KR102606056B1 - 플라즈마 기반 반응기 냉각 - Google Patents

플라즈마 기반 반응기 냉각 Download PDF

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Publication number
KR102606056B1
KR102606056B1 KR1020217036312A KR20217036312A KR102606056B1 KR 102606056 B1 KR102606056 B1 KR 102606056B1 KR 1020217036312 A KR1020217036312 A KR 1020217036312A KR 20217036312 A KR20217036312 A KR 20217036312A KR 102606056 B1 KR102606056 B1 KR 102606056B1
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South Korea
Prior art keywords
heat transfer
transfer fluid
conical structure
dielectric window
heat
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Korean (ko)
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KR20210137585A (ko
Inventor
존 스티븐 드류어리
닐 마틴 폴 벤자민
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램 리써치 코포레이션
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32522—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/32119—Windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/002—Cooling arrangements

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Heat-Exchange Devices With Radiators And Conduit Assemblies (AREA)
KR1020217036312A 2019-04-08 2020-04-07 플라즈마 기반 반응기 냉각 Active KR102606056B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201962830896P 2019-04-08 2019-04-08
US62/830,896 2019-04-08
PCT/US2020/027081 WO2020210240A1 (en) 2019-04-08 2020-04-07 Cooling for a plasma-based reactor

Publications (2)

Publication Number Publication Date
KR20210137585A KR20210137585A (ko) 2021-11-17
KR102606056B1 true KR102606056B1 (ko) 2023-11-23

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ID=72751778

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KR1020217036312A Active KR102606056B1 (ko) 2019-04-08 2020-04-07 플라즈마 기반 반응기 냉각

Country Status (6)

Country Link
US (2) US11676798B2 (enExample)
JP (1) JP7461965B2 (enExample)
KR (1) KR102606056B1 (enExample)
CN (1) CN113661560B (enExample)
TW (2) TWI834857B (enExample)
WO (1) WO2020210240A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11676798B2 (en) 2019-04-08 2023-06-13 Lam Research Corporation Cooling for a plasma-based reactor
US11894152B2 (en) * 2021-05-05 2024-02-06 Westinghouse Electric Company Llc Modular thermal and radiation shielding with passive heat removal
CN116168997A (zh) * 2021-11-24 2023-05-26 上海华力集成电路制造有限公司 一种改善刻蚀中等离子体分布的方法

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JP4381963B2 (ja) * 2003-11-19 2009-12-09 パナソニック株式会社 プラズマ処理装置
KR20050079860A (ko) * 2004-02-07 2005-08-11 삼성전자주식회사 마이크로 웨이브 공급장치, 이를 이용한 플라즈마공정장치 및 플라즈마 공정방법
JP2005322771A (ja) 2004-05-10 2005-11-17 Matsushita Electric Ind Co Ltd 熱拡散装置
US7527713B2 (en) * 2004-05-26 2009-05-05 Applied Materials, Inc. Variable quadruple electromagnet array in plasma processing
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Also Published As

Publication number Publication date
US20230274912A1 (en) 2023-08-31
US11676798B2 (en) 2023-06-13
JP7461965B2 (ja) 2024-04-04
TWI834857B (zh) 2024-03-11
TW202106122A (zh) 2021-02-01
TW202425717A (zh) 2024-06-16
WO2020210240A1 (en) 2020-10-15
CN113661560A (zh) 2021-11-16
JP2022526980A (ja) 2022-05-27
CN113661560B (zh) 2023-01-17
KR20210137585A (ko) 2021-11-17
TWI899850B (zh) 2025-10-01
US20220139671A1 (en) 2022-05-05

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