JP2023017577A5 - - Google Patents
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- JP2023017577A5 JP2023017577A5 JP2021121925A JP2021121925A JP2023017577A5 JP 2023017577 A5 JP2023017577 A5 JP 2023017577A5 JP 2021121925 A JP2021121925 A JP 2021121925A JP 2021121925 A JP2021121925 A JP 2021121925A JP 2023017577 A5 JP2023017577 A5 JP 2023017577A5
- Authority
- JP
- Japan
- Prior art keywords
- discharge
- sub
- fluid
- substrate
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000012545 processing Methods 0.000 claims description 187
- 239000000758 substrate Substances 0.000 claims description 172
- 239000012530 fluid Substances 0.000 claims description 141
- 238000009826 distribution Methods 0.000 claims description 68
- 238000000034 method Methods 0.000 claims description 45
- 238000003672 processing method Methods 0.000 claims description 25
- 230000007246 mechanism Effects 0.000 claims description 16
- 239000007788 liquid Substances 0.000 claims description 13
- 238000007599 discharging Methods 0.000 claims description 10
- 238000001035 drying Methods 0.000 claims description 8
- 238000013459 approach Methods 0.000 claims 1
- 230000001419 dependent effect Effects 0.000 claims 1
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 156
- 229910002092 carbon dioxide Inorganic materials 0.000 description 78
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 75
- 230000008569 process Effects 0.000 description 40
- 238000000352 supercritical drying Methods 0.000 description 20
- 239000000126 substance Substances 0.000 description 18
- 238000012546 transfer Methods 0.000 description 11
- 230000004048 modification Effects 0.000 description 10
- 238000012986 modification Methods 0.000 description 10
- 239000002245 particle Substances 0.000 description 10
- 238000003860 storage Methods 0.000 description 9
- 239000013598 vector Substances 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- 230000006870 function Effects 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 7
- 239000001569 carbon dioxide Substances 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000011144 upstream manufacturing Methods 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- 241000473391 Archosargus rhomboidalis Species 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021121925A JP7529629B2 (ja) | 2021-07-26 | 2021-07-26 | 基板処理方法および基板処理装置 |
| TW111126769A TW202320200A (zh) | 2021-07-26 | 2022-07-18 | 基板處理方法及基板處理裝置 |
| KR1020220088931A KR20230016595A (ko) | 2021-07-26 | 2022-07-19 | 기판 처리 방법 및 기판 처리 장치 |
| CN202210873730.7A CN115692172A (zh) | 2021-07-26 | 2022-07-21 | 基板处理方法和基板处理装置 |
| US17/814,267 US12456632B2 (en) | 2021-07-26 | 2022-07-22 | Substrate processing method and substrate processing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021121925A JP7529629B2 (ja) | 2021-07-26 | 2021-07-26 | 基板処理方法および基板処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2023017577A JP2023017577A (ja) | 2023-02-07 |
| JP2023017577A5 true JP2023017577A5 (https=) | 2023-06-22 |
| JP7529629B2 JP7529629B2 (ja) | 2024-08-06 |
Family
ID=84976455
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021121925A Active JP7529629B2 (ja) | 2021-07-26 | 2021-07-26 | 基板処理方法および基板処理装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US12456632B2 (https=) |
| JP (1) | JP7529629B2 (https=) |
| KR (1) | KR20230016595A (https=) |
| CN (1) | CN115692172A (https=) |
| TW (1) | TW202320200A (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20250087501A1 (en) * | 2021-08-05 | 2025-03-13 | Tokyo Electron Limited | Substrate processing method and substrate processing apparatus |
| WO2025018134A1 (ja) * | 2023-07-14 | 2025-01-23 | 東京エレクトロン株式会社 | 基板処理装置及び基板処理方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3868804B2 (ja) * | 2001-11-27 | 2007-01-17 | アルプス電気株式会社 | 基板乾燥装置及びそれを用いた基板乾燥方法 |
| US9257319B2 (en) * | 2011-06-03 | 2016-02-09 | Tel Nexx, Inc. | Parallel single substrate processing system with alignment features on a process section frame |
| JP5544666B2 (ja) * | 2011-06-30 | 2014-07-09 | セメス株式会社 | 基板処理装置 |
| JP2013062417A (ja) * | 2011-09-14 | 2013-04-04 | Toshiba Corp | 半導体基板の超臨界乾燥方法及び装置 |
| JP2014101241A (ja) | 2012-11-19 | 2014-06-05 | Japan Organo Co Ltd | 精製二酸化炭素の供給システムおよび方法 |
| JP7080134B2 (ja) * | 2018-08-07 | 2022-06-03 | 東京エレクトロン株式会社 | 基板処理装置のパーティクル除去方法および基板処理装置 |
-
2021
- 2021-07-26 JP JP2021121925A patent/JP7529629B2/ja active Active
-
2022
- 2022-07-18 TW TW111126769A patent/TW202320200A/zh unknown
- 2022-07-19 KR KR1020220088931A patent/KR20230016595A/ko active Pending
- 2022-07-21 CN CN202210873730.7A patent/CN115692172A/zh active Pending
- 2022-07-22 US US17/814,267 patent/US12456632B2/en active Active
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