JP2022515987A - 光学フィルタ - Google Patents
光学フィルタ Download PDFInfo
- Publication number
- JP2022515987A JP2022515987A JP2021532296A JP2021532296A JP2022515987A JP 2022515987 A JP2022515987 A JP 2022515987A JP 2021532296 A JP2021532296 A JP 2021532296A JP 2021532296 A JP2021532296 A JP 2021532296A JP 2022515987 A JP2022515987 A JP 2022515987A
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- JP
- Japan
- Prior art keywords
- optical filter
- layer
- optical
- subset
- layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 342
- 239000000463 material Substances 0.000 claims abstract description 185
- 239000000758 substrate Substances 0.000 claims abstract description 54
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 48
- 239000010703 silicon Substances 0.000 claims abstract description 48
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 32
- 239000001257 hydrogen Substances 0.000 claims abstract description 27
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 25
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 75
- 238000000576 coating method Methods 0.000 claims description 67
- 229910000577 Silicon-germanium Inorganic materials 0.000 claims description 66
- 239000011248 coating agent Substances 0.000 claims description 65
- 238000004544 sputter deposition Methods 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 27
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 20
- 230000003595 spectral effect Effects 0.000 claims description 18
- 238000002834 transmittance Methods 0.000 claims description 17
- 238000000151 deposition Methods 0.000 claims description 15
- 238000004519 manufacturing process Methods 0.000 claims description 14
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 claims description 11
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 10
- 229910052990 silicon hydride Inorganic materials 0.000 claims description 10
- 239000000377 silicon dioxide Substances 0.000 claims description 8
- 235000012239 silicon dioxide Nutrition 0.000 claims description 8
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 claims description 4
- 239000010409 thin film Substances 0.000 claims description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 3
- 229910052796 boron Inorganic materials 0.000 claims description 3
- 239000011574 phosphorus Substances 0.000 claims description 3
- 229910052698 phosphorus Inorganic materials 0.000 claims description 3
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 2
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 2
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 2
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims description 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 2
- 238000010586 diagram Methods 0.000 abstract description 21
- 239000010410 layer Substances 0.000 description 377
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 46
- 229910052732 germanium Inorganic materials 0.000 description 27
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 27
- 238000013461 design Methods 0.000 description 26
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 24
- 125000006850 spacer group Chemical group 0.000 description 24
- 230000007704 transition Effects 0.000 description 19
- 238000000137 annealing Methods 0.000 description 18
- 230000005540 biological transmission Effects 0.000 description 18
- 230000000903 blocking effect Effects 0.000 description 15
- 238000010521 absorption reaction Methods 0.000 description 13
- 230000008033 biological extinction Effects 0.000 description 10
- 229910052760 oxygen Inorganic materials 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 235000012431 wafers Nutrition 0.000 description 8
- 229910020175 SiOH Inorganic materials 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 238000004458 analytical method Methods 0.000 description 6
- 229910052715 tantalum Inorganic materials 0.000 description 6
- 230000008021 deposition Effects 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 230000006870 function Effects 0.000 description 4
- 150000002431 hydrogen Chemical class 0.000 description 4
- 230000010287 polarization Effects 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 238000000411 transmission spectrum Methods 0.000 description 4
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- XWNWBGHUGMRHNF-UHFFFAOYSA-N [SiH4].[Ge] Chemical compound [SiH4].[Ge] XWNWBGHUGMRHNF-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 2
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 2
- YZCKVEUIGOORGS-IGMARMGPSA-N Protium Chemical compound [1H] YZCKVEUIGOORGS-IGMARMGPSA-N 0.000 description 2
- 241000720974 Protium Species 0.000 description 2
- YZCKVEUIGOORGS-NJFSPNSNSA-N Tritium Chemical compound [3H] YZCKVEUIGOORGS-NJFSPNSNSA-N 0.000 description 2
- KXNLCSXBJCPWGL-UHFFFAOYSA-N [Ga].[As].[In] Chemical compound [Ga].[As].[In] KXNLCSXBJCPWGL-UHFFFAOYSA-N 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 238000001994 activation Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000005984 hydrogenation reaction Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000002346 layers by function Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 229910052722 tritium Inorganic materials 0.000 description 2
- 229920000089 Cyclic olefin copolymer Polymers 0.000 description 1
- 239000004713 Cyclic olefin copolymer Substances 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 241001465754 Metazoa Species 0.000 description 1
- 229910020216 SiOx-Si Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- QLJCFNUYUJEXET-UHFFFAOYSA-K aluminum;trinitrite Chemical compound [Al+3].[O-]N=O.[O-]N=O.[O-]N=O QLJCFNUYUJEXET-UHFFFAOYSA-K 0.000 description 1
- 230000003373 anti-fouling effect Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 229910052805 deuterium Inorganic materials 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 210000000744 eyelid Anatomy 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 238000006396 nitration reaction Methods 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 238000000678 plasma activation Methods 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000307 polymer substrate Polymers 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 230000026676 system process Effects 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
- G02B5/288—Interference filters comprising deposited thin solid films comprising at least one thin film resonant cavity, e.g. in bandpass filters
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0694—Halides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
- C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
- G02B1/007—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials made of negative effective refractive index materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Optical Filters (AREA)
Abstract
Description
本出願は、2019年12月20日に出願された“OPTICAL FILTER”と題する米国特許出願(非仮出願)第16/722,325号および2018年12月27日に出願された“OPTICAL FILTER”と題する米国仮特許出願第62/785,487号に基づく優先権を主張し、これらを参照により本明細書に明示的に援用する。
光送信器は、1つ以上の物体に向けられた光を放出し得る。例えば、ジェスチャ認識システムでは、光送信器は、近赤外(NIR)光をユーザに向けて送信し得、NIR光は、ユーザから光受信器に向かって反射され得る。この場合、光受信器は、NIR光に関する情報を取得し得、その情報は、ユーザによって実行されているジェスチャを識別するために使用され得る。例えば、デバイスは、情報を使用して、ユーザの3次元表現を生成し、3次元表現に基づいてユーザによって実行されているジェスチャを識別し得る。
さらに図1A~1Cに示されるように、光学フィルタ100、100’、100’’は、光学フィルタコーティング部分110および基板120を含み得る。
Claims (20)
- 光学フィルタ層のセットを備え、
前記光学フィルタ層のセットは、
第1の屈折率を有する第1の材料を備える光学フィルタ層の第1のサブセットであって、前記第1の材料は少なくともシリコンおよび水素を備える、第1のサブセットと、
第2の屈折率を有する第2の材料を備える光学フィルタ層の第2のサブセットであって、
前記第2の材料は前記第1の材料とは異なり、前記第2の屈折率は前記第1の屈折率よりも小さい、第2のサブセットと、
前記第1の材料および前記第2の材料とは異なる第3の材料を備える光学フィルタ層の第3のサブセットと、を含む、
光学フィルタ。 - 前記第1の材料は、
水素化シリコン(Si:H)材料、
シリコンゲルマニウム(SiGe)材料、または
水素化シリコンゲルマニウム(SiGe:H)材料、
のうちの少なくとも1つを含む、請求項1に記載の光学フィルタ。 - 前記第2の材料は、
二酸化ケイ素(SiO2)材料、
酸化アルミニウム(Al2O3)材料、
酸化チタン(TiO2)材料、
五酸化ニオブ(Nb2O5)材料、
五酸化タンタル(Ta2O5)材料、
フッ化マグネシウム(MgF2)材料、
酸化ジルコニウム(ZrO2)材料、
酸化イットリウム(Y2O3)材料、
窒化ケイ素(Si3N4)材料、
ホウ素ベース材料、または
リンベース材料、
のうちの少なくとも1つを含む、請求項1に記載の光学フィルタ。 - 光学フィルタ層の第4のサブセット、をさらに備え、
前記光学フィルタ層の第4のサブセットは、少なくとも前記第1の材料および前記第2の材料とは異なる第4の材料を備える、請求項1に記載の光学フィルタ。 - 前記光学フィルタ層のセットが配置される基板をさらに備える、請求項1に記載の光学フィルタ。
- 前記光学フィルタ層のセットは、前記基板の第1の側に配置され、
ここで、コーティングは前記基板の第2の側に配置される、
請求項5に記載の光学フィルタ。 - 前記第1の屈折率は、約800ナノメートル(nm)~約1100nmのスペクトル範囲で3より大きい、請求項1に記載の光学フィルタ。
- 前記第1の屈折率は、約800ナノメートル(nm)~約1100nmの波長で約3.7である、請求項1に記載の光学フィルタ。
- 前記第2の屈折率は、約800ナノメートル(nm)~約1100nmのスペクトル範囲で3未満である、請求項1に記載の光学フィルタ。
- 前記第2の屈折率は、約800ナノメートル(nm)~約1100nmのスペクトル範囲で1.6~2.4である、請求項1に記載の光学フィルタ。
- 前記光学フィルタは、バンドパスフィルタである、請求項1に記載の光学フィルタ。
- 前記光学フィルタは、アニーリングされている、請求項1に記載の光学フィルタ。
- 近赤外線(NIR)光を放出する光送信器と、
入力光信号をフィルタリングし、フィルタリングされた入力光信号を提供する光学フィルタであって、
前記入力光信号は前記光送信器からの前記NIR光と光源からの周囲光とを含み、
前記光学フィルタは誘電体薄膜層のセットを含み、
前記誘電体薄膜層のセットは、
第1の屈折率を有する第1の材料から形成された層の第1のサブセットと、
前記第1の屈折率よりも小さい第2の屈折率を有する第2の材料から形成された層の第2のサブセットと、
前記第1の材料および前記第2の材料とは異なる第3の材料から形成された層の第3のサブセットと、
前記第1の材料、前記第2の材料、および前記第3の材料とは異なる第4の材料から形成された層の第4のサブセットと、
を含み、
前記フィルタリングされた入力光信号は、入力光信号と比較して低減された強度の周囲光を含む、
光学フィルタと、
前記フィルタリングされた入力光信号を受信し、出力電気信号を提供する光受信器と、
を備える、光学システム。 - 前記光学フィルタは、約950ナノメートルで80%より大きい透過率に関連する、請求項13に記載の光学システム。
- 前記光学フィルタは、約950ナノメートルで90%より大きい透過率に関連する、請求項13に記載の光学システム。
- 前記光学フィルタは、約1550ナノメートルで80%より大きい透過率に関連する、請求項13に記載の光学システム。
- 前記光学フィルタは、約1550ナノメートルで90%より大きい透過率に関連する、請求項13に記載の光学システム。
- 前記層の第1のサブセットは、水素化されている、請求項13に記載の光学システム。
- 前記光学フィルタの光学フィルタ層の第1のサブセットを堆積し、
前記光学フィルタ層の第1のサブセットは第1の屈折率を有する第1の材料を備える、ステップと、
前記光学フィルタの光学フィルタ層の第2のサブセットを堆積し、
前記光学フィルタ層の第2のサブセットは前記第1の屈折率より小さい第2の屈折率を有する第2の材料を備える、ステップと、
前記第1の材料および前記第2の材料とは異なる第3の材料を備える光学フィルタ層の第3のサブセットを堆積する、ステップと、
を含む、光学フィルタを作製する方法。 - 前記光学フィルタ層の第1のサブセット、前記光学フィルタ層の第2のサブセット、または前記光学フィルタ層の第3のサブセットのうちの1つ以上は、直流スパッタリングを介して堆積される、請求項19に記載の方法。
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Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108897085A (zh) * | 2018-08-06 | 2018-11-27 | 信阳舜宇光学有限公司 | 滤光片及包含该滤光片的红外图像传感系统 |
US11314004B2 (en) * | 2019-04-08 | 2022-04-26 | Visera Technologies Company Limited | Optical filters and methods for forming the same |
CN114089460A (zh) * | 2020-08-24 | 2022-02-25 | 福州高意光学有限公司 | 一种低角度偏移滤光片 |
GB202013643D0 (en) * | 2020-08-31 | 2020-10-14 | Ams Ag | Interference filter |
TWI752677B (zh) * | 2020-11-12 | 2022-01-11 | 晶瑞光電股份有限公司 | 紅外截止濾光片結構 |
CN113109898B (zh) * | 2021-04-07 | 2022-05-06 | 浙江水晶光电科技股份有限公司 | 一种氢化复合物薄膜的制备方法和滤光器 |
US11867935B2 (en) * | 2021-09-28 | 2024-01-09 | Viavi Solutions Inc. | Optical interference filter |
US20230168418A1 (en) * | 2021-12-01 | 2023-06-01 | Viavi Solutions Inc. | Optical interference filter |
US20230194762A1 (en) * | 2021-12-16 | 2023-06-22 | Viavi Solutions Inc. | Optical interference filter |
WO2023174849A1 (en) * | 2022-03-17 | 2023-09-21 | Ams-Osram Ag | Semiconductor chip and method of producing a plurality of semiconductor chips |
CN114859454B (zh) * | 2022-07-06 | 2022-10-18 | 宁波永新光学股份有限公司 | 一种用于车载激光雷达视窗的黑色光学滤波器 |
US20240069262A1 (en) * | 2022-08-23 | 2024-02-29 | Viavi Solutions Inc. | Optical interference filter |
US20240085605A1 (en) * | 2022-09-12 | 2024-03-14 | Viavi Solutions Inc. | Optical interference filter |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003177237A (ja) * | 2001-12-11 | 2003-06-27 | Nippon Telegr & Teleph Corp <Ntt> | 光学多層膜フィルタ |
JP2003262720A (ja) * | 2002-03-11 | 2003-09-19 | Nippon Telegr & Teleph Corp <Ntt> | 光学多層膜フィルタ |
JP2003302521A (ja) * | 2002-04-11 | 2003-10-24 | Nippon Telegr & Teleph Corp <Ntt> | 光学多層膜フィルタ |
US20140014838A1 (en) * | 2012-07-16 | 2014-01-16 | Karen Denise Hendrix | Optical filter and sensor system |
JP2018504635A (ja) * | 2015-01-23 | 2018-02-15 | マテリオン コーポレイション | 改良された透過率を有する近赤外線光学干渉フィルタ |
JP2018506076A (ja) * | 2015-02-18 | 2018-03-01 | マテリオン コーポレイション | 改良された透過率を有する近赤外線光学干渉フィルタ |
US20180149781A1 (en) * | 2016-11-30 | 2018-05-31 | Viavi Solutions Inc. | Silicon-germanium based optical filter |
CN108873135A (zh) * | 2018-08-06 | 2018-11-23 | 信阳舜宇光学有限公司 | 一种近红外窄带滤光片及红外成像系统 |
JP2018200464A (ja) * | 2017-05-22 | 2018-12-20 | ヴァイアヴィ・ソリューションズ・インコーポレイテッドViavi Solutions Inc. | マルチスペクトルフィルタ |
JP2020534585A (ja) * | 2018-08-06 | 2020-11-26 | 信陽舜宇光学有限公司 | 光学フィルタ及び当該光学フィルタを含む赤外線画像センシングシステム |
Family Cites Families (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10080898T1 (de) * | 1999-03-29 | 2001-06-28 | Nikon Corp | Mehrschicht-Antireflexionsfilm, optisches Element und Reduktionsprojektionsbelichtungsapparat |
ATE286602T1 (de) * | 1999-11-10 | 2005-01-15 | Denglas Technologies Llc | Schichten auf basis von nioboxid für optische dünnfilmbeschichtungen und verfahren zu deren herstellung |
EP1272829A1 (de) * | 2000-04-14 | 2003-01-08 | Zeptosens AG | Gitter-wellenleiter-struktur zur verstärkung eines anregungsfeldes und deren verwendung |
JP4524877B2 (ja) * | 2000-07-17 | 2010-08-18 | コニカミノルタホールディングス株式会社 | 眼鏡用レンズ |
JP3887174B2 (ja) * | 2001-01-24 | 2007-02-28 | 日本オプネクスト株式会社 | 半導体発光装置 |
AU2002257671A1 (en) * | 2001-04-02 | 2002-10-15 | Zeptosens Ag | Optical structure for multi-photon excitation and the use thereof |
US20020154387A1 (en) * | 2001-04-20 | 2002-10-24 | Kenji Mori | Gain equalizer, collimator with gain equalizer and method of manufacturing gain equalizer |
US6572975B2 (en) * | 2001-08-24 | 2003-06-03 | General Electric Company | Optically coated article and method for its preparation |
US20040047382A1 (en) * | 2002-09-05 | 2004-03-11 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor optical device and semiconductor laser module using the semiconductor optical device |
US7901870B1 (en) * | 2004-05-12 | 2011-03-08 | Cirrex Systems Llc | Adjusting optical properties of optical thin films |
US7250620B2 (en) * | 2005-01-20 | 2007-07-31 | Infineon Technologies Ag | EUV lithography filter |
JP4958536B2 (ja) * | 2006-01-12 | 2012-06-20 | 富士フイルム株式会社 | 反射防止膜 |
US8741158B2 (en) * | 2010-10-08 | 2014-06-03 | Ut-Battelle, Llc | Superhydrophobic transparent glass (STG) thin film articles |
JP2013156523A (ja) * | 2012-01-31 | 2013-08-15 | Topcon Corp | 基板 |
KR20150016508A (ko) * | 2012-04-19 | 2015-02-12 | 에이에스엠엘 네델란즈 비.브이. | 기판 홀더, 리소그래피 장치 및 디바이스 제조 방법 |
KR102401136B1 (ko) * | 2013-01-29 | 2022-05-24 | 비아비 솔루션즈 아이엔씨. | 가변 광 필터 및 그에 기반한 파장선택 센서 |
JP6292830B2 (ja) * | 2013-11-13 | 2018-03-14 | キヤノン株式会社 | 光学素子、光学系および光学機器 |
ES2702658T3 (es) | 2014-04-10 | 2019-03-04 | Csem Centre Suisse Delectronique Et De Microtechnique Sa | Módulo fotovoltaico solar |
SG11201704226PA (en) * | 2014-11-26 | 2017-06-29 | Supriya Jaiswal | Materials, components, and methods for use with extreme ultraviolet radiation in lithography and other applications |
WO2016171219A1 (ja) * | 2015-04-23 | 2016-10-27 | 旭硝子株式会社 | 光学フィルタおよび撮像装置 |
JP6549458B2 (ja) * | 2015-09-30 | 2019-07-24 | 株式会社トプコン | 反射防止膜、光学素子、及び眼科装置 |
WO2018003642A1 (ja) * | 2016-07-01 | 2018-01-04 | 富士フイルム株式会社 | イメージセンサー用カラーフィルター、イメージセンサーおよびイメージセンサー用カラーフィルターの製造方法 |
DE202017100512U1 (de) | 2017-01-31 | 2017-02-09 | Optics Balzers Ag | Optische Filter und/oder Spiegel |
DE202017100521U1 (de) * | 2017-01-31 | 2018-05-03 | JOPE Beteiligungs GmbH | Substratleitungsabdichtungsvorrichtung |
DE102017004828B4 (de) * | 2017-05-20 | 2019-03-14 | Optics Balzers Ag | Optischer Filter und Verfahren zur Herstellung eines optischen Filters |
JP6881172B2 (ja) * | 2017-09-13 | 2021-06-02 | Agc株式会社 | 反射防止膜付透明基体、およびそれを用いた表示装置 |
CN108333661B (zh) * | 2018-03-13 | 2024-01-02 | 湖北五方光电股份有限公司 | 基于硼掺杂氢化硅的低角度偏移滤光片及其制备方法 |
US11009636B2 (en) | 2018-03-13 | 2021-05-18 | Viavi Solutions Inc. | Sensor window to provide different opacity and transmissivity at different spectral ranges |
CN110737040B (zh) * | 2018-07-18 | 2022-03-01 | 福州高意光学有限公司 | 3d识别滤光片 |
US11314004B2 (en) * | 2019-04-08 | 2022-04-26 | Visera Technologies Company Limited | Optical filters and methods for forming the same |
WO2020244221A1 (zh) * | 2019-06-05 | 2020-12-10 | 信阳舜宇光学有限公司 | 近红外带通滤光片及光学传感系统 |
KR102055579B1 (ko) * | 2019-06-27 | 2019-12-13 | 주식회사 옵트론텍 | 광학 필터 |
US20210333454A1 (en) * | 2020-04-28 | 2021-10-28 | Viavi Solutions Inc. | Induced transmission filter with hydrogenated silicon and silver |
US20220298622A1 (en) * | 2021-03-16 | 2022-09-22 | University Of Rochester | Electron-Beam Deposition of Striated Composite Layers for High-Fluence Laser Coatings |
-
2019
- 2019-12-20 US US16/722,325 patent/US11650361B2/en active Active
- 2019-12-23 EP EP19843019.1A patent/EP3903134A2/en active Pending
- 2019-12-23 CN CN201980086494.0A patent/CN113227849A/zh active Pending
- 2019-12-23 JP JP2021532296A patent/JP7404367B2/ja active Active
- 2019-12-23 WO PCT/US2019/068362 patent/WO2020139841A2/en unknown
- 2019-12-23 KR KR1020217023792A patent/KR20210108454A/ko unknown
-
2023
- 2023-05-05 US US18/312,831 patent/US20230324592A1/en active Pending
- 2023-12-13 JP JP2023210137A patent/JP2024028961A/ja active Pending
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003177237A (ja) * | 2001-12-11 | 2003-06-27 | Nippon Telegr & Teleph Corp <Ntt> | 光学多層膜フィルタ |
JP2003262720A (ja) * | 2002-03-11 | 2003-09-19 | Nippon Telegr & Teleph Corp <Ntt> | 光学多層膜フィルタ |
JP2003302521A (ja) * | 2002-04-11 | 2003-10-24 | Nippon Telegr & Teleph Corp <Ntt> | 光学多層膜フィルタ |
US20140014838A1 (en) * | 2012-07-16 | 2014-01-16 | Karen Denise Hendrix | Optical filter and sensor system |
JP2018504635A (ja) * | 2015-01-23 | 2018-02-15 | マテリオン コーポレイション | 改良された透過率を有する近赤外線光学干渉フィルタ |
JP2018506076A (ja) * | 2015-02-18 | 2018-03-01 | マテリオン コーポレイション | 改良された透過率を有する近赤外線光学干渉フィルタ |
US20180149781A1 (en) * | 2016-11-30 | 2018-05-31 | Viavi Solutions Inc. | Silicon-germanium based optical filter |
JP2018200464A (ja) * | 2017-05-22 | 2018-12-20 | ヴァイアヴィ・ソリューションズ・インコーポレイテッドViavi Solutions Inc. | マルチスペクトルフィルタ |
CN108873135A (zh) * | 2018-08-06 | 2018-11-23 | 信阳舜宇光学有限公司 | 一种近红外窄带滤光片及红外成像系统 |
JP2020534585A (ja) * | 2018-08-06 | 2020-11-26 | 信陽舜宇光学有限公司 | 光学フィルタ及び当該光学フィルタを含む赤外線画像センシングシステム |
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US20200209448A1 (en) | 2020-07-02 |
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TW202032166A (zh) | 2020-09-01 |
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