738A KR20230019012A (ko) 2021-07-30 2022-06-28 전사 필름 및 도체 패턴을 갖는 적층체의 제조 방법
CN202210805407.6A CN115685672A (zh) 2021-07-30 2022-07-08 转印膜及具有导体图案的层叠体的制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2021125917A JP2023020517A (ja) 2021-07-30 2021-07-30 転写フィルム及び導体パターンを有する積層体の製造方法

Publications (1)

Publication Number Publication Date
JP2023020517A true JP2023020517A (ja) 2023-02-09

Family

ID=85060362

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021125917A Abandoned JP2023020517A (ja) 2021-07-30 2021-07-30 転写フィルム及び導体パターンを有する積層体の製造方法

Country Status (4)

Country Link
JP (1) JP2023020517A (ko)
KR (1) KR20230019012A (ko)
CN (1) CN115685672A (ko)
TW (1) TW202307026A (ko)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4765974B2 (ja) 2006-03-30 2011-09-07 Ｊｓｒ株式会社 ネガ型感放射線性樹脂組成物

Also Published As

Publication number Publication date
TW202307026A (zh) 2023-02-16
KR20230019012A (ko) 2023-02-07
CN115685672A (zh) 2023-02-03

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