JP2021523559A5 - - Google Patents
Info
- Publication number
- JP2021523559A5 JP2021523559A5 JP2020561041A JP2020561041A JP2021523559A5 JP 2021523559 A5 JP2021523559 A5 JP 2021523559A5 JP 2020561041 A JP2020561041 A JP 2020561041A JP 2020561041 A JP2020561041 A JP 2020561041A JP 2021523559 A5 JP2021523559 A5 JP 2021523559A5
- Authority
- JP
- Japan
- Prior art keywords
- coupled
- capacitor
- electrode
- conductive rod
- inductor
- Prior art date
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023214693A JP7761626B2 (ja) | 2018-05-03 | 2023-12-20 | ペデスタル用のｒｆ接地構成 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862666418P | 2018-05-03 | 2018-05-03 | |
| US62/666,418 | 2018-05-03 | ||
| PCT/US2019/028665 WO2019212799A1 (en) | 2018-05-03 | 2019-04-23 | Rf grounding configuration for pedestals |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023214693A Division JP7761626B2 (ja) | 2018-05-03 | 2023-12-20 | ペデスタル用のｒｆ接地構成 |
Publications (4)
| Publication Number | Publication Date |
|---|---|
| JP2021523559A JP2021523559A (ja) | 2021-09-02 |
| JPWO2019212799A5 JPWO2019212799A5 (https=) | 2022-05-09 |
| JP2021523559A5 true JP2021523559A5 (https=) | 2022-05-09 |
| JP7408570B2 JP7408570B2 (ja) | 2024-01-05 |
Family
ID=68385096
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020561041A Active JP7408570B2 (ja) | 2018-05-03 | 2019-04-23 | ペデスタル用のｒｆ接地構成 |
| JP2023214693A Active JP7761626B2 (ja) | 2018-05-03 | 2023-12-20 | ペデスタル用のｒｆ接地構成 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023214693A Active JP7761626B2 (ja) | 2018-05-03 | 2023-12-20 | ペデスタル用のｒｆ接地構成 |
Country Status (7)
| Country | Link |
|---|---|
| US (3) | US11569072B2 (https=) |
| JP (2) | JP7408570B2 (https=) |
| KR (2) | KR20250103788A (https=) |
| CN (3) | CN118448237A (https=) |
| SG (1) | SG11202010037QA (https=) |
| TW (3) | TWI906133B (https=) |
| WO (1) | WO2019212799A1 (https=) |
Families Citing this family (40)
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| US11709156B2 (en) | 2017-09-18 | 2023-07-25 | Waters Technologies Corporation | Use of vapor deposition coated flow paths for improved analytical analysis |
| US12180581B2 (en) | 2017-09-18 | 2024-12-31 | Waters Technologies Corporation | Use of vapor deposition coated flow paths for improved chromatography of metal interacting analytes |
| US11709155B2 (en) | 2017-09-18 | 2023-07-25 | Waters Technologies Corporation | Use of vapor deposition coated flow paths for improved chromatography of metal interacting analytes |
| US12181452B2 (en) | 2017-09-18 | 2024-12-31 | Waters Technologies Corporation | Use of vapor deposition coated flow paths for improved chromatography of metal interacting analytes |
| US10510575B2 (en) | 2017-09-20 | 2019-12-17 | Applied Materials, Inc. | Substrate support with multiple embedded electrodes |
| US10555412B2 (en) | 2018-05-10 | 2020-02-04 | Applied Materials, Inc. | Method of controlling ion energy distribution using a pulse generator with a current-return output stage |
| KR102592699B1 (ko) * | 2018-10-08 | 2023-10-23 | 에이에스엠 아이피 홀딩 비.브이. | 기판 지지 유닛 및 이를 포함하는 박막 증착 장치와 기판 처리 장치 |
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| US11918936B2 (en) | 2020-01-17 | 2024-03-05 | Waters Technologies Corporation | Performance and dynamic range for oligonucleotide bioanalysis through reduction of non specific binding |
| US11462389B2 (en) | 2020-07-31 | 2022-10-04 | Applied Materials, Inc. | Pulsed-voltage hardware assembly for use in a plasma processing system |
| US12352734B2 (en) | 2020-09-24 | 2025-07-08 | Waters Technologies Corporation | Chromatographic hardware improvements for separation of reactive molecules |
| US11798790B2 (en) | 2020-11-16 | 2023-10-24 | Applied Materials, Inc. | Apparatus and methods for controlling ion energy distribution |
| US11901157B2 (en) | 2020-11-16 | 2024-02-13 | Applied Materials, Inc. | Apparatus and methods for controlling ion energy distribution |
| KR102427905B1 (ko) * | 2020-12-21 | 2022-08-02 | 주식회사 테스 | 기판처리장치 |
| CN114695051B (zh) * | 2020-12-31 | 2025-02-21 | 拓荆科技股份有限公司 | 半导体处理设备及方法 |
| US11495470B1 (en) | 2021-04-16 | 2022-11-08 | Applied Materials, Inc. | Method of enhancing etching selectivity using a pulsed plasma |
| US11791138B2 (en) | 2021-05-12 | 2023-10-17 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
| US11948780B2 (en) | 2021-05-12 | 2024-04-02 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
| US11967483B2 (en) | 2021-06-02 | 2024-04-23 | Applied Materials, Inc. | Plasma excitation with ion energy control |
| US12148595B2 (en) | 2021-06-09 | 2024-11-19 | Applied Materials, Inc. | Plasma uniformity control in pulsed DC plasma chamber |
| US12525441B2 (en) | 2021-06-09 | 2026-01-13 | Applied Materials, Inc. | Plasma chamber and chamber component cleaning methods |
| US12525433B2 (en) | 2021-06-09 | 2026-01-13 | Applied Materials, Inc. | Method and apparatus to reduce feature charging in plasma processing chamber |
| US11810760B2 (en) | 2021-06-16 | 2023-11-07 | Applied Materials, Inc. | Apparatus and method of ion current compensation |
| KR102919153B1 (ko) * | 2021-06-21 | 2026-01-27 | 어플라이드 머티어리얼스, 인코포레이티드 | 프로세스 챔버들의 라디오 주파수 전극 임피던스들을 제어하기 위한 방법들 및 장치 |
| US11569066B2 (en) | 2021-06-23 | 2023-01-31 | Applied Materials, Inc. | Pulsed voltage source for plasma processing applications |
| US11776788B2 (en) | 2021-06-28 | 2023-10-03 | Applied Materials, Inc. | Pulsed voltage boost for substrate processing |
| US11476090B1 (en) | 2021-08-24 | 2022-10-18 | Applied Materials, Inc. | Voltage pulse time-domain multiplexing |
| US12106938B2 (en) | 2021-09-14 | 2024-10-01 | Applied Materials, Inc. | Distortion current mitigation in a radio frequency plasma processing chamber |
| US11694876B2 (en) | 2021-12-08 | 2023-07-04 | Applied Materials, Inc. | Apparatus and method for delivering a plurality of waveform signals during plasma processing |
| US11972924B2 (en) | 2022-06-08 | 2024-04-30 | Applied Materials, Inc. | Pulsed voltage source for plasma processing applications |
| US12315732B2 (en) | 2022-06-10 | 2025-05-27 | Applied Materials, Inc. | Method and apparatus for etching a semiconductor substrate in a plasma etch chamber |
| US12586768B2 (en) | 2022-08-10 | 2026-03-24 | Applied Materials, Inc. | Pulsed voltage compensation for plasma processing applications |
| US12272524B2 (en) | 2022-09-19 | 2025-04-08 | Applied Materials, Inc. | Wideband variable impedance load for high volume manufacturing qualification and on-site diagnostics |
| US12111341B2 (en) | 2022-10-05 | 2024-10-08 | Applied Materials, Inc. | In-situ electric field detection method and apparatus |
| CN118073160B (zh) * | 2022-11-23 | 2025-09-16 | 北京北方华创微电子装备有限公司 | 射频功率的馈入结构及半导体工艺设备 |
| US20240186123A1 (en) * | 2022-12-02 | 2024-06-06 | Applied Materials, Inc. | Heated Pedestal With Impedance Matching Radio Frequency (RF) Rod |
| US20250062104A1 (en) * | 2023-08-16 | 2025-02-20 | Applied Materials, Inc. | Heated pedestal with low impedance rf rod |
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-
2019
- 2019-04-23 WO PCT/US2019/028665 patent/WO2019212799A1/en not_active Ceased
- 2019-04-23 US US16/391,996 patent/US11569072B2/en active Active
- 2019-04-23 CN CN202410624390.3A patent/CN118448237A/zh active Pending
- 2019-04-23 KR KR1020257020873A patent/KR20250103788A/ko active Pending
- 2019-04-23 JP JP2020561041A patent/JP7408570B2/ja active Active
- 2019-04-23 SG SG11202010037QA patent/SG11202010037QA/en unknown
- 2019-04-23 KR KR1020207034639A patent/KR102826471B1/ko active Active
- 2019-04-23 CN CN202311588325.1A patent/CN117612918A/zh active Pending
- 2019-04-23 CN CN201980029768.2A patent/CN112106169B/zh active Active
- 2019-05-03 TW TW114103751A patent/TWI906133B/zh active
- 2019-05-03 TW TW108115374A patent/TWI828686B/zh active
- 2019-05-03 US US16/403,489 patent/US10923334B2/en active Active
- 2019-05-03 TW TW112148261A patent/TWI906714B/zh active
-
2023
- 2023-01-26 US US18/102,055 patent/US20230170190A1/en active Pending
- 2023-12-20 JP JP2023214693A patent/JP7761626B2/ja active Active
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