JP2000186071A5 - - Google Patents

Download PDF

Info

Publication number
JP2000186071A5
JP2000186071A5 JP1998291898A JP29189898A JP2000186071A5 JP 2000186071 A5 JP2000186071 A5 JP 2000186071A5 JP 1998291898 A JP1998291898 A JP 1998291898A JP 29189898 A JP29189898 A JP 29189898A JP 2000186071 A5 JP2000186071 A5 JP 2000186071A5
Authority
JP
Japan
Prior art keywords
group
resin composition
optical
dimensional modeling
halogen atom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1998291898A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000186071A (ja
JP4204113B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP29189898A external-priority patent/JP4204113B2/ja
Priority to JP29189898A priority Critical patent/JP4204113B2/ja
Priority to PCT/JP1998/005472 priority patent/WO1999028295A1/ja
Priority to DE69811942T priority patent/DE69811942T2/de
Priority to EP98957164A priority patent/EP1036789B1/en
Priority to US09/555,632 priority patent/US6368769B1/en
Publication of JP2000186071A publication Critical patent/JP2000186071A/ja
Publication of JP2000186071A5 publication Critical patent/JP2000186071A5/ja
Publication of JP4204113B2 publication Critical patent/JP4204113B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP29189898A 1997-12-04 1998-10-14 新規な芳香族スルホニウム化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光造形用樹脂組成物ならびに光学的立体造形法 Expired - Lifetime JP4204113B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP29189898A JP4204113B2 (ja) 1997-12-04 1998-10-14 新規な芳香族スルホニウム化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光造形用樹脂組成物ならびに光学的立体造形法
US09/555,632 US6368769B1 (en) 1997-12-04 1998-12-04 Aromatic sulfonium compounds, photoacid generators comprising the same, photopolymerizable compositions containing the same, stereolithographic resin compositions, and stereolithographic process
DE69811942T DE69811942T2 (de) 1997-12-04 1998-12-04 Aromatische sulfone, ihre verwendung in substanzen, welche lichtinduziert säure freisetzen, photopolymerisierbare gemische diese enthaltend, stereolithographische harze und stereolithographischer prozess
EP98957164A EP1036789B1 (en) 1997-12-04 1998-12-04 Novel aromatic sulfonium compounds, photoacid generators comprising the same, photopolymerizable compositions containing the same, stereolithographic resin compositions, and stereolithographic process
PCT/JP1998/005472 WO1999028295A1 (fr) 1997-12-04 1998-12-04 Composes sulfonium, generateurs photoacides les renfermant, compositions photopolymerisables les renfermant, compositions de resines stereolithographiques, et procede de stereolithographie

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP33452997 1997-12-04
JP9-334529 1997-12-04
JP29189898A JP4204113B2 (ja) 1997-12-04 1998-10-14 新規な芳香族スルホニウム化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光造形用樹脂組成物ならびに光学的立体造形法

Publications (3)

Publication Number Publication Date
JP2000186071A JP2000186071A (ja) 2000-07-04
JP2000186071A5 true JP2000186071A5 (enExample) 2005-10-27
JP4204113B2 JP4204113B2 (ja) 2009-01-07

Family

ID=26558750

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29189898A Expired - Lifetime JP4204113B2 (ja) 1997-12-04 1998-10-14 新規な芳香族スルホニウム化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光造形用樹脂組成物ならびに光学的立体造形法

Country Status (5)

Country Link
US (1) US6368769B1 (enExample)
EP (1) EP1036789B1 (enExample)
JP (1) JP4204113B2 (enExample)
DE (1) DE69811942T2 (enExample)
WO (1) WO1999028295A1 (enExample)

Families Citing this family (68)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6136497A (en) * 1998-03-30 2000-10-24 Vantico, Inc. Liquid, radiation-curable composition, especially for producing flexible cured articles by stereolithography
US6100007A (en) * 1998-04-06 2000-08-08 Ciba Specialty Chemicals Corp. Liquid radiation-curable composition especially for producing cured articles by stereolithography having high heat deflection temperatures
US6287748B1 (en) 1998-07-10 2001-09-11 Dsm N.V. Solid imaging compositions for preparing polyethylene-like articles
US6379866B2 (en) * 2000-03-31 2002-04-30 Dsm Desotech Inc Solid imaging compositions for preparing polypropylene-like articles
US6762002B2 (en) 1998-07-10 2004-07-13 Dsm Desotech, Inc. Solid imaging compositions for preparing polypropylene-like articles
US6660446B2 (en) * 2000-05-30 2003-12-09 Fuji Photo Film Co., Ltd. Heat-sensitive composition and planographic printing plate
WO2002079691A1 (en) * 2001-03-30 2002-10-10 The Arizona Board Of Regents On Behalf Of The University Of Arizona Materials, methods, and uses for photochemical generation of acids and/or radical species
TWI246525B (en) * 2001-11-06 2006-01-01 Wako Pure Chem Ind Ltd Hybrid onium salt
JP2004091698A (ja) * 2002-09-02 2004-03-25 Konica Minolta Holdings Inc 活性光線硬化型組成物、活性光線硬化型インクとそれを用いた画像形成方法及びインクジェット記録装置
EP1557413B1 (en) * 2002-09-25 2012-08-01 Adeka Corporation Novel aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape
US20040077745A1 (en) * 2002-10-18 2004-04-22 Jigeng Xu Curable compositions and rapid prototyping process using the same
US20040137368A1 (en) * 2003-01-13 2004-07-15 3D Systems, Inc. Stereolithographic resins containing selected oxetane compounds
JP2005060518A (ja) * 2003-08-12 2005-03-10 Konica Minolta Medical & Graphic Inc 光重合性組成物およびインクジェットインク
JP4595311B2 (ja) * 2003-11-06 2010-12-08 コニカミノルタエムジー株式会社 活性光線硬化型インクジェットインク組成物、それを用いた画像形成方法及びインクジェット記録装置
US7282324B2 (en) 2004-01-05 2007-10-16 Microchem Corp. Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them
US20050260522A1 (en) * 2004-02-13 2005-11-24 William Weber Permanent resist composition, cured product thereof, and use thereof
JP4716749B2 (ja) * 2004-02-20 2011-07-06 株式会社Adeka 新規な芳香族スルホニウム塩化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光学的立体造形用樹脂組成物ならびに光学的立体造形法
CN1849560B (zh) * 2004-03-26 2011-12-07 东京応化工业株式会社 感光性树脂组合物及使用该组合物的图案形成方法
JP4492209B2 (ja) * 2004-05-14 2010-06-30 東亞合成株式会社 光学物品の製造方法
US7449280B2 (en) * 2004-05-26 2008-11-11 Microchem Corp. Photoimageable coating composition and composite article thereof
KR100698917B1 (ko) 2004-06-22 2007-03-22 미쓰이 가가쿠 가부시키가이샤 이온성 화합물 및 그것을 함유하는 수지 조성물과 그 용도
US20060172230A1 (en) 2005-02-02 2006-08-03 Dsm Ip Assets B.V. Method and composition for reducing waste in photo-imaging applications
US7799885B2 (en) * 2005-11-30 2010-09-21 Corning Incorporated Photo or electron beam curable compositions
JP4695996B2 (ja) * 2006-02-27 2011-06-08 富士フイルム株式会社 感光性組成物及び該感光性組成物を用いたパターン形成方法
KR101389057B1 (ko) * 2006-04-13 2014-05-13 시바 홀딩 인크 설포늄 염 개시제
JP5168860B2 (ja) * 2006-09-14 2013-03-27 株式会社スリーボンド 光重合性組成物
US20080103226A1 (en) * 2006-10-31 2008-05-01 Dsm Ip Assets B.V. Photo-curable resin composition
CN101952248B (zh) * 2007-10-10 2014-04-16 巴斯夫欧洲公司 锍盐引发剂
US20100297541A1 (en) * 2007-10-10 2010-11-25 Basf Se Sulphonium salt initiators
WO2009057600A1 (ja) 2007-11-01 2009-05-07 Adeka Corporation 塩化合物、カチオン重合開始剤およびカチオン重合性組成物
WO2009113217A1 (ja) * 2008-03-11 2009-09-17 国立大学法人京都大学 新規な光カチオン重合開始剤
JP5721630B2 (ja) 2008-10-20 2015-05-20 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ スルホニウム誘導体および潜在酸としてのその使用
US8617787B2 (en) 2009-02-20 2013-12-31 San-Apro, Ltd. Sulfonium salt, photo-acid generator, and photosensitive resin composition
WO2010143560A1 (ja) * 2009-06-08 2010-12-16 三洋化成工業株式会社 感光性組成物
IN2012DN03022A (enExample) 2009-10-01 2015-07-31 Hitachi Chemical Co Ltd
KR20130028891A (ko) * 2009-10-26 2013-03-20 가부시키가이샤 아데카 방향족 술포늄염 화합물
JP5717959B2 (ja) 2009-11-17 2015-05-13 株式会社Adeka 芳香族スルホニウム塩化合物
KR101833078B1 (ko) 2009-12-17 2018-02-27 디에스엠 아이피 어셋츠 비.브이. 적층식 제작을 위한 발광 다이오드 경화성 액체 수지 조성물
EP2526463B1 (en) 2010-01-22 2016-07-13 DSM IP Assets B.V. Method of forming a three-dimensional article having selective visual effects
WO2011104127A1 (en) 2010-02-24 2011-09-01 Basf Se Latent acids and their use
EP2562839A4 (en) 2010-04-22 2015-07-22 Hitachi Chemical Co Ltd ORGANIC ELECTRONIC MATERIAL, POLYMERIZATION INITIATOR AND THERMAL POLYMERIZATION INITIATOR, INK COMPOSITION, ORGANIC THIN FILM AND METHOD FOR PRODUCING THE SAME, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTROLUMINESCENT ELEMENT, ILLUMINATION DEVICE, DISPLAY ELEMENT, AND DISPLAY DEVICE
EP2502728B1 (en) 2011-03-23 2017-01-04 DSM IP Assets B.V. Lightweight and high strength three-dimensional articles producible by additive fabrication processes
KR101263673B1 (ko) * 2011-08-03 2013-05-22 금호석유화학 주식회사 술포늄 화합물, 광산발생제 및 레지스트 조성물
JP5828715B2 (ja) * 2011-08-25 2015-12-09 サンアプロ株式会社 スルホニウム塩、光酸発生剤、硬化性組成物およびレジスト組成物
WO2013172407A1 (ja) * 2012-05-18 2013-11-21 シーメット株式会社 光学的立体造形用樹脂組成物
CN103012227A (zh) * 2013-01-04 2013-04-03 同济大学 一种高光生酸量子产率硫鎓盐类光生酸剂、制备方法及其应用
KR20150127077A (ko) 2013-03-08 2015-11-16 히타치가세이가부시끼가이샤 이온성 화합물을 함유하는 처리액, 유기 일렉트로닉스 소자, 및 유기 일렉트로닉스 소자의 제조 방법
KR20140131609A (ko) * 2013-05-02 2014-11-14 삼성디스플레이 주식회사 감광성 수지 조성물, 패턴 형성 방법 및 이를 이용한 액정 표시 장치
JP6240409B2 (ja) * 2013-05-31 2017-11-29 サンアプロ株式会社 スルホニウム塩および光酸発生剤
JP6414411B2 (ja) 2013-08-09 2018-10-31 ディーエスエム アイピー アセッツ ビー．ブイ．Ｄｓｍ Ｉｐ Ａｓｓｅｔｓ Ｂ．Ｖ． 積層造形用の低粘度液状放射線硬化型歯科アライナー成形型用樹脂組成物
EP3971235B1 (en) 2013-11-05 2025-01-01 Stratasys, Inc. Stabilized matrix-filled liquid radiation curable resin compositions for additive fabrication
JP6169545B2 (ja) * 2014-09-09 2017-07-26 富士フイルム株式会社 重合性組成物、インクジェット記録用インク組成物、インクジェット記録方法、及び記録物
WO2016153711A1 (en) * 2015-03-23 2016-09-29 Dow Global Technologies Llc Photocurable compositions for three-dimensional printing
US10604659B2 (en) 2015-06-08 2020-03-31 Dsm Ip Assets B.V. Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication
KR102698770B1 (ko) * 2015-06-08 2024-08-23 스트래터시스,인코포레이티드 부가적 제조용 액체 하이브리드 자외선/가시광선 복사선-경화성 수지 조성물
WO2017059222A1 (en) 2015-10-01 2017-04-06 Dsm Ip Assets B.V. Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication
WO2017087614A1 (en) 2015-11-17 2017-05-26 Dsm Ip Assets, B.V. Improved antimony-free radiation curable compositions for additive fabrication, and applications thereof in investment casting processes
JP2017115072A (ja) * 2015-12-25 2017-06-29 株式会社ダイセル 立体造形用硬化性組成物
JP6798071B2 (ja) 2016-03-14 2020-12-09 ディーエスエム アイピー アセッツ ビー．ブイ．Ｄｓｍ Ｉｐ Ａｓｓｅｔｓ Ｂ．Ｖ． 改善された靭性および耐高温性を有する付加造形用放射線硬化性組成物
JP6807530B2 (ja) * 2016-11-10 2021-01-06 岡本化学工業株式会社 光学的立体造形用組成物
EP3559744A1 (en) 2016-12-23 2019-10-30 3M Innovative Properties Company Printable compositions including polymeric and polymerizable components, articles, and methods of making articles therefrom
CN109456242B (zh) * 2017-09-06 2021-02-12 常州强力电子新材料股份有限公司 硫鎓盐光引发剂、其制备方法、包含其的光固化组合物及其应用
CN111788269B (zh) 2017-12-15 2023-10-20 科思创(荷兰)有限公司 用于高温喷射粘性热固性材料以经由增材制造创建固体制品的组合物和方法
JP7251715B2 (ja) 2017-12-29 2023-04-04 コベストロ （ネザーランズ） ビー．ブイ． 付加造形用組成物及び物品並びにそれらの使用方法
JP7763576B2 (ja) * 2018-07-11 2025-11-04 住友化学株式会社 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
KR20220056207A (ko) 2019-08-30 2022-05-04 코베스트로 (네덜란드) 비.브이. 적층식 제조용 하이브리드 UV/vis 방사선 경화성 액체 수지 조성물
JP7715713B2 (ja) * 2020-07-23 2025-07-30 サンアプロ株式会社 光酸発生剤
WO2022130796A1 (ja) 2020-12-14 2022-06-23 サンアプロ株式会社 光酸発生剤及びこれを用いた感光性組成物

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3625219B2 (ja) * 1993-06-18 2005-03-02 日本化薬株式会社 新規オニウム塩、光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物
CA2187046A1 (fr) 1996-10-03 1998-04-03 Alain Vallee Sulfonylimidures et sulfonylmethylures, leur utilisation comme photoinitiateur
JP3844824B2 (ja) * 1996-11-26 2006-11-15 株式会社Ａｄｅｋａ エネルギー線硬化性エポキシ樹脂組成物、光学的立体造形用樹脂組成物及び光学的立体造形方法

Similar Documents

Publication Publication Date Title
US5639413A (en) Methods and compositions related to stereolithography
US12269933B2 (en) Stabilized matrix-filled liquid radiation curable resin compositions for additive fabrication
JP6414411B2 (ja) 積層造形用の低粘度液状放射線硬化型歯科アライナー成形型用樹脂組成物
US9708442B1 (en) Liquid, hybrid UV/vis radiation curable resin compositions for additive fabrication
CN102858738B (zh) 用于加成法制造的包含三芳基锍硼酸盐阳离子光引发剂的液体可辐射固化树脂
JP2022070865A (ja) 付加造形用液状ハイブリッドＵＶ／ｖｉｓ線硬化性樹脂組成物
ES2405107T3 (es) Composición de resina curable por radiación y procedimiento para la formación rápida de prototipos utilizando la misma
US7354643B2 (en) Three-dimensional object and method of producing the same
JPH06228413A (ja) 感光性組成物
US12252561B2 (en) Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication
JPH11310626A (ja) 光硬化性液状樹脂組成物
JP5393239B2 (ja) 光学的立体造形物の処理方法
EP1939234B1 (en) Resin composition for optical three-dimensional molded object
JPH10158385A (ja) 光学的立体造形用樹脂組成物および光学的立体造形方法
JP3974336B2 (ja) 光学的立体造形用の活性エネルギー線硬化性樹脂組成物
KR20060026886A (ko) 광경화성 수지 조성물
EP1309645A2 (en) Use of cross-linker and compositions made therefrom
JP2025130455A (ja) カチオン重合開始剤およびそれを用いた光学的立体造形用組成物
TW202334370A (zh) 密封用樹脂組成物