JP2022160436A - 両面処理のためのパターニングされたチャック - Google Patents
両面処理のためのパターニングされたチャック Download PDFInfo
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- JP2022160436A JP2022160436A JP2022111497A JP2022111497A JP2022160436A JP 2022160436 A JP2022160436 A JP 2022160436A JP 2022111497 A JP2022111497 A JP 2022111497A JP 2022111497 A JP2022111497 A JP 2022111497A JP 2022160436 A JP2022160436 A JP 2022160436A
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- 238000012545 processing Methods 0.000 title abstract description 10
- 239000000758 substrate Substances 0.000 claims abstract description 67
- 239000000463 material Substances 0.000 claims description 39
- 239000011248 coating agent Substances 0.000 claims description 10
- 238000000576 coating method Methods 0.000 claims description 10
- -1 combinations Substances 0.000 claims description 10
- 238000004891 communication Methods 0.000 claims description 9
- 239000012530 fluid Substances 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 8
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 8
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 8
- 239000004952 Polyamide Substances 0.000 claims description 6
- 239000004642 Polyimide Substances 0.000 claims description 6
- 229910010293 ceramic material Inorganic materials 0.000 claims description 6
- 239000007769 metal material Substances 0.000 claims description 6
- 229920002647 polyamide Polymers 0.000 claims description 6
- 229920001721 polyimide Polymers 0.000 claims description 6
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 4
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 4
- 239000010935 stainless steel Substances 0.000 claims description 4
- 229910001220 stainless steel Inorganic materials 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 2
- 239000002861 polymer material Substances 0.000 claims 8
- 230000000712 assembly Effects 0.000 description 4
- 238000000429 assembly Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 2
- 238000001127 nanoimprint lithography Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000003190 augmentative effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
- H01L21/6833—Details of electrostatic chucks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q3/00—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine
- B23Q3/15—Devices for holding work using magnetic or electric force acting directly on the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25B—TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
- B25B11/00—Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
- B25B11/005—Vacuum work holders
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68735—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge profile or support profile
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/6875—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0065—Manufacturing aspects; Material aspects
Abstract
Description
Claims (15)
- 上面および前記上面の反対側の底面を有する本体であって、前記本体内に形成され、前記上面から窪んだ複数の空洞を有し、前記複数の空洞を隔て、前記本体から前記上面まで延びる複数の支持要素を、さらに有し、前記本体内に形成され、前記複数の支持要素のうちの1つ以上を通って前記上面から前記底面まで延びる複数のポートを、さらに有する本体、ならびに
前記複数のポートのそれぞれと流体連通する導管、
を備える基板チャッキング装置。 - 前記本体が金属材料である、請求項1に記載の装置。
- 前記金属材料が、アルミニウム材料、ステンレス鋼材料、またはそれらの合金、組合せ、もしくは混合物である、請求項2に記載の装置。
- 前記本体がセラミック材料である、請求項1に記載の装置。
- 前記セラミック材料が、窒化ケイ素材料、窒化アルミニウム材料、アルミナ材料、またはそれらの組合せもしくは混合物である、請求項4に記載の装置。
- 前記本体上に配置されたポリマー材料を、さらに含み、前記ポリマー材料が、ポリイミド材料、ポリアミド材料、およびポリテトラフルオロエチレン材料からなる群から選択される、請求項3に記載の装置。
- 前記本体上に配置されたポリマー材料を、さらに含み、前記ポリマー材料が、ポリイミド材料、ポリアミド材料、およびポリテトラフルオロエチレン材料からなる群から選択される、請求項5に記載の装置。
- 上面および前記上面の反対側の底面を有する本体であって、前記本体内に形成され、前記上面から窪んだ複数の空洞を有し、前記複数の空洞を隔て、前記本体から前記上面まで延びる複数の支持要素を、さらに有し、前記本体内に形成され、前記複数の支持要素のうちの1つ以上を通って前記上面から前記底面まで延びる第1の複数のポートを有し、前記本体内に形成され、前記複数の空洞のそれぞれの底面から前記本体の前記底面まで延びる第2の複数のポートを有する本体、
前記第1の複数のポートのそれぞれと流体連通する第1の導管、ならびに
前記第2の複数のポートのそれぞれと流体連通する第2の導管、
を備える基板チャッキング装置。 - 前記本体が金属材料である、請求項8に記載の装置。
- 前記金属材料が、アルミニウム材料、ステンレス鋼材料、またはそれらの合金、組合せ、もしくは混合物である、請求項9に記載の装置。
- 前記本体がセラミック材料である、請求項8に記載の装置。
- 前記セラミック材料が、窒化ケイ素材料、窒化アルミニウム材料、アルミナ材料、またはそれらの組合せもしくは混合物である、請求項11に記載の装置。
- 前記本体上に配置されたポリマー材料を、さらに含み、前記ポリマー材料が、ポリイミド材料、ポリアミド材料、およびポリテトラフルオロエチレン材料からなる群から選択される、請求項9に記載の装置。
- 前記本体上に配置されたポリマー材料を、さらに含み、前記ポリマー材料が、ポリイミド材料、ポリアミド材料、およびポリテトラフルオロエチレン材料からなる群から選択される、請求項11に記載の装置。
- 上面および前記上面の反対側の底面を有する本体であって、前記本体内に形成され、前記上面から窪んだ複数の空洞を有し、前記複数の空洞を隔て、前記本体から前記上面まで延びる複数の支持要素を有し、前記本体の前記上面に隣接して、前記複数の支持要素のそれぞれの内部に配置された第1の電極アセンブリを有し、前記複数の空洞のそれぞれに隣接して配置された第2の電極アセンブリを有する本体、ならびに
前記本体の前記上面上、前記複数の支持要素上、および前記複数の空洞内に配置されたポリマーコーティング、
を備える基板チャッキング装置。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201762584285P | 2017-11-10 | 2017-11-10 | |
US62/584,285 | 2017-11-10 | ||
PCT/US2018/059557 WO2019094421A1 (en) | 2017-11-10 | 2018-11-07 | Patterned chuck for double-sided processing |
JP2020524808A JP7145212B2 (ja) | 2017-11-10 | 2018-11-07 | 両面処理のためのパターニングされたチャック |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2020524808A Division JP7145212B2 (ja) | 2017-11-10 | 2018-11-07 | 両面処理のためのパターニングされたチャック |
Publications (1)
Publication Number | Publication Date |
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JP2022160436A true JP2022160436A (ja) | 2022-10-19 |
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JP2020524808A Active JP7145212B2 (ja) | 2017-11-10 | 2018-11-07 | 両面処理のためのパターニングされたチャック |
JP2022111497A Pending JP2022160436A (ja) | 2017-11-10 | 2022-07-12 | 両面処理のためのパターニングされたチャック |
Family Applications Before (1)
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JP2020524808A Active JP7145212B2 (ja) | 2017-11-10 | 2018-11-07 | 両面処理のためのパターニングされたチャック |
Country Status (7)
Country | Link |
---|---|
US (2) | US11289361B2 (ja) |
EP (1) | EP3707747A4 (ja) |
JP (2) | JP7145212B2 (ja) |
KR (1) | KR102544974B1 (ja) |
CN (1) | CN111418051B (ja) |
TW (1) | TWI731276B (ja) |
WO (1) | WO2019094421A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN111418051B (zh) * | 2017-11-10 | 2024-01-12 | 应用材料公司 | 用于双面处理的图案化夹盘 |
KR102369694B1 (ko) * | 2018-02-20 | 2022-03-04 | 어플라이드 머티어리얼스, 인코포레이티드 | 양면 처리를 위한 패터닝된 진공 척 |
WO2021071631A1 (en) * | 2019-10-11 | 2021-04-15 | Applied Materials, Inc. | Die system and method of comparing alignment vectors |
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Also Published As
Publication number | Publication date |
---|---|
KR20200069379A (ko) | 2020-06-16 |
EP3707747A1 (en) | 2020-09-16 |
US20220352002A1 (en) | 2022-11-03 |
KR102544974B1 (ko) | 2023-06-20 |
US11289361B2 (en) | 2022-03-29 |
TW201923966A (zh) | 2019-06-16 |
EP3707747A4 (en) | 2021-07-28 |
CN111418051A (zh) | 2020-07-14 |
CN111418051B (zh) | 2024-01-12 |
WO2019094421A1 (en) | 2019-05-16 |
US11764099B2 (en) | 2023-09-19 |
TWI731276B (zh) | 2021-06-21 |
JP7145212B2 (ja) | 2022-09-30 |
US20190148208A1 (en) | 2019-05-16 |
JP2021502696A (ja) | 2021-01-28 |
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