JP2022068832A5 - - Google Patents
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- JP2022068832A5 JP2022068832A5 JP2021142700A JP2021142700A JP2022068832A5 JP 2022068832 A5 JP2022068832 A5 JP 2022068832A5 JP 2021142700 A JP2021142700 A JP 2021142700A JP 2021142700 A JP2021142700 A JP 2021142700A JP 2022068832 A5 JP2022068832 A5 JP 2022068832A5
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- JP
- Japan
- Prior art keywords
- measurement object
- image data
- position information
- processing device
- reliability
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- 238000005259 measurement Methods 0.000 claims description 35
- 238000000034 method Methods 0.000 claims 7
- 238000010801 machine learning Methods 0.000 claims 6
- 238000003384 imaging method Methods 0.000 claims 5
- 239000000758 substrate Substances 0.000 claims 5
- 230000009466 transformation Effects 0.000 claims 3
- 238000001459 lithography Methods 0.000 claims 2
- 238000007689 inspection Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000003672 processing method Methods 0.000 claims 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW110137269A TWI862875B (zh) | 2020-10-22 | 2021-10-07 | 處理裝置和方法、測量裝置和方法、微影裝置、製造物品的方法、模型、產生方法和裝置 |
| US17/502,514 US12307643B2 (en) | 2020-10-22 | 2021-10-15 | Processing apparatus, measurement apparatus, lithography apparatus, method of manufacturing article, model, processing method, measurement method, generation method, and generation apparatus |
| CN202111214067.1A CN114384772A (zh) | 2020-10-22 | 2021-10-19 | 处理装置和方法、测量装置和方法、光刻装置、制造物品的方法、模型、生成方法和装置 |
| KR1020210140701A KR20220053492A (ko) | 2020-10-22 | 2021-10-21 | 처리 장치, 계측 장치, 리소그래피 장치, 물품을 제조하는 방법, 모델, 처리 방법, 계측 방법, 생성 방법, 및 생성 장치 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020177445 | 2020-10-22 | ||
| JP2020177445 | 2020-10-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2022068832A JP2022068832A (ja) | 2022-05-10 |
| JP2022068832A5 true JP2022068832A5 (enExample) | 2024-08-27 |
Family
ID=81460048
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021142700A Pending JP2022068832A (ja) | 2020-10-22 | 2021-09-01 | 処理装置、計測装置、リソグラフィ装置、物品製造方法、モデル、処理方法、計測方法、生成方法、およびコンピュータ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2022068832A (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2024046905A (ja) | 2022-09-26 | 2024-04-05 | 株式会社Ｓｃｒｅｅｎホールディングス | マーク検出方法およびコンピュータプログラム |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07120621B2 (ja) * | 1989-05-08 | 1995-12-20 | キヤノン株式会社 | 位置合せ方法 |
| JPH0737770A (ja) * | 1993-07-23 | 1995-02-07 | Canon Inc | 位置合わせ装置 |
| JP3666051B2 (ja) * | 1995-04-13 | 2005-06-29 | 株式会社ニコン | 位置合わせ方法及び装置、並びに露光方法及び装置 |
| JP3450645B2 (ja) * | 1997-04-07 | 2003-09-29 | キヤノン株式会社 | 位置検出方法及び位置検出装置 |
| JP2001237298A (ja) * | 2000-02-22 | 2001-08-31 | Canon Inc | アライメント計測用パラメータ調整方法、アライメント方法および露光装置 |
| US10210606B2 (en) * | 2014-10-14 | 2019-02-19 | Kla-Tencor Corporation | Signal response metrology for image based and scatterometry overlay measurements |
| US10877381B2 (en) * | 2016-10-21 | 2020-12-29 | Asml Netherlands B.V. | Methods of determining corrections for a patterning process |
| CN110612481A (zh) * | 2017-05-08 | 2019-12-24 | Asml荷兰有限公司 | 测量结构的方法、检查设备、光刻系统和器件制造方法 |
| WO2019063245A1 (en) * | 2017-09-28 | 2019-04-04 | Asml Netherlands B.V. | LITHOGRAPHIC METHOD |
| JP2020004918A (ja) * | 2018-06-29 | 2020-01-09 | キヤノン株式会社 | 情報処理装置、プログラム、加工装置、加工システム、および物品の製造方法 |
-
2021
- 2021-09-01 JP JP2021142700A patent/JP2022068832A/ja active Pending
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