JP2022526980A5 - - Google Patents
Info
- Publication number
- JP2022526980A5 JP2022526980A5 JP2021559101A JP2021559101A JP2022526980A5 JP 2022526980 A5 JP2022526980 A5 JP 2022526980A5 JP 2021559101 A JP2021559101 A JP 2021559101A JP 2021559101 A JP2021559101 A JP 2021559101A JP 2022526980 A5 JP2022526980 A5 JP 2022526980A5
- Authority
- JP
- Japan
- Prior art keywords
- heat
- dielectric window
- conical structure
- conducting fluid
- cooling system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201962830896P | 2019-04-08 | 2019-04-08 | |
| US62/830,896 | 2019-04-08 | ||
| PCT/US2020/027081 WO2020210240A1 (en) | 2019-04-08 | 2020-04-07 | Cooling for a plasma-based reactor |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2022526980A JP2022526980A (ja) | 2022-05-27 |
| JP2022526980A5 true JP2022526980A5 (enExample) | 2023-05-02 |
| JP7461965B2 JP7461965B2 (ja) | 2024-04-04 |
Family
ID=72751778
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021559101A Active JP7461965B2 (ja) | 2019-04-08 | 2020-04-07 | プラズマ系反応器のための冷却 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US11676798B2 (enExample) |
| JP (1) | JP7461965B2 (enExample) |
| KR (1) | KR102606056B1 (enExample) |
| CN (1) | CN113661560B (enExample) |
| TW (2) | TWI834857B (enExample) |
| WO (1) | WO2020210240A1 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11676798B2 (en) | 2019-04-08 | 2023-06-13 | Lam Research Corporation | Cooling for a plasma-based reactor |
| US11894152B2 (en) * | 2021-05-05 | 2024-02-06 | Westinghouse Electric Company Llc | Modular thermal and radiation shielding with passive heat removal |
| CN116168997A (zh) * | 2021-11-24 | 2023-05-26 | 上海华力集成电路制造有限公司 | 一种改善刻蚀中等离子体分布的方法 |
Family Cites Families (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5342266U (enExample) * | 1976-09-17 | 1978-04-12 | ||
| JPS57145167U (enExample) * | 1981-03-03 | 1982-09-11 | ||
| JPH0590214A (ja) * | 1991-09-30 | 1993-04-09 | Tokyo Ohka Kogyo Co Ltd | 同軸型プラズマ処理装置 |
| JPH05256589A (ja) * | 1992-01-14 | 1993-10-05 | Furukawa Electric Co Ltd:The | 筐体のヒ−トパイプ式冷却構造 |
| TW293983B (enExample) * | 1993-12-17 | 1996-12-21 | Tokyo Electron Co Ltd | |
| US5944899A (en) * | 1996-08-22 | 1999-08-31 | Applied Materials, Inc. | Inductively coupled plasma processing chamber |
| US6287435B1 (en) * | 1998-05-06 | 2001-09-11 | Tokyo Electron Limited | Method and apparatus for ionized physical vapor deposition |
| US6326597B1 (en) * | 1999-04-15 | 2001-12-04 | Applied Materials, Inc. | Temperature control system for process chamber |
| US7030335B2 (en) * | 2000-03-17 | 2006-04-18 | Applied Materials, Inc. | Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression |
| US6550531B1 (en) * | 2000-05-16 | 2003-04-22 | Intel Corporation | Vapor chamber active heat sink |
| FR2815888B1 (fr) * | 2000-10-27 | 2003-05-30 | Air Liquide | Dispositif de traitement de gaz par plasma |
| JP2002270599A (ja) | 2001-03-13 | 2002-09-20 | Canon Inc | プラズマ処理装置 |
| US6652711B2 (en) | 2001-06-06 | 2003-11-25 | Tokyo Electron Limited | Inductively-coupled plasma processing system |
| JP4008728B2 (ja) * | 2002-03-20 | 2007-11-14 | 株式会社 液晶先端技術開発センター | プラズマ処理装置 |
| JP4163437B2 (ja) * | 2002-04-17 | 2008-10-08 | 松下電器産業株式会社 | プラズマ処理装置用誘電体窓 |
| US7163603B2 (en) * | 2002-06-24 | 2007-01-16 | Tokyo Electron Limited | Plasma source assembly and method of manufacture |
| JP4381963B2 (ja) * | 2003-11-19 | 2009-12-09 | パナソニック株式会社 | プラズマ処理装置 |
| KR20050079860A (ko) * | 2004-02-07 | 2005-08-11 | 삼성전자주식회사 | 마이크로 웨이브 공급장치, 이를 이용한 플라즈마공정장치 및 플라즈마 공정방법 |
| JP2005322771A (ja) | 2004-05-10 | 2005-11-17 | Matsushita Electric Ind Co Ltd | 熱拡散装置 |
| US7527713B2 (en) * | 2004-05-26 | 2009-05-05 | Applied Materials, Inc. | Variable quadruple electromagnet array in plasma processing |
| US20060222034A1 (en) * | 2005-03-31 | 2006-10-05 | Cymer, Inc. | 6 Khz and above gas discharge laser system |
| US8440049B2 (en) * | 2006-05-03 | 2013-05-14 | Applied Materials, Inc. | Apparatus for etching high aspect ratio features |
| EP2231324B1 (en) * | 2007-12-18 | 2016-06-29 | Dow Technology Investments LLC | Tube reactor |
| JP2010016225A (ja) | 2008-07-04 | 2010-01-21 | Tokyo Electron Ltd | 温度調節機構および温度調節機構を用いた半導体製造装置 |
| GB201013881D0 (en) * | 2010-08-19 | 2010-10-06 | Oxford Yasa Motors Ltd | Electric machine - construction |
| US20120062866A1 (en) * | 2010-09-03 | 2012-03-15 | Nikon Corporation | Microchannel-cooled coils of electromagnetic actuators exhibiting reduced eddy-current drag |
| CN102141351B (zh) | 2011-04-24 | 2012-08-08 | 广州大学 | 一种热管 |
| US9530656B2 (en) | 2011-10-07 | 2016-12-27 | Lam Research Corporation | Temperature control in RF chamber with heater and air amplifier |
| US9978565B2 (en) | 2011-10-07 | 2018-05-22 | Lam Research Corporation | Systems for cooling RF heated chamber components |
| EP2994926A1 (en) | 2013-05-06 | 2016-03-16 | Greatcell Solar S.A. | Organic-inorganic perovskite based solar cell |
| US10249475B2 (en) | 2014-04-01 | 2019-04-02 | Applied Materials, Inc. | Cooling mechanism utlized in a plasma reactor with enhanced temperature regulation |
| KR102262657B1 (ko) * | 2014-10-13 | 2021-06-08 | 삼성전자주식회사 | 플라즈마 처리 장치 |
| KR20180025838A (ko) * | 2014-12-23 | 2018-03-09 | 시텍 게엠베하 | 기계적으로 유동화되는 증착 시스템들 및 방법들 |
| GB201619987D0 (en) | 2016-11-25 | 2017-01-11 | Iceotope Ltd | Fluid cooling system |
| CN206329930U (zh) | 2016-11-29 | 2017-07-14 | 盐城市新亚自控设备股份有限公司 | 一种led阵列器件的冷却装置 |
| US11676798B2 (en) | 2019-04-08 | 2023-06-13 | Lam Research Corporation | Cooling for a plasma-based reactor |
-
2020
- 2020-04-07 US US17/601,911 patent/US11676798B2/en active Active
- 2020-04-07 KR KR1020217036312A patent/KR102606056B1/ko active Active
- 2020-04-07 WO PCT/US2020/027081 patent/WO2020210240A1/en not_active Ceased
- 2020-04-07 JP JP2021559101A patent/JP7461965B2/ja active Active
- 2020-04-07 CN CN202080027205.2A patent/CN113661560B/zh active Active
- 2020-04-08 TW TW109111730A patent/TWI834857B/zh active
- 2020-04-08 TW TW113106270A patent/TWI899850B/zh active
-
2023
- 2023-05-02 US US18/142,570 patent/US20230274912A1/en active Pending
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