JP2021167905A - 感光性組成物、パターン化された硬化膜の製造方法、及びパターン化された硬化膜 - Google Patents

感光性組成物、パターン化された硬化膜の製造方法、及びパターン化された硬化膜 Download PDF

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Publication number
JP2021167905A
JP2021167905A JP2020071281A JP2020071281A JP2021167905A JP 2021167905 A JP2021167905 A JP 2021167905A JP 2020071281 A JP2020071281 A JP 2020071281A JP 2020071281 A JP2020071281 A JP 2020071281A JP 2021167905 A JP2021167905 A JP 2021167905A
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Japan
Prior art keywords
group
photosensitive composition
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meth
substituent
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JP2020071281A
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English (en)
Japanese (ja)
Inventor
広樹 加藤
Hiroki Kato
和也 染谷
Kazuya Someya
二郎 引田
Jiro Hikita
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Tokyo Ohka Kogyo Co Ltd
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Tokyo Ohka Kogyo Co Ltd
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Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP2020071281A priority Critical patent/JP2021167905A/ja
Priority to TW110105657A priority patent/TW202138396A/zh
Priority to KR1020210045346A priority patent/KR20210126512A/ko
Priority to CN202110389444.9A priority patent/CN113515010A/zh
Publication of JP2021167905A publication Critical patent/JP2021167905A/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • C08F220/325—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • C08F265/06—Polymerisation of acrylate or methacrylate esters on to polymers thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2020071281A 2020-04-10 2020-04-10 感光性組成物、パターン化された硬化膜の製造方法、及びパターン化された硬化膜 Pending JP2021167905A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2020071281A JP2021167905A (ja) 2020-04-10 2020-04-10 感光性組成物、パターン化された硬化膜の製造方法、及びパターン化された硬化膜
TW110105657A TW202138396A (zh) 2020-04-10 2021-02-19 感光性組合物、經圖案化的固化膜的製造方法及經圖案化的固化膜
KR1020210045346A KR20210126512A (ko) 2020-04-10 2021-04-07 감광성 조성물, 패턴화된 경화막의 제조 방법, 및 패턴화된 경화막
CN202110389444.9A CN113515010A (zh) 2020-04-10 2021-04-12 感光性组合物、经图案化的固化膜的制造方法及经图案化的固化膜

Applications Claiming Priority (1)

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JP2020071281A JP2021167905A (ja) 2020-04-10 2020-04-10 感光性組成物、パターン化された硬化膜の製造方法、及びパターン化された硬化膜

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JP2021167905A true JP2021167905A (ja) 2021-10-21

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JP (1) JP2021167905A (zh)
KR (1) KR20210126512A (zh)
CN (1) CN113515010A (zh)
TW (1) TW202138396A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023176335A1 (ja) * 2022-03-17 2023-09-21 富士フイルム株式会社 着色組成物、膜、光学フィルタ、固体撮像素子および画像表示装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140255845A1 (en) * 2013-03-06 2014-09-11 Chi Mei Corporation Photosensitive resin composition and uses thereof
JP2016519675A (ja) * 2014-01-17 2016-07-07 サムヤン コーポレーション 新規なβ‐オキシムエステルフルオレン化合物、それを含む光重合開始剤及びフォトレジスト組成物
JP2018506532A (ja) * 2015-02-06 2018-03-08 コリア リサーチ インスティテュート オブ ケミカル テクノロジー 新規のオキシムエステル誘導体化合物およびこれを含む光重合開始剤、ならびにフォトレジスト組成物
JP2018151489A (ja) * 2017-03-10 2018-09-27 東京応化工業株式会社 感光性組成物、ドライフィルム、及びパターン化された硬化膜を形成する方法
JP2018151490A (ja) * 2017-03-10 2018-09-27 東京応化工業株式会社 硬化膜を形成する方法及びめっき造形物の製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6009774B2 (ja) 2011-02-22 2016-10-19 東京応化工業株式会社 感光性樹脂組成物、並びにそれを用いたカラーフィルタ及び表示装置
JP5981159B2 (ja) 2011-02-22 2016-08-31 東京応化工業株式会社 感光性樹脂組成物、並びにそれを用いたカラーフィルタ及び表示装置
JP2012173678A (ja) 2011-02-24 2012-09-10 Kyocera Chemical Corp ネガ型感光性樹脂組成物、透明絶縁膜及び半導体基板の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140255845A1 (en) * 2013-03-06 2014-09-11 Chi Mei Corporation Photosensitive resin composition and uses thereof
JP2016519675A (ja) * 2014-01-17 2016-07-07 サムヤン コーポレーション 新規なβ‐オキシムエステルフルオレン化合物、それを含む光重合開始剤及びフォトレジスト組成物
JP2018506532A (ja) * 2015-02-06 2018-03-08 コリア リサーチ インスティテュート オブ ケミカル テクノロジー 新規のオキシムエステル誘導体化合物およびこれを含む光重合開始剤、ならびにフォトレジスト組成物
JP2018151489A (ja) * 2017-03-10 2018-09-27 東京応化工業株式会社 感光性組成物、ドライフィルム、及びパターン化された硬化膜を形成する方法
JP2018151490A (ja) * 2017-03-10 2018-09-27 東京応化工業株式会社 硬化膜を形成する方法及びめっき造形物の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023176335A1 (ja) * 2022-03-17 2023-09-21 富士フイルム株式会社 着色組成物、膜、光学フィルタ、固体撮像素子および画像表示装置

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Publication number Publication date
TW202138396A (zh) 2021-10-16
KR20210126512A (ko) 2021-10-20
CN113515010A (zh) 2021-10-19

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