JP2021512469A5 - - Google Patents
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- Publication number
- JP2021512469A5 JP2021512469A5 JP2020542130A JP2020542130A JP2021512469A5 JP 2021512469 A5 JP2021512469 A5 JP 2021512469A5 JP 2020542130 A JP2020542130 A JP 2020542130A JP 2020542130 A JP2020542130 A JP 2020542130A JP 2021512469 A5 JP2021512469 A5 JP 2021512469A5
- Authority
- JP
- Japan
- Prior art keywords
- electron source
- operating
- bias
- temperature
- emission point
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 238000010438 heat treatment Methods 0.000 claims 20
- 238000000034 method Methods 0.000 claims 18
- 230000005684 electric field Effects 0.000 claims 6
- 230000008020 evaporation Effects 0.000 claims 4
- 238000001704 evaporation Methods 0.000 claims 4
- 238000011017 operating method Methods 0.000 claims 4
- 230000008034 disappearance Effects 0.000 claims 3
- 239000007795 chemical reaction product Substances 0.000 claims 2
- 239000007789 gas Substances 0.000 claims 2
- 229910052751 metal Inorganic materials 0.000 claims 2
- 239000002184 metal Substances 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 229910052721 tungsten Inorganic materials 0.000 claims 1
- 239000010937 tungsten Substances 0.000 claims 1
- -1 tungsten hydrogen compound Chemical class 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811190748.7 | 2018-10-12 | ||
| CN201811190748.7A CN111048372B (zh) | 2018-10-12 | 2018-10-12 | 一种电子源工作方法 |
| PCT/CN2018/124331 WO2020073512A1 (zh) | 2018-10-12 | 2018-12-27 | 一种电子源工作方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2021512469A JP2021512469A (ja) | 2021-05-13 |
| JP2021512469A5 true JP2021512469A5 (enExample) | 2021-06-24 |
| JP6959457B2 JP6959457B2 (ja) | 2021-11-02 |
Family
ID=70164171
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020542130A Active JP6959457B2 (ja) | 2018-10-12 | 2018-12-27 | 電子源動作方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US11430625B2 (enExample) |
| EP (1) | EP3770944A4 (enExample) |
| JP (1) | JP6959457B2 (enExample) |
| KR (1) | KR102469975B1 (enExample) |
| CN (1) | CN111048372B (enExample) |
| TW (2) | TW202020919A (enExample) |
| WO (1) | WO2020073512A1 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11335529B2 (en) * | 2020-06-19 | 2022-05-17 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy | Thermally enhanced compound field emitter |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5912533A (ja) | 1982-07-12 | 1984-01-23 | Hitachi Ltd | 拡散補給形電子線源 |
| JPH07192669A (ja) | 1993-12-27 | 1995-07-28 | Jeol Ltd | 電界電離型ガスフェーズイオン源の調整方法 |
| US6281626B1 (en) * | 1998-03-24 | 2001-08-28 | Casio Computer Co., Ltd. | Cold emission electrode method of manufacturing the same and display device using the same |
| US6573642B1 (en) * | 2000-01-26 | 2003-06-03 | Motorola, Inc. | Field emission device and method for the conditioning thereof |
| JP2003100244A (ja) * | 2001-09-26 | 2003-04-04 | Jeol Ltd | 電子ビーム源 |
| US7431856B2 (en) | 2005-05-18 | 2008-10-07 | National Research Council Of Canada | Nano-tip fabrication by spatially controlled etching |
| CN102394204B (zh) | 2008-03-19 | 2014-10-08 | 清华大学 | 场发射电子源 |
| JP2011065790A (ja) * | 2009-09-15 | 2011-03-31 | Tokyo Electron Ltd | 電子源、電子源の製造方法及び電子放出方法 |
| JP5455700B2 (ja) | 2010-02-18 | 2014-03-26 | 株式会社日立ハイテクノロジーズ | 電界放出電子銃及びその制御方法 |
| JP5363413B2 (ja) | 2010-05-10 | 2013-12-11 | 電気化学工業株式会社 | 電子源 |
| US8736170B1 (en) * | 2011-02-22 | 2014-05-27 | Fei Company | Stable cold field emission electron source |
| CN102789947B (zh) | 2011-05-16 | 2015-06-17 | 中国电子科技集团公司第三十八研究所 | 粒子源及其制造方法 |
| CN102789946B (zh) * | 2011-05-16 | 2016-01-13 | 中国电子科技集团公司第三十八研究所 | 粒子源 |
| CN102842474B (zh) * | 2011-06-22 | 2015-11-25 | 中国电子科技集团公司第三十八研究所 | 粒子源及其制造方法 |
| CN102629538B (zh) * | 2012-04-13 | 2014-03-19 | 吴江炀晟阴极材料有限公司 | 具有低逸出功和高化学稳定性的电极材料 |
| US8952605B2 (en) | 2012-07-03 | 2015-02-10 | National Institute For Materials Science | Metal hexaboride cold field emitter, method of fabricating same, and electron gun |
| CN104704601B (zh) * | 2012-10-12 | 2017-06-23 | 株式会社日立高新技术 | 电子源的制造方法 |
| JP6266458B2 (ja) * | 2013-08-09 | 2018-01-24 | 株式会社日立ハイテクサイエンス | イリジウムティップ、ガス電界電離イオン源、集束イオンビーム装置、電子源、電子顕微鏡、電子ビーム応用分析装置、イオン電子複合ビーム装置、走査プローブ顕微鏡、およびマスク修正装置 |
| CN105140091B (zh) * | 2015-07-27 | 2017-05-31 | 北京中科科仪股份有限公司 | 一种场发射电子枪烘烤装置和一种电子枪室的烘烤方法 |
| US10133181B2 (en) | 2015-08-14 | 2018-11-20 | Kla-Tencor Corporation | Electron source |
| US9984846B2 (en) | 2016-06-30 | 2018-05-29 | Kla-Tencor Corporation | High brightness boron-containing electron beam emitters for use in a vacuum environment |
-
2018
- 2018-10-12 CN CN201811190748.7A patent/CN111048372B/zh active Active
- 2018-12-27 JP JP2020542130A patent/JP6959457B2/ja active Active
- 2018-12-27 EP EP18936479.7A patent/EP3770944A4/en not_active Withdrawn
- 2018-12-27 KR KR1020207022430A patent/KR102469975B1/ko active Active
- 2018-12-27 US US16/966,910 patent/US11430625B2/en active Active
- 2018-12-27 WO PCT/CN2018/124331 patent/WO2020073512A1/zh not_active Ceased
-
2019
- 2019-10-08 TW TW108136469A patent/TW202020919A/zh unknown
- 2019-10-14 TW TW108136929A patent/TWI729527B/zh active
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