JP2021510210A5 - - Google Patents
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- JP2021510210A5 JP2021510210A5 JP2020536834A JP2020536834A JP2021510210A5 JP 2021510210 A5 JP2021510210 A5 JP 2021510210A5 JP 2020536834 A JP2020536834 A JP 2020536834A JP 2020536834 A JP2020536834 A JP 2020536834A JP 2021510210 A5 JP2021510210 A5 JP 2021510210A5
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- JP
- Japan
- Prior art keywords
- positive
- diffraction patterns
- superposition
- asymmetry
- negative
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 9
- 230000000737 periodic effect Effects 0.000 claims 7
- 238000005259 measurement Methods 0.000 claims 4
- 238000004364 calculation method Methods 0.000 claims 3
- 238000004458 analytical method Methods 0.000 claims 2
- 238000012544 monitoring process Methods 0.000 claims 2
- 230000001052 transient effect Effects 0.000 claims 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/757,119 US20180342063A1 (en) | 2017-01-03 | 2018-01-02 | Diffraction Based Overlay Scatterometry |
| USPCT/US2018/012070 | 2018-01-02 | ||
| PCT/US2018/012070 WO2018128984A1 (en) | 2017-01-03 | 2018-01-02 | Diffraction based overlay scatterometry |
| US15/757,119 | 2018-03-02 | ||
| US16/122,495 US10824079B2 (en) | 2017-01-03 | 2018-09-05 | Diffraction based overlay scatterometry |
| US16/122,495 | 2018-09-05 | ||
| PCT/US2018/057896 WO2019135819A1 (en) | 2017-01-03 | 2018-10-29 | Diffraction based overlay scatterometry |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2021510210A JP2021510210A (ja) | 2021-04-15 |
| JP2021510210A5 true JP2021510210A5 (enExample) | 2021-12-02 |
| JP7101786B2 JP7101786B2 (ja) | 2022-07-15 |
Family
ID=68318115
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020536834A Active JP7101786B2 (ja) | 2018-01-02 | 2018-10-29 | 回折に基づく重ね合わせ散乱計測 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US10824079B2 (enExample) |
| EP (1) | EP3721296A4 (enExample) |
| JP (1) | JP7101786B2 (enExample) |
| KR (1) | KR102391336B1 (enExample) |
| CN (2) | CN111566564A (enExample) |
| IL (1) | IL275650B2 (enExample) |
| SG (1) | SG11202006133SA (enExample) |
| TW (1) | TWI798265B (enExample) |
| WO (1) | WO2019135819A1 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10705435B2 (en) | 2018-01-12 | 2020-07-07 | Globalfoundries Inc. | Self-referencing and self-calibrating interference pattern overlay measurement |
| CN114341739A (zh) * | 2019-08-30 | 2022-04-12 | Asml控股股份有限公司 | 计量系统和方法 |
| US11686576B2 (en) | 2020-06-04 | 2023-06-27 | Kla Corporation | Metrology target for one-dimensional measurement of periodic misregistration |
| US12100574B2 (en) | 2020-07-01 | 2024-09-24 | Kla Corporation | Target and algorithm to measure overlay by modeling back scattering electrons on overlapping structures |
| US11355375B2 (en) * | 2020-07-09 | 2022-06-07 | Kla Corporation | Device-like overlay metrology targets displaying Moiré effects |
| US11300405B2 (en) * | 2020-08-03 | 2022-04-12 | Kla Corporation | Grey-mode scanning scatterometry overlay metrology |
| CN112729113B (zh) * | 2020-12-25 | 2022-03-18 | 长江存储科技有限责任公司 | 套合精度的测量方法及测量装置 |
| US11796925B2 (en) * | 2022-01-03 | 2023-10-24 | Kla Corporation | Scanning overlay metrology using overlay targets having multiple spatial frequencies |
| US12032300B2 (en) | 2022-02-14 | 2024-07-09 | Kla Corporation | Imaging overlay with mutually coherent oblique illumination |
| US12422363B2 (en) | 2022-03-30 | 2025-09-23 | Kla Corporation | Scanning scatterometry overlay metrology |
| US12487190B2 (en) | 2022-03-30 | 2025-12-02 | Kla Corporation | System and method for isolation of specific fourier pupil frequency in overlay metrology |
| US12235588B2 (en) | 2023-02-16 | 2025-02-25 | Kla Corporation | Scanning overlay metrology with high signal to noise ratio |
| US12373936B2 (en) | 2023-12-08 | 2025-07-29 | Kla Corporation | System and method for overlay metrology using a phase mask |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5453969A (en) * | 1994-05-04 | 1995-09-26 | California Institute Of Technology | Optical memory with pit depth encoding |
| US5598265A (en) * | 1995-04-06 | 1997-01-28 | Zygo Corporation | Method for profiling an object surface using a large equivalent wavelength and system therefor |
| IL138552A (en) * | 2000-09-19 | 2006-08-01 | Nova Measuring Instr Ltd | Lateral shift measurement using an optical technique |
| US7193715B2 (en) * | 2002-11-14 | 2007-03-20 | Tokyo Electron Limited | Measurement of overlay using diffraction gratings when overlay exceeds the grating period |
| US7230703B2 (en) | 2003-07-17 | 2007-06-12 | Tokyo Electron Limited | Apparatus and method for measuring overlay by diffraction gratings |
| CN100468213C (zh) * | 2006-10-18 | 2009-03-11 | 上海微电子装备有限公司 | 用于光刻装置的对准系统及其级结合光栅系统 |
| US7710572B2 (en) * | 2006-11-30 | 2010-05-04 | Asml Netherlands B.V. | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
| CN101876538A (zh) * | 2010-05-07 | 2010-11-03 | 中国科学院光电技术研究所 | 一种接近式纳米光刻中的间隙测量方法 |
| IL217843A (en) * | 2011-02-11 | 2016-11-30 | Asml Netherlands Bv | A system and method for testing, a lithographic system, a cell for lithographic processing, and a method for producing a device |
| US20120244461A1 (en) | 2011-03-25 | 2012-09-27 | Toshiba America Electronic Components, Inc. | Overlay control method and a semiconductor manufacturing method and apparatus employing the same |
| JP5967924B2 (ja) * | 2011-12-21 | 2016-08-10 | キヤノン株式会社 | 位置検出装置、インプリント装置およびデバイス製造方法 |
| WO2014062972A1 (en) * | 2012-10-18 | 2014-04-24 | Kla-Tencor Corporation | Symmetric target design in scatterometry overlay metrology |
| US9189705B2 (en) * | 2013-08-08 | 2015-11-17 | JSMSW Technology LLC | Phase-controlled model-based overlay measurement systems and methods |
| NL2013737A (en) * | 2013-11-26 | 2015-05-27 | Asml Netherlands Bv | Metrology method and apparatus, substrates for use in such methods, lithographic system and device manufacturing method. |
| KR101918251B1 (ko) | 2014-06-02 | 2018-11-13 | 에이에스엠엘 네델란즈 비.브이. | 메트롤로지 타겟들을 디자인하는 방법, 메트롤로지 타겟들을 갖는 기판들, 오버레이를 측정하는 방법, 및 디바이스 제조 방법 |
| WO2016078862A1 (en) * | 2014-11-21 | 2016-05-26 | Asml Netherlands B.V. | Metrology method and apparatus |
| CN112698551B (zh) | 2014-11-25 | 2024-04-23 | 科磊股份有限公司 | 分析及利用景观 |
| CN107111245B (zh) * | 2014-12-19 | 2019-10-18 | Asml荷兰有限公司 | 测量非对称性的方法、检查设备、光刻系统及器件制造方法 |
| JP6697560B2 (ja) * | 2015-12-23 | 2020-05-20 | エーエスエムエル ネザーランズ ビー．ブイ． | メトロロジ方法及び装置 |
| CN106933046B (zh) * | 2015-12-30 | 2019-05-03 | 上海微电子装备（集团）股份有限公司 | 用于套刻误差检测的装置及测校方法 |
| CN107340689B (zh) * | 2016-02-29 | 2019-10-25 | 上海微电子装备（集团）股份有限公司 | 一种测量套刻误差的装置和方法 |
| US20180342063A1 (en) * | 2017-01-03 | 2018-11-29 | Kla-Tencor Corporation | Diffraction Based Overlay Scatterometry |
-
2018
- 2018-09-05 US US16/122,495 patent/US10824079B2/en active Active
- 2018-09-26 TW TW107133838A patent/TWI798265B/zh active
- 2018-10-29 CN CN201880085028.6A patent/CN111566564A/zh active Pending
- 2018-10-29 EP EP18898220.1A patent/EP3721296A4/en active Pending
- 2018-10-29 CN CN202511051445.7A patent/CN120762257A/zh active Pending
- 2018-10-29 JP JP2020536834A patent/JP7101786B2/ja active Active
- 2018-10-29 SG SG11202006133SA patent/SG11202006133SA/en unknown
- 2018-10-29 WO PCT/US2018/057896 patent/WO2019135819A1/en not_active Ceased
- 2018-10-29 KR KR1020207022325A patent/KR102391336B1/ko active Active
-
2020
- 2020-06-25 IL IL275650A patent/IL275650B2/en unknown
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