JP2020532087A5 - - Google Patents

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JP2020532087A5
JP2020532087A5 JP2020531430A JP2020531430A JP2020532087A5 JP 2020532087 A5 JP2020532087 A5 JP 2020532087A5 JP 2020531430 A JP2020531430 A JP 2020531430A JP 2020531430 A JP2020531430 A JP 2020531430A JP 2020532087 A5 JP2020532087 A5 JP 2020532087A5
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JP
Japan
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segment configured
coil
arrangement
inner coil
shield member
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JP2020531430A
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Japanese (ja)
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JP7148610B2 (ja
JP2020532087A (ja
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Priority claimed from US15/727,998 external-priority patent/US11521828B2/en
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Priority to JP2022150932A priority Critical patent/JP7431296B2/ja
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JP2020531430A 2017-10-09 2018-07-10 基板処理装置 Active JP7148610B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2022150932A JP7431296B2 (ja) 2017-10-09 2022-09-22 誘導結合プラズマソースの改善

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/727,998 US11521828B2 (en) 2017-10-09 2017-10-09 Inductively coupled plasma source
US15/727,998 2017-10-09
PCT/US2018/041499 WO2019074563A1 (en) 2017-10-09 2018-07-10 IMPROVEMENTS IN INDUCTIVE COUPLING PLASMA SOURCE

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JP2022150932A Division JP7431296B2 (ja) 2017-10-09 2022-09-22 誘導結合プラズマソースの改善

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JP2020532087A JP2020532087A (ja) 2020-11-05
JP2020532087A5 true JP2020532087A5 (enExample) 2020-12-17
JP7148610B2 JP7148610B2 (ja) 2022-10-05

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JP2020531430A Active JP7148610B2 (ja) 2017-10-09 2018-07-10 基板処理装置
JP2022150932A Active JP7431296B2 (ja) 2017-10-09 2022-09-22 誘導結合プラズマソースの改善

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US (2) US11521828B2 (enExample)
JP (2) JP7148610B2 (enExample)
KR (2) KR102371471B1 (enExample)
CN (2) CN111095475B (enExample)
TW (2) TWI805611B (enExample)
WO (1) WO2019074563A1 (enExample)

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