JP2000186071A5 - - Google Patents

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Publication number
JP2000186071A5
JP2000186071A5 JP1998291898A JP29189898A JP2000186071A5 JP 2000186071 A5 JP2000186071 A5 JP 2000186071A5 JP 1998291898 A JP1998291898 A JP 1998291898A JP 29189898 A JP29189898 A JP 29189898A JP 2000186071 A5 JP2000186071 A5 JP 2000186071A5
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JP
Japan
Prior art keywords
group
resin composition
optical
dimensional modeling
halogen atom
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JP1998291898A
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English (en)
Japanese (ja)
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JP4204113B2 (ja
JP2000186071A (ja
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Priority claimed from JP29189898A external-priority patent/JP4204113B2/ja
Priority to JP29189898A priority Critical patent/JP4204113B2/ja
Priority to EP98957164A priority patent/EP1036789B1/en
Priority to DE69811942T priority patent/DE69811942T2/de
Priority to PCT/JP1998/005472 priority patent/WO1999028295A1/ja
Priority to US09/555,632 priority patent/US6368769B1/en
Publication of JP2000186071A publication Critical patent/JP2000186071A/ja
Publication of JP2000186071A5 publication Critical patent/JP2000186071A5/ja
Publication of JP4204113B2 publication Critical patent/JP4204113B2/ja
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Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP29189898A 1997-12-04 1998-10-14 新規な芳香族スルホニウム化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光造形用樹脂組成物ならびに光学的立体造形法 Expired - Lifetime JP4204113B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP29189898A JP4204113B2 (ja) 1997-12-04 1998-10-14 新規な芳香族スルホニウム化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光造形用樹脂組成物ならびに光学的立体造形法
US09/555,632 US6368769B1 (en) 1997-12-04 1998-12-04 Aromatic sulfonium compounds, photoacid generators comprising the same, photopolymerizable compositions containing the same, stereolithographic resin compositions, and stereolithographic process
DE69811942T DE69811942T2 (de) 1997-12-04 1998-12-04 Aromatische sulfone, ihre verwendung in substanzen, welche lichtinduziert säure freisetzen, photopolymerisierbare gemische diese enthaltend, stereolithographische harze und stereolithographischer prozess
PCT/JP1998/005472 WO1999028295A1 (fr) 1997-12-04 1998-12-04 Composes sulfonium, generateurs photoacides les renfermant, compositions photopolymerisables les renfermant, compositions de resines stereolithographiques, et procede de stereolithographie
EP98957164A EP1036789B1 (en) 1997-12-04 1998-12-04 Novel aromatic sulfonium compounds, photoacid generators comprising the same, photopolymerizable compositions containing the same, stereolithographic resin compositions, and stereolithographic process

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP9-334529 1997-12-04
JP33452997 1997-12-04
JP29189898A JP4204113B2 (ja) 1997-12-04 1998-10-14 新規な芳香族スルホニウム化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光造形用樹脂組成物ならびに光学的立体造形法

Publications (3)

Publication Number Publication Date
JP2000186071A JP2000186071A (ja) 2000-07-04
JP2000186071A5 true JP2000186071A5 (enExample) 2005-10-27
JP4204113B2 JP4204113B2 (ja) 2009-01-07

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Family Applications (1)

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JP29189898A Expired - Lifetime JP4204113B2 (ja) 1997-12-04 1998-10-14 新規な芳香族スルホニウム化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光造形用樹脂組成物ならびに光学的立体造形法

Country Status (5)

Country Link
US (1) US6368769B1 (enExample)
EP (1) EP1036789B1 (enExample)
JP (1) JP4204113B2 (enExample)
DE (1) DE69811942T2 (enExample)
WO (1) WO1999028295A1 (enExample)

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JP5313873B2 (ja) * 2006-04-13 2013-10-09 チバ ホールディング インコーポレーテッド スルホニウム塩開始剤
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KR101602756B1 (ko) 2007-11-01 2016-03-11 가부시키가이샤 아데카 염 화합물, 양이온 중합 개시제 및 양이온 중합성 조성물
JPWO2009113217A1 (ja) * 2008-03-11 2011-07-21 国立大学法人京都大学 新規な光カチオン重合開始剤
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KR101700980B1 (ko) 2009-02-20 2017-01-31 산아프로 가부시키가이샤 술포늄염, 광산 발생제 및 감광성 수지 조성물
KR101475573B1 (ko) * 2009-06-08 2014-12-22 산요가세이고교 가부시키가이샤 감광성 조성물
SG10201405425XA (en) 2009-10-01 2014-10-30 Hitachi Chemical Co Ltd Material for organic electronics, organic electronic element, organic electroluminescent element, display element using organic electroluminescent element, illuminating device, and display device
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JP5717959B2 (ja) * 2009-11-17 2015-05-13 株式会社Adeka 芳香族スルホニウム塩化合物
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JP6240409B2 (ja) * 2013-05-31 2017-11-29 サンアプロ株式会社 スルホニウム塩および光酸発生剤
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JP6169545B2 (ja) * 2014-09-09 2017-07-26 富士フイルム株式会社 重合性組成物、インクジェット記録用インク組成物、インクジェット記録方法、及び記録物
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US10604659B2 (en) 2015-06-08 2020-03-31 Dsm Ip Assets B.V. Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication
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JP6807530B2 (ja) * 2016-11-10 2021-01-06 岡本化学工業株式会社 光学的立体造形用組成物
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CN109456242B (zh) * 2017-09-06 2021-02-12 常州强力电子新材料股份有限公司 硫鎓盐光引发剂、其制备方法、包含其的光固化组合物及其应用
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CN111526977B (zh) 2017-12-29 2022-07-01 科思创(荷兰)有限公司 用于加成制造的组合物和制品及其使用方法
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