JP2022523692A5 - - Google Patents

Info

Publication number
JP2022523692A5
JP2022523692A5 JP2021543396A JP2021543396A JP2022523692A5 JP 2022523692 A5 JP2022523692 A5 JP 2022523692A5 JP 2021543396 A JP2021543396 A JP 2021543396A JP 2021543396 A JP2021543396 A JP 2021543396A JP 2022523692 A5 JP2022523692 A5 JP 2022523692A5
Authority
JP
Japan
Prior art keywords
overlay
measurement
targets
tool
measurement results
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021543396A
Other languages
English (en)
Japanese (ja)
Other versions
JP7303887B2 (ja
JP2022523692A (ja
Filing date
Publication date
Priority claimed from US16/741,574 external-priority patent/US11333982B2/en
Application filed filed Critical
Publication of JP2022523692A publication Critical patent/JP2022523692A/ja
Publication of JP2022523692A5 publication Critical patent/JP2022523692A5/ja
Application granted granted Critical
Publication of JP7303887B2 publication Critical patent/JP7303887B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2021543396A 2019-01-28 2020-01-21 プロセス変動に対する計量感度を定量するためのスケーリング指標 Active JP7303887B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201962797557P 2019-01-28 2019-01-28
US62/797,557 2019-01-28
US16/741,574 2020-01-13
US16/741,574 US11333982B2 (en) 2019-01-28 2020-01-13 Scaling metric for quantifying metrology sensitivity to process variation
PCT/US2020/014308 WO2020159737A1 (en) 2019-01-28 2020-01-21 Scaling metric for quantifying metrology sensitivity to process variation

Publications (3)

Publication Number Publication Date
JP2022523692A JP2022523692A (ja) 2022-04-26
JP2022523692A5 true JP2022523692A5 (https=) 2023-01-30
JP7303887B2 JP7303887B2 (ja) 2023-07-05

Family

ID=71731223

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021543396A Active JP7303887B2 (ja) 2019-01-28 2020-01-21 プロセス変動に対する計量感度を定量するためのスケーリング指標

Country Status (6)

Country Link
US (1) US11333982B2 (https=)
JP (1) JP7303887B2 (https=)
KR (1) KR102513718B1 (https=)
CN (1) CN113330550B (https=)
TW (1) TWI800708B (https=)
WO (1) WO2020159737A1 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102921020B1 (ko) * 2019-11-28 2026-01-30 케이엘에이 코포레이션 계측 랜드스케이프에 기초한 계측 최적화를 위한 시스템 및 방법
US12406891B2 (en) * 2021-09-30 2025-09-02 International Business Machines Corporation Characterization of asymmetric material deposition for metrology
EP4338009A4 (en) * 2021-10-21 2025-06-04 KLA Corporation INDUCED SHIFTS FOR IMPROVED OVERHEATING ERROR METROLOGY
US11861824B1 (en) * 2022-02-03 2024-01-02 Kla Corporation Reference image grouping in overlay metrology
US12455509B2 (en) * 2022-02-24 2025-10-28 Nanya Technology Corporation Semiconductor structure and system for manufacturing the same
KR102519813B1 (ko) 2022-10-17 2023-04-11 (주)오로스테크놀로지 오버레이 계측 장치 및 방법과 이를 위한 시스템 및 프로그램
KR102662778B1 (ko) * 2023-08-16 2024-04-30 (주)오로스 테크놀로지 오버레이 계측 장치의 타겟 선정 방법 및 오버레이 계측 장치의 타겟 선정 시스템
US12423803B2 (en) * 2024-01-23 2025-09-23 KLA Con Predicting tool induced shift using Moiré overlay targets

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3391328B2 (ja) * 1993-02-08 2003-03-31 株式会社ニコン 位置合わせ方法、その位置合わせ方法を用いた露光方法、その露光方法を用いたデバイス製造方法、そのデバイス製造方法で製造されたデバイス、並びに位置合わせ装置、その位置合わせ装置を備えた露光装置
US7791727B2 (en) 2004-08-16 2010-09-07 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
JP2006216796A (ja) * 2005-02-03 2006-08-17 Nikon Corp 基準パターン情報の作成方法、位置計測方法、位置計測装置、露光方法、及び露光装置
US8045786B2 (en) 2006-10-24 2011-10-25 Kla-Tencor Technologies Corp. Waferless recipe optimization
US7873504B1 (en) 2007-05-07 2011-01-18 Kla-Tencor Technologies Corp. Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout
JP5545782B2 (ja) 2009-07-31 2014-07-09 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置の焦点測定方法、散乱計、リソグラフィシステム、およびリソグラフィセル
KR20120058572A (ko) 2009-08-24 2012-06-07 에이에스엠엘 네델란즈 비.브이. 메트롤로지 방법 및 장치, 리소그래피 장치, 리소그래피 처리 셀 및 메트롤로지 타겟들을 포함하는 기판
JP5377595B2 (ja) 2011-03-25 2013-12-25 富士フイルム株式会社 着色感放射線性組成物、カラーフィルタ、着色パターンの製造方法、カラーフィルタの製造方法、固体撮像素子、及び液晶表示装置
EP3779598B1 (en) 2011-04-06 2022-12-21 Kla-Tencor Corporation Method for providing a set of process tool correctables
SG11201604641PA (en) * 2013-12-30 2016-07-28 Asml Netherlands Bv Method and apparatus for design of a metrology target
US10267746B2 (en) * 2014-10-22 2019-04-23 Kla-Tencor Corp. Automated pattern fidelity measurement plan generation
CN112698551B (zh) * 2014-11-25 2024-04-23 科磊股份有限公司 分析及利用景观
US9903711B2 (en) * 2015-04-06 2018-02-27 KLA—Tencor Corporation Feed forward of metrology data in a metrology system
CN109917622B (zh) * 2015-04-10 2021-08-06 Asml荷兰有限公司 用于检查和量测的方法和设备
KR102152301B1 (ko) 2015-12-04 2020-09-07 에이에스엠엘 네델란즈 비.브이. 메트롤로지 데이터로부터의 통계적 계층 재구성
CN112255892B (zh) * 2016-02-22 2023-07-18 Asml荷兰有限公司 对量测数据的贡献的分离
CN109791367B (zh) * 2016-09-27 2021-06-22 Asml荷兰有限公司 量测选配方案选择
US10645777B2 (en) 2016-12-05 2020-05-05 Lutron Technology Company Llc User interface for controlling intensity and color of a lighting load
US10901325B2 (en) 2017-02-28 2021-01-26 Kla-Tencor Corporation Determining the impacts of stochastic behavior on overlay metrology data
KR102326192B1 (ko) * 2017-05-03 2021-11-15 에이에스엠엘 네델란즈 비.브이. 계측 파라미터 결정 및 계측 레시피 선택

Similar Documents

Publication Publication Date Title
JP2022523692A5 (https=)
JP2021516366A5 (https=)
JP2017537317A5 (https=)
US6539323B2 (en) Methods and apparatus for correcting spectral color measurements
TWI726163B (zh) 以繞射為基礎之聚焦度量
TWI768046B (zh) 用於配方最佳化及量測之區域分析
JP7303887B2 (ja) プロセス変動に対する計量感度を定量するためのスケーリング指標
KR20160042442A (ko) 반도체 타겟의 계측을 위한 차동 방법 및 장치
JP2017508273A5 (https=)
JP2021506133A5 (https=)
JP5709372B2 (ja) 校正手段、校正方法、及びプログラム
TW201527897A (zh) 用於製程參數量測之目標元件類型
JP6732347B1 (ja) 蛍光ｘ線分析装置
IL315841A (en) Self-calibrating overlay metrology
JP2022507918A5 (https=)
JP2022510025A5 (https=)
JP2022507918A (ja) 単一セルグレースキャトロメトリオーバーレイターゲットおよび変化する照射パラメータを用いたそれらの測定
JP2020522127A5 (https=)
JP2023502949A5 (https=)
CN204479186U (zh) 宽谱段夏克-哈特曼波前传感器绝对标定装置
JP7787938B2 (ja) 内部パラメータ試験
US9851300B1 (en) Decreasing inaccuracy due to non-periodic effects on scatterometric signals
TWI878245B (zh) 單一單元灰階散射術之重疊目標及其使用變化照明參數之量測
CN105806483A (zh) 一种用于皮革染色配色的非线性配方修正方法
CN110849827B (zh) 中阶梯光谱仪的光谱定标方法、装置、设备及存储介质