JP2022160187A5 - - Google Patents

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JP2022160187A5
JP2022160187A5 JP2021064794A JP2021064794A JP2022160187A5 JP 2022160187 A5 JP2022160187 A5 JP 2022160187A5 JP 2021064794 A JP2021064794 A JP 2021064794A JP 2021064794 A JP2021064794 A JP 2021064794A JP 2022160187 A5 JP2022160187 A5 JP 2022160187A5
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area
substrate
shot
synchronization error
evaluation
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JP2021064794A
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JP7699458B2 (ja
JP2022160187A (ja
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Priority to KR1020220033669A priority patent/KR102904604B1/ko
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JP2021064794A 2021-04-06 2021-04-06 露光装置、露光方法及び物品の製造方法 Active JP7699458B2 (ja)

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Application Number Priority Date Filing Date Title
JP2021064794A JP7699458B2 (ja) 2021-04-06 2021-04-06 露光装置、露光方法及び物品の製造方法
KR1020220033669A KR102904604B1 (ko) 2021-04-06 2022-03-18 노광 장치, 노광 방법 및 물품의 제조 방법

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JP2021064794A JP7699458B2 (ja) 2021-04-06 2021-04-06 露光装置、露光方法及び物品の製造方法

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JP2022160187A JP2022160187A (ja) 2022-10-19
JP2022160187A5 true JP2022160187A5 (enExample) 2024-04-05
JP7699458B2 JP7699458B2 (ja) 2025-06-27

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Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3781116B2 (ja) * 1994-05-18 2006-05-31 株式会社ニコン 走査露光方法及び走査露光装置
JPH09115799A (ja) * 1995-10-16 1997-05-02 Nikon Corp 走査型露光装置
JPH1167655A (ja) * 1997-08-11 1999-03-09 Nikon Corp 走査型露光装置及び同期誤差解析方法
JP3097620B2 (ja) * 1997-10-09 2000-10-10 日本電気株式会社 走査型縮小投影露光装置
JP3559766B2 (ja) * 2001-02-21 2004-09-02 キヤノン株式会社 走査露光装置及び走査露光方法並びにデバイスの製造方法
JP2004319780A (ja) * 2003-04-16 2004-11-11 Nikon Corp 露光方法及び露光装置並びにデバイス製造方法
EP1879217A4 (en) * 2005-03-18 2010-06-09 Nikon Corp EXPOSURE METHOD, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND EXPOSURE APPARATUS EVALUATION METHOD
JP2009302173A (ja) * 2008-06-11 2009-12-24 Canon Inc 露光装置及びデバイス製造方法
JP2011044554A (ja) * 2009-08-20 2011-03-03 Toshiba Corp 露光制御装置および半導体デバイスの製造方法

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