JP2021110646A - 載置台における異物の検出方法、及び、検出装置 - Google Patents
載置台における異物の検出方法、及び、検出装置 Download PDFInfo
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- H01L21/67005—Apparatus not specifically provided for elsewhere
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- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
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- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
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- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/282—Testing of electronic circuits specially adapted for particular applications not provided for elsewhere
- G01R31/2831—Testing of materials or semi-finished products, e.g. semiconductor wafers or substrates
Abstract
Description
図1は、実施形態の検査装置10の一例を示す斜視図である。図1では、説明の便宜上、検査装置10の一部が切り欠かれて示されている。図1に示すように、検査装置10は、ローダ室11と、プローバ室12と、制御装置13と、表示装置14とを有する。
15 搬送アーム
18 載置台
W ウェハ
Claims (13)
- 被検査体を吸着可能な載置台の表面の基準状態における第1画像に含まれる第1パターンの第1位置情報を取得するステップと、
前記第1画像の撮像後における前記表面の第2画像に含まれる第2パターンの第2位置情報を取得するステップと、
前記第1位置情報及び前記第2位置情報を比較し、前記表面における異物を検出するステップと、
を含む、載置台における異物の検出方法。 - 前記異物を検出するステップは、
前記第1位置情報及び前記第2位置情報を比較して前記表面におけるパーティクルを検出するステップと、
前記検出されたパーティクルのうち、面積又はサイズが閾値以上のものを前記異物として検出するステップと、
を有する、請求項1に記載の載置台における異物の検出方法。 - 前記パーティクルを検出するステップは、前記第1画像と前記第2画像とが撮像された際の前記載置台の温度差に基づいて前記第1位置情報又は前記第2位置情報を補正し、前記第1位置情報及び前記第2位置情報のうち補正された位置情報と、前記第1位置情報及び前記第2位置情報のうち補正されていない位置情報とを比較し、前記表面におけるパーティクルを検出するステップである、請求項2に記載の載置台における異物の検出方法。
- 前記異物を検出するステップは、前記第1画像と前記第2画像とが撮像された際の前記載置台の温度差に基づいて前記第1位置情報又は前記第2位置情報を補正し、前記第1位置情報及び前記第2位置情報のうち補正された位置情報と、前記第1位置情報及び前記第2位置情報のうち補正されていない位置情報とを比較し、前記表面における異物を検出するステップである、請求項1に記載の載置台における異物の検出方法。
- 前記異物が検出されると、前記異物がある前記表面の異常に対応する異常処理モードを実行するステップをさらに含む、請求項1乃至4のいずれか一項に記載の載置台における異物の検出方法。
- 前記異常処理モードを実行するステップは、前記表面の異常をリカバリさせるステップ、又は、オペレータに前記表面の異常に対応する方法の判断を求める通知を行うステップを含む、請求項5に記載の載置台における異物の検出方法。
- 前記表面の異常をリカバリさせるステップは、前記表面をクリーニングするステップを有する、請求項6に記載の載置台における異物の検出方法。
- 前記表面の異常をリカバリさせるステップは、
前記クリーニングされた表面の第3画像に含まれる第3パターンの第3位置情報を取得するステップと、
前記第1位置情報及び前記第3位置情報を比較し、前記クリーニングされた表面における異物を検出するステップと、
をさらに有する、請求項7に記載の載置台における異物の検出方法。 - 前記クリーニングされた表面における異物を検出するステップは、前記第1画像と前記第3画像とが撮像された際の前記載置台の温度差に基づいて前記第1位置情報又は前記第3位置情報を補正し、前記第1位置情報及び前記第3位置情報のうち補正された位置情報と、前記第1位置情報及び前記第3位置情報のうち補正されていない位置情報とを比較し、前記クリーニングされた表面における異物を検出するステップである、請求項8に記載の載置台における異物の検出方法。
- 前記オペレータに前記表面の異常に対応する方法の判断を求める通知を行うステップは、表示装置に前記判断を求めるメッセージを表示するステップを有する、請求項6に記載の載置台における異物の検出方法。
- 前記オペレータに前記表面の異常に対応する方法の判断を求める通知を行うステップは、前記表面の異常を報知するステップをさらに有する、請求項10に記載の載置台における異物の検出方法。
- 前記表面の異常をリカバリさせるステップ、又は、オペレータに前記表面の異常に対応する方法の判断を求める通知を行うステップの後に、オペレータの操作に応じて前記載置台の表面の画像を表示装置に表示させるステップをさらに含む、請求項6乃至11のいずれか一項に記載の載置台における異物の検出方法。
- 被検査体を吸着可能な載置台の表面における異物を検出する、載置台における異物の検出装置であって、
前記表面の基準状態における第1画像に含まれる第1パターンの第1位置情報を取得するステップと、
前記第1画像の撮像後における前記表面の第2画像に含まれる第2パターンの第2位置情報を取得するステップと、
前記第1位置情報及び前記第2位置情報を比較し、前記表面における異物を検出するステップと、
を含む処理を実行する、載置台における異物の検出装置。
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JP2020002964A JP7353190B2 (ja) | 2020-01-10 | 2020-01-10 | 載置台における異物の検出方法、及び、検出装置 |
US17/116,201 US11639947B2 (en) | 2020-01-10 | 2020-12-09 | Method of detecting foreign object on stage and detection apparatus |
CN202011478601.5A CN113109258A (zh) | 2020-01-10 | 2020-12-15 | 载置台的异物的检测方法以及检测装置 |
KR1020200175589A KR102584069B1 (ko) | 2020-01-10 | 2020-12-15 | 거치대에서의 이물질 검출 방법 및 검출 장치 |
TW109146758A TW202132768A (zh) | 2020-01-10 | 2020-12-30 | 載置台的異物之檢測方法及檢測裝置 |
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JP7357549B2 (ja) * | 2020-01-07 | 2023-10-06 | 東京エレクトロン株式会社 | 基板の位置ずれ検出方法、基板位置の異常判定方法、基板搬送制御方法、及び基板の位置ずれ検出装置 |
CN113866180A (zh) * | 2021-12-06 | 2021-12-31 | 晶芯成(北京)科技有限公司 | 一种异物检测方法、半导体晶圆检测方法及系统 |
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BR9406727A (pt) * | 1993-05-28 | 1996-01-30 | Axiom Bildverarbeit Syst | Aparelho de inspeção automática para classificar artigo de acordo com caracteristica superficial de artigo aparelho de seleção automática aparelho de inspeção automática para categorizar peça de trabalho com base em seu padrão superficial e/ou de core/ou de textura processo para inspecionar artigo automaticamente para classificar o artigo de acordo com uma caracteristica superficical do mesmo |
JP2000124122A (ja) | 1998-10-19 | 2000-04-28 | Canon Inc | 半導体露光装置および同装置を用いるデバイス製造方法 |
JP2003234265A (ja) | 2002-02-06 | 2003-08-22 | Canon Inc | 露光装置 |
JP4615225B2 (ja) * | 2004-01-09 | 2011-01-19 | 株式会社ディスコ | 板状物に形成された電極の加工装置,板状物に形成された電極の加工方法,及び板状物に形成された電極の加工装置のチャックテーブルの平面度測定方法 |
US8573077B2 (en) * | 2005-08-26 | 2013-11-05 | Camtek Ltd. | Wafer inspection system and a method for translating wafers |
KR100863140B1 (ko) * | 2007-04-25 | 2008-10-14 | 에스엔유 프리시젼 주식회사 | 반도체 웨이퍼의 이물 검사 및 리페어 시스템과 그 방법 |
JP5152567B2 (ja) | 2008-01-10 | 2013-02-27 | 株式会社島津製作所 | Tftアレイ検査装置 |
JP2010283174A (ja) * | 2009-06-05 | 2010-12-16 | Panasonic Corp | 半導体製造装置 |
JP5716278B2 (ja) | 2010-02-05 | 2015-05-13 | セイコーエプソン株式会社 | 異物検出装置および異物検出方法 |
JP5484981B2 (ja) * | 2010-03-25 | 2014-05-07 | 東京エレクトロン株式会社 | 基板載置台及び基板処理装置 |
JP2012118159A (ja) * | 2010-11-30 | 2012-06-21 | Nsk Technology Co Ltd | 近接露光装置及び異物検出方法並びに基板の製造方法 |
JP2018013342A (ja) * | 2016-07-19 | 2018-01-25 | 株式会社ディスコ | 検査方法 |
WO2019167151A1 (ja) * | 2018-02-28 | 2019-09-06 | 株式会社日立ハイテクノロジーズ | 検査装置、およびその検査方法 |
US11499992B2 (en) * | 2018-11-27 | 2022-11-15 | Tokyo Electron Limited | Inspection system |
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US11639947B2 (en) | 2023-05-02 |
TW202132768A (zh) | 2021-09-01 |
JP7353190B2 (ja) | 2023-09-29 |
CN113109258A (zh) | 2021-07-13 |
KR20210090544A (ko) | 2021-07-20 |
US20210215742A1 (en) | 2021-07-15 |
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