JP2021509172A5 - - Google Patents
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- JP2021509172A5 JP2021509172A5 JP2020533736A JP2020533736A JP2021509172A5 JP 2021509172 A5 JP2021509172 A5 JP 2021509172A5 JP 2020533736 A JP2020533736 A JP 2020533736A JP 2020533736 A JP2020533736 A JP 2020533736A JP 2021509172 A5 JP2021509172 A5 JP 2021509172A5
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- JP
- Japan
- Prior art keywords
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- curable composition
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- weight
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- Prior art date
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- 239000011859 microparticle Substances 0.000 claims 7
- 239000002105 nanoparticle Substances 0.000 claims 7
- 230000005855 radiation Effects 0.000 claims 7
- 239000012952 cationic photoinitiator Substances 0.000 claims 5
- 239000000945 filler Substances 0.000 claims 5
- 239000002245 particle Substances 0.000 claims 5
- 229910018286 SbF 6 Inorganic materials 0.000 claims 4
- 125000000217 alkyl group Chemical group 0.000 claims 4
- -1 cyclic lactone Chemical class 0.000 claims 4
- 239000000990 laser dye Substances 0.000 claims 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 4
- 239000000049 pigment Substances 0.000 claims 4
- 150000001450 anions Chemical class 0.000 claims 3
- 150000001875 compounds Chemical class 0.000 claims 3
- 239000000975 dye Substances 0.000 claims 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 3
- 239000002243 precursor Substances 0.000 claims 3
- 229910020366 ClO 4 Inorganic materials 0.000 claims 2
- 238000002835 absorbance Methods 0.000 claims 2
- 125000002091 cationic group Chemical group 0.000 claims 2
- 239000012949 free radical photoinitiator Substances 0.000 claims 2
- 150000002500 ions Chemical class 0.000 claims 2
- 230000031700 light absorption Effects 0.000 claims 2
- JGTNAGYHADQMCM-UHFFFAOYSA-M 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F JGTNAGYHADQMCM-UHFFFAOYSA-M 0.000 claims 1
- 229910017008 AsF 6 Inorganic materials 0.000 claims 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N Benzoic acid Natural products OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims 1
- 239000005711 Benzoic acid Substances 0.000 claims 1
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 claims 1
- SRSXLGNVWSONIS-UHFFFAOYSA-M benzenesulfonate Chemical compound [O-]S(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-M 0.000 claims 1
- 229940077388 benzenesulfonate Drugs 0.000 claims 1
- 235000010233 benzoic acid Nutrition 0.000 claims 1
- QDHFHIQKOVNCNC-UHFFFAOYSA-M butane-1-sulfonate Chemical compound CCCCS([O-])(=O)=O QDHFHIQKOVNCNC-UHFFFAOYSA-M 0.000 claims 1
- 239000000306 component Substances 0.000 claims 1
- 230000035515 penetration Effects 0.000 claims 1
- 238000007493 shaping process Methods 0.000 claims 1
- 239000003381 stabilizer Substances 0.000 claims 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 claims 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201762612157P | 2017-12-29 | 2017-12-29 | |
| US62/612,157 | 2017-12-29 | ||
| US201862619439P | 2018-01-19 | 2018-01-19 | |
| US62/619,439 | 2018-01-19 | ||
| PCT/US2018/066346 WO2019133349A1 (en) | 2017-12-29 | 2018-12-19 | Compositions and articles for additive fabrication and methods of using the same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2021509172A JP2021509172A (ja) | 2021-03-18 |
| JP2021509172A5 true JP2021509172A5 (enExample) | 2021-12-02 |
| JP7251715B2 JP7251715B2 (ja) | 2023-04-04 |
Family
ID=65244588
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020533736A Active JP7251715B2 (ja) | 2017-12-29 | 2018-12-19 | 付加造形用組成物及び物品並びにそれらの使用方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US11180594B2 (enExample) |
| EP (1) | EP3732021A1 (enExample) |
| JP (1) | JP7251715B2 (enExample) |
| KR (1) | KR102864443B1 (enExample) |
| CN (3) | CN111526977B (enExample) |
| WO (1) | WO2019133349A1 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111526977B (zh) * | 2017-12-29 | 2022-07-01 | 科思创(荷兰)有限公司 | 用于加成制造的组合物和制品及其使用方法 |
| WO2020136654A1 (en) * | 2018-12-27 | 2020-07-02 | Stratasys Ltd. | Additive manufacturing using reinforced materials |
| CN112730880A (zh) * | 2020-12-08 | 2021-04-30 | 北京星航机电装备有限公司 | 一种增材制造设备风场校验系统及方法 |
| CN113984328B (zh) * | 2021-12-30 | 2022-03-22 | 清华大学 | 一种用于控制piv系统测量流场的三自由度调节平台 |
Family Cites Families (48)
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| US5665792A (en) | 1995-06-07 | 1997-09-09 | E. I. Du Pont De Nemours And Company | Stabilizers for use with photoacid precursor formulations |
| US5866628A (en) * | 1996-08-30 | 1999-02-02 | Day-Glo Color Corp. | Ultraviolet and electron beam radiation curable fluorescent printing ink concentrates and printing inks |
| JPH1087963A (ja) | 1996-09-20 | 1998-04-07 | Japan Synthetic Rubber Co Ltd | 樹脂組成物および繊維質材料成形型 |
| US6031021A (en) | 1997-04-11 | 2000-02-29 | Ncr Corporation | Thermal transfer ribbon with thermal dye color palette |
| JP4204113B2 (ja) | 1997-12-04 | 2009-01-07 | 株式会社Adeka | 新規な芳香族スルホニウム化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光造形用樹脂組成物ならびに光学的立体造形法 |
| US20030149124A1 (en) | 2001-11-27 | 2003-08-07 | Thommes Glen A. | Radiation curable resin composition for making colored three dimensional objects |
| WO2004029037A1 (ja) | 2002-09-25 | 2004-04-08 | Asahi Denka Co.Ltd. | 新規な芳香族スルホニウム塩化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光学的立体造形用樹脂組成物並びに光学的立体造形法 |
| EP1583740B1 (en) | 2002-12-23 | 2010-05-26 | STX Aprilis, Inc. | Fluoroarylsulfonium photoacid generators |
| US20050040562A1 (en) | 2003-08-19 | 2005-02-24 | 3D Systems Inc. | Nanoparticle-filled stereolithographic resins |
| CN1838934B (zh) * | 2003-09-05 | 2011-04-20 | 罗狄亚化学公司 | 具有高填料含量的可聚合牙科组合物 |
| US7230122B2 (en) | 2003-11-04 | 2007-06-12 | National Starch And Chemical Investment Holding Corporation | Sulfonium salt photinitiators and use thereof |
| US20050101684A1 (en) * | 2003-11-06 | 2005-05-12 | Xiaorong You | Curable compositions and rapid prototyping process using the same |
| JP2007514805A (ja) | 2003-11-06 | 2007-06-07 | ディーエスエム アイピー アセッツ ビー.ブイ. | 硬化性組成物およびそれを用いるラピッドプロトタイピング法 |
| KR101474174B1 (ko) * | 2004-03-22 | 2014-12-17 | 3디 시스템즈 인코오퍼레이티드 | 광경화성 조성물 |
| EP1877224A1 (en) * | 2005-04-08 | 2008-01-16 | Saint-Gobain Abrasives, Inc. | Abrasive article having reaction activated chromophore |
| JP2006348214A (ja) | 2005-06-17 | 2006-12-28 | Jsr Corp | 光造形用光硬化性液状組成物、立体造形物及びその製造方法 |
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| JP5304977B2 (ja) | 2007-10-04 | 2013-10-02 | セイコーエプソン株式会社 | 光硬化組成物を用いた硬化物の形成方法およびその硬化物 |
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| KR101653427B1 (ko) | 2008-10-20 | 2016-09-01 | 바스프 에스이 | 술포늄 유도체 및 잠재성 산으로서의 그의 용도 |
| CN102317258B (zh) | 2009-02-20 | 2014-06-04 | 三亚普罗股份有限公司 | 锍盐、光酸产生剂及光敏性树脂组合物 |
| DE112010002857T8 (de) * | 2009-07-08 | 2013-02-07 | Honda Motor Co., Ltd. | Teilchenbildgeschwindigkeitsmessungsverfahren, Teilchenbildgeschwindigkeitsmessungsverfahren für einen dreidimensionalen Raum, Teilchenbildgeschwindigkeitsmessungssystem und Tracerteilchen-Erzeugungsvorrichtung in einem Teilchenbildgeschwindigkeitsmessungssystem |
| US9025849B2 (en) | 2009-09-16 | 2015-05-05 | Monash University | Partical image velocimetry suitable for X-ray projection imaging |
| ES2899745T3 (es) * | 2009-09-16 | 2022-03-14 | 4Dmedical Ltd | Velocimetría de imágenes de partículas adecuada para la formación de imágenes por proyección de rayos X |
| US9034236B2 (en) | 2009-12-17 | 2015-05-19 | Dsm Ip Assets B.V. | Substrate-based additive fabrication process |
| KR101666263B1 (ko) * | 2011-03-07 | 2016-10-13 | 산요가세이고교 가부시키가이샤 | 감광성 조성물, 경화물, 및, 활성 광선 경화물의 제조 방법 |
| CN109503761B (zh) | 2013-11-05 | 2022-02-01 | 科思创(荷兰)有限公司 | 用于加成制造的稳定的基质填充的液体可辐射固化树脂组合物 |
| CN106030711B (zh) * | 2013-12-20 | 2019-02-22 | 科思创德国股份有限公司 | 具有改进的光敏性的全息介质 |
| US9962142B2 (en) * | 2014-11-14 | 2018-05-08 | The Regents Of The University Of California | Ultrasound-based volumetric particle tracking method |
| JP6780225B2 (ja) | 2015-08-06 | 2020-11-04 | 株式会社リコー | 活性エネルギー線硬化型立体造形用組成物、活性エネルギー線硬化型インク、組成物収容容器、像の形成方法及び形成装置、並びに成形加工品 |
| EP3347399B1 (en) * | 2015-09-09 | 2020-12-09 | Carbon, Inc. | Epoxy dual cure resins for additive manufacturing |
| WO2017059222A1 (en) | 2015-10-01 | 2017-04-06 | Dsm Ip Assets B.V. | Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication |
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| EP3341792A1 (en) * | 2015-12-22 | 2018-07-04 | Carbon, Inc. | Dual precursor resin systems for additive manufacturing with dual cure resins |
| CN105924571B (zh) * | 2016-05-19 | 2018-08-07 | 深圳长朗智能科技有限公司 | 连续光固化三维打印材料 |
| WO2018119049A1 (en) * | 2016-12-20 | 2018-06-28 | Basf Se | Photopolymer ceramic dispersion for additive fabrication |
| US10239255B2 (en) | 2017-04-11 | 2019-03-26 | Molecule Corp | Fabrication of solid materials or films from a polymerizable liquid |
| CN111526977B (zh) | 2017-12-29 | 2022-07-01 | 科思创(荷兰)有限公司 | 用于加成制造的组合物和制品及其使用方法 |
-
2018
- 2018-12-19 CN CN201880084297.0A patent/CN111526977B/zh active Active
- 2018-12-19 WO PCT/US2018/066346 patent/WO2019133349A1/en not_active Ceased
- 2018-12-19 KR KR1020207021790A patent/KR102864443B1/ko active Active
- 2018-12-19 JP JP2020533736A patent/JP7251715B2/ja active Active
- 2018-12-19 US US16/957,820 patent/US11180594B2/en active Active
- 2018-12-19 CN CN202210662066.1A patent/CN115179544B/zh active Active
- 2018-12-19 CN CN202210662915.3A patent/CN115179545B/zh active Active
- 2018-12-19 EP EP18842602.7A patent/EP3732021A1/en active Pending
-
2021
- 2021-10-15 US US17/502,631 patent/US11878459B2/en active Active
-
2023
- 2023-12-21 US US18/391,760 patent/US12296528B2/en active Active
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