JP2021534589A - 高アスペクト比エッチングのための金属含有パシベーション - Google Patents
高アスペクト比エッチングのための金属含有パシベーション Download PDFInfo
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Images
Classifications
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Abstract
Description
本願は、全ての目的のために参照として本明細書に援用される、2018年8月24日付けの米国出願第62/722,337号の優先権の利益を主張する。
特定の半導体デバイスの製造は、誘電材料へのフィーチャのエッチングを含む。誘電材料は、材料の単層または材料の積層であってよい。いくつかの場合では、積層は誘電材料の交互層(例えば、窒化シリコンおよび酸化シリコン)を含む。エッチングフィーチャの一例は、高アスペクト比を有しうる円筒形である。かかるフィーチャのアスペクト比が増加し続けるにつれて、誘電材料にフィーチャをエッチングすることはますます困難となっている。高アスペクト比フィーチャのエッチング時に生じる1つの問題は、不均一なエッチングプロファイルである。つまり、フィーチャは直下方向にエッチングされない。その代わり、フィーチャの側壁は、エッチングフィーチャの中央部がフィーチャの上部および/または底部よりも広くなる(すなわち、より多くエッチングされている)ようにたわむことが多い。フィーチャの中央部付近におけるこのオーバエッチングは、残留材料の構造的および/または電子的完全性の欠陥をもたらしうる。例えば、フィーチャのたわみおよびねじれは、隣接するメモリストリング間で短絡または干渉を引き起こしうる。
II.状況および適用
III.エッチング/堆積プロセス
IV.材料およびプロセス動作のパラメータ
A.基板
B.エッチングプロセス
C.堆積プロセス
D.マスク浸漬プロセス
E.前処理プロセス
F.保護膜除去プロセス
G.酸化プロセス
V.装置
実験
追加の実施形態
[適用例1]
基板上の誘電体含有積層にエッチングフィーチャを形成する方法であって、
(a)エッチング反応物を含む第1のプラズマに前記基板を暴露することにより、前記誘電体含有積層に前記フィーチャを部分的にエッチングする工程と、
(b)(a)の後に、前記フィーチャの側壁に保護膜を堆積させる工程であって、前記保護膜は、炭窒化タングステン、硫化タングステン、スズ、スズ含有化合物、モリブデン、モリブデン含有化合物、炭窒化ルテニウム、硫化ルテニウム、炭窒化アルミニウム、硫化アルミニウム、ジルコニウム、およびジルコニウム含有化合物のうちの少なくとも1つを含む、工程と、
(c)前記フィーチャが最終深さにエッチングされるまで(a)〜(b)を繰り返す工程と、を含み、
(b)で堆積された前記保護膜は、(a)の間に前記フィーチャの側面エッチングを実質的に防止し、前記フィーチャは、その最終深さにおいて約5以上のアスペクト比を有する、方法。
[適用例2]
適用例1に記載の方法であって、
前記保護膜は、炭窒化タングステンまたは硫化タングステンを含む、方法。
[適用例3]
適用例2に記載の方法であって、
前記保護膜は、炭窒化タングステンを含む、方法。
[適用例4]
適用例1に記載の方法であって、
前記保護膜は、スズ、酸化スズ、窒化スズ、炭化スズ、炭窒化スズ、または硫化スズを含む、方法。
[適用例5]
適用例4に記載の方法であって、
前記保護膜は、酸化スズを含む、方法。
[適用例6]
適用例1に記載の方法であって、
前記保護膜は、モリブデン、酸化モリブデン、炭化モリブデン、窒化モリブデン、炭窒化モリブデン、または硫化モリブデンを含む、方法。
[適用例7]
適用例1に記載の方法であって、
前記保護膜は、金属硫化物を含む、方法。
[適用例8]
適用例1に記載の方法であって、
前記保護膜は、炭窒化ルテニウムまたは硫化ルテニウムを含む、方法。
[適用例9]
適用例1に記載の方法であって、
前記保護膜は、炭窒化アルミニウムまたは硫化アルミニウムを含む、方法。
[適用例10]
適用例1に記載の方法であって、
前記保護膜は、ジルコニウム、酸化ジルコニウム、炭化ジルコニウム、窒化ジルコニウム、炭窒化ジルコニウム、または硫化ジルコニウムを含む、方法。
[適用例11]
適用例1に記載の方法であって、
(b)は、原子層堆積反応により前記保護膜を堆積させる工程を含み、前記原子層堆積反応は、
(i)前記基板を第1の堆積反応物に暴露し、前記第1の堆積反応物を前記フィーチャの前記側壁に吸着させる工程と、
(ii)(i)の後に、前記基板を第2の堆積反応物に暴露し、表面反応で前記第1の堆積反応物と前記第2の堆積反応物とを反応させることで、前記フィーチャの前記側壁に前記保護膜を形成する工程と、
を含む、方法。
[適用例12]
適用例1に記載の方法であって、
(b)は、化学蒸着反応により前記保護膜を堆積させる工程を含み、前記化学蒸着反応は、前記基板を第1の堆積反応物および第2の堆積反応物に同時に暴露する工程を含む、方法。
[適用例13]
適用例1に記載の方法であって、さらに、
(a)の前に、前記誘電体含有積層上のマスク層を浸漬する工程を含む、方法。
[適用例14]
適用例1に記載の方法であって、
(a)は、前記フィーチャの前記側壁へのフッ化炭素系被膜の形成をもたらし、
前記方法は、さらに、(a)の後であって(b)の前に、前記基板を前処理することで前記フッ化炭素系被膜を除去するまたは変質させる工程を含み、
前記基板を前処理する前記工程は、(i)N 2 およびH 2 を含むガス、または(ii)O 2 および不活性ガスを含むガスのいずれかから生成されたプラズマに前記基板を暴露する工程を含む、方法。
[適用例15]
適用例14に記載の方法であって、
前記保護膜は、炭窒化タングステンを含む、方法。
[適用例16]
適用例1に記載の方法であって、
(a)は、前記フィーチャの前記側壁へのフッ化炭素系被膜の形成をもたらし、前記保護膜は酸化スズを含み、前記酸化スズ保護膜は(b)において、(a)で形成された前記フッ化炭素系被膜に直接堆積される、方法。
[適用例17]
適用例1に記載の方法であって、さらに、
前記フィーチャが完全にエッチングされた後に、前記保護膜を前記側壁から除去する工程を含む、方法。
[適用例18]
適用例1に記載の方法であって、
前記保護膜は、炭窒化タングステンを含み、H 2 O 2 、SCl、またはCl 2 O 2 を含むガスから生成されたプラズマに前記基板を暴露することにより除去される、方法。
[適用例19]
適用例1に記載の方法であって、さらに、
前記フィーチャが完全にエッチングされた後に前記基板を酸化条件に暴露することで、前記フィーチャの前記側壁上のあらゆる残留保護膜を酸化させる工程を含む、方法。
[適用例20]
半導体基板上の誘電体含有積層にエッチングフィーチャを形成するための装置であって、
1つ以上の反応チャンバであって、少なくとも1つの反応チャンバはエッチングを実施するように設計または構成され、少なくとも1つの反応チャンバは堆積を実施するように設計または構成され、各反応チャンバは、
前記反応チャンバにプロセスガスを導入するための導入口と、
前記反応チャンバから材料を除去するための導出口と、を備える1つ以上の反応チャンバと、
コントローラであって、
(a)エッチング反応物を含む第1のプラズマに前記基板を暴露することにより、前記誘電体含有積層に前記フィーチャを部分的にエッチングさせるための命令であって、(a)は、エッチングを実施するように設計または構成された前記反応チャンバで実施される、命令と、
(b)(a)の後に、前記フィーチャの側壁に保護膜を堆積させるための命令であって、前記保護膜は、炭窒化タングステン、硫化タングステン、スズ、スズ含有化合物、モリブデン、モリブデン含有化合物のうちの少なくとも1つを含み、(b)は、堆積を実施するように設計または構成された前記反応チャンバで実施される、命令と、
(c)前記フィーチャが最終深さにエッチングされるまで(a)〜(b)を繰り返し行わせるための命令であって、(b)で堆積された前記保護膜は、(a)の間に前記フィーチャの側面エッチングを実質的に防止し、前記フィーチャは、その最終深さにおいて約5以上のアスペクト比を有する、命令と、を有するコントローラと、
を備える、装置。
[適用例21]
適用例20に記載の装置であって、
(a)および(b)が同じ反応チャンバで起こるように、エッチングを実施するように設計または構成された前記反応チャンバは、堆積を実施するように設計または構成された前記反応チャンバと同じである、装置。
[適用例22]
適用例20に記載の装置であって、
エッチングを実施するように設計または構成された前記反応チャンバは、堆積を実施するように設計または構成された前記反応チャンバと異なり、前記コントローラは、さらに、エッチングを実施するように設計または構成された前記反応チャンバと堆積を実施するように設計または構成された前記反応チャンバとの間で、真空条件下で前記基板を搬送するための命令を有する、装置。
Claims (22)
- 基板上の誘電体含有積層にエッチングフィーチャを形成する方法であって、
(a)エッチング反応物を含む第1のプラズマに前記基板を暴露することにより、前記誘電体含有積層に前記フィーチャを部分的にエッチングする工程と、
(b)(a)の後に、前記フィーチャの側壁に保護膜を堆積させる工程であって、前記保護膜は、炭窒化タングステン、硫化タングステン、スズ、スズ含有化合物、モリブデン、モリブデン含有化合物、炭窒化ルテニウム、硫化ルテニウム、炭窒化アルミニウム、硫化アルミニウム、ジルコニウム、およびジルコニウム含有化合物のうちの少なくとも1つを含む、工程と、
(c)前記フィーチャが最終深さにエッチングされるまで(a)〜(b)を繰り返す工程と、を含み、
(b)で堆積された前記保護膜は、(a)の間に前記フィーチャの側面エッチングを実質的に防止し、前記フィーチャは、その最終深さにおいて約5以上のアスペクト比を有する、方法。 - 請求項1に記載の方法であって、
前記保護膜は、炭窒化タングステンまたは硫化タングステンを含む、方法。 - 請求項2に記載の方法であって、
前記保護膜は、炭窒化タングステンを含む、方法。 - 請求項1に記載の方法であって、
前記保護膜は、スズ、酸化スズ、窒化スズ、炭化スズ、炭窒化スズ、または硫化スズを含む、方法。 - 請求項4に記載の方法であって、
前記保護膜は、酸化スズを含む、方法。 - 請求項1に記載の方法であって、
前記保護膜は、モリブデン、酸化モリブデン、炭化モリブデン、窒化モリブデン、炭窒化モリブデン、または硫化モリブデンを含む、方法。 - 請求項1に記載の方法であって、
前記保護膜は、金属硫化物を含む、方法。 - 請求項1に記載の方法であって、
前記保護膜は、炭窒化ルテニウムまたは硫化ルテニウムを含む、方法。 - 請求項1に記載の方法であって、
前記保護膜は、炭窒化アルミニウムまたは硫化アルミニウムを含む、方法。 - 請求項1に記載の方法であって、
前記保護膜は、ジルコニウム、酸化ジルコニウム、炭化ジルコニウム、窒化ジルコニウム、炭窒化ジルコニウム、または硫化ジルコニウムを含む、方法。 - 請求項1に記載の方法であって、
(b)は、原子層堆積反応により前記保護膜を堆積させる工程を含み、前記原子層堆積反応は、
(i)前記基板を第1の堆積反応物に暴露し、前記第1の堆積反応物を前記フィーチャの前記側壁に吸着させる工程と、
(ii)(i)の後に、前記基板を第2の堆積反応物に暴露し、表面反応で前記第1の堆積反応物と前記第2の堆積反応物とを反応させることで、前記フィーチャの前記側壁に前記保護膜を形成する工程と、
を含む、方法。 - 請求項1に記載の方法であって、
(b)は、化学蒸着反応により前記保護膜を堆積させる工程を含み、前記化学蒸着反応は、前記基板を第1の堆積反応物および第2の堆積反応物に同時に暴露する工程を含む、方法。 - 請求項1に記載の方法であって、さらに、
(a)の前に、前記誘電体含有積層上のマスク層を浸漬する工程を含む、方法。 - 請求項1に記載の方法であって、
(a)は、前記フィーチャの前記側壁へのフッ化炭素系被膜の形成をもたらし、
前記方法は、さらに、(a)の後であって(b)の前に、前記基板を前処理することで前記フッ化炭素系被膜を除去するまたは変質させる工程を含み、
前記基板を前処理する前記工程は、(i)N2およびH2を含むガス、または(ii)O2および不活性ガスを含むガスのいずれかから生成されたプラズマに前記基板を暴露する工程を含む、方法。 - 請求項14に記載の方法であって、
前記保護膜は、炭窒化タングステンを含む、方法。 - 請求項1に記載の方法であって、
(a)は、前記フィーチャの前記側壁へのフッ化炭素系被膜の形成をもたらし、前記保護膜は酸化スズを含み、前記酸化スズ保護膜は(b)において、(a)で形成された前記フッ化炭素系被膜に直接堆積される、方法。 - 請求項1に記載の方法であって、さらに、
前記フィーチャが完全にエッチングされた後に、前記保護膜を前記側壁から除去する工程を含む、方法。 - 請求項1に記載の方法であって、
前記保護膜は、炭窒化タングステンを含み、H2O2、SCl、またはCl2O2を含むガスから生成されたプラズマに前記基板を暴露することにより除去される、方法。 - 請求項1に記載の方法であって、さらに、
前記フィーチャが完全にエッチングされた後に前記基板を酸化条件に暴露することで、前記フィーチャの前記側壁上のあらゆる残留保護膜を酸化させる工程を含む、方法。 - 半導体基板上の誘電体含有積層にエッチングフィーチャを形成するための装置であって、
1つ以上の反応チャンバであって、少なくとも1つの反応チャンバはエッチングを実施するように設計または構成され、少なくとも1つの反応チャンバは堆積を実施するように設計または構成され、各反応チャンバは、
前記反応チャンバにプロセスガスを導入するための導入口と、
前記反応チャンバから材料を除去するための導出口と、を備える1つ以上の反応チャンバと、
コントローラであって、
(a)エッチング反応物を含む第1のプラズマに前記基板を暴露することにより、前記誘電体含有積層に前記フィーチャを部分的にエッチングさせるための命令であって、(a)は、エッチングを実施するように設計または構成された前記反応チャンバで実施される、命令と、
(b)(a)の後に、前記フィーチャの側壁に保護膜を堆積させるための命令であって、前記保護膜は、炭窒化タングステン、硫化タングステン、スズ、スズ含有化合物、モリブデン、モリブデン含有化合物のうちの少なくとも1つを含み、(b)は、堆積を実施するように設計または構成された前記反応チャンバで実施される、命令と、
(c)前記フィーチャが最終深さにエッチングされるまで(a)〜(b)を繰り返し行わせるための命令であって、(b)で堆積された前記保護膜は、(a)の間に前記フィーチャの側面エッチングを実質的に防止し、前記フィーチャは、その最終深さにおいて約5以上のアスペクト比を有する、命令と、を有するコントローラと、
を備える、装置。 - 請求項20に記載の装置であって、
(a)および(b)が同じ反応チャンバで起こるように、エッチングを実施するように設計または構成された前記反応チャンバは、堆積を実施するように設計または構成された前記反応チャンバと同じである、装置。 - 請求項20に記載の装置であって、
エッチングを実施するように設計または構成された前記反応チャンバは、堆積を実施するように設計または構成された前記反応チャンバと異なり、前記コントローラは、さらに、エッチングを実施するように設計または構成された前記反応チャンバと堆積を実施するように設計または構成された前記反応チャンバとの間で、真空条件下で前記基板を搬送するための命令を有する、装置。
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