JP2020512691A5 - - Google Patents
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- Publication number
- JP2020512691A5 JP2020512691A5 JP2019552095A JP2019552095A JP2020512691A5 JP 2020512691 A5 JP2020512691 A5 JP 2020512691A5 JP 2019552095 A JP2019552095 A JP 2019552095A JP 2019552095 A JP2019552095 A JP 2019552095A JP 2020512691 A5 JP2020512691 A5 JP 2020512691A5
- Authority
- JP
- Japan
- Prior art keywords
- processing chamber
- semiconductor processing
- chamber component
- component according
- support body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201762474597P | 2017-03-21 | 2017-03-21 | |
| US62/474,597 | 2017-03-21 | ||
| PCT/US2018/023644 WO2018175647A1 (en) | 2017-03-21 | 2018-03-21 | Ceramic material assembly for use in highly corrosive or erosive semiconductor processing applications |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2020512691A JP2020512691A (ja) | 2020-04-23 |
| JP2020512691A5 true JP2020512691A5 (https=) | 2021-08-05 |
Family
ID=63584678
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019552095A Pending JP2020512691A (ja) | 2017-03-21 | 2018-03-21 | 高い腐食性又は浸食性の半導体処理用途に使用するためのセラミック材料アセンブリ |
| JP2019552021A Pending JP2020514237A (ja) | 2017-03-21 | 2018-03-21 | 高い腐食性又は浸食性産業用途に使用するためのセラミック材料アセンブリ |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019552021A Pending JP2020514237A (ja) | 2017-03-21 | 2018-03-21 | 高い腐食性又は浸食性産業用途に使用するためのセラミック材料アセンブリ |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US20180354861A1 (https=) |
| EP (2) | EP3601803A4 (https=) |
| JP (2) | JP2020512691A (https=) |
| KR (2) | KR20190132425A (https=) |
| CN (2) | CN110520628A (https=) |
| TW (1) | TW201841869A (https=) |
| WO (2) | WO2018175647A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10933375B1 (en) | 2019-08-30 | 2021-03-02 | Fluid Equipment Development Company, Llc | Fluid to fluid pressurizer and method of operating the same |
| KR102261947B1 (ko) * | 2020-02-12 | 2021-06-08 | 에스케이씨솔믹스 주식회사 | 반도체 소자를 제조하는 장비에 사용되는 세라믹 부품의 제조방법 및 세라믹 부품 |
| CN116084876B (zh) * | 2023-03-28 | 2024-06-25 | 西南石油大学 | 一种高耐磨且可溶的回接外筒喇叭口及密封面保护套 |
Family Cites Families (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1235375A (en) * | 1984-10-18 | 1988-04-19 | Nobuo Tsuno | Turbine rotor units and method of producing the same |
| US4602731A (en) * | 1984-12-24 | 1986-07-29 | Borg-Warner Corporation | Direct liquid phase bonding of ceramics to metals |
| JPS6278172A (ja) * | 1985-09-30 | 1987-04-10 | 日本特殊陶業株式会社 | セラミツクと金属との接合構造 |
| JPS6379777A (ja) * | 1986-09-24 | 1988-04-09 | 科学技術庁金属材料技術研究所長 | セラミツクス基板上への被覆体の製造法 |
| US5108025A (en) * | 1991-05-20 | 1992-04-28 | Gte Laboratories Incorporated | Ceramic-metal composite article and joining method |
| JP3447305B2 (ja) * | 1991-07-30 | 2003-09-16 | 京セラ株式会社 | 静電チャック |
| JPH06291175A (ja) * | 1993-04-01 | 1994-10-18 | Kyocera Corp | 静電チャック |
| US5685914A (en) * | 1994-04-05 | 1997-11-11 | Applied Materials, Inc. | Focus ring for semiconductor wafer processing in a plasma reactor |
| JP3687161B2 (ja) * | 1995-11-21 | 2005-08-24 | 同和鉱業株式会社 | セラミックス構造体の接合方法 |
| JPH09199578A (ja) * | 1996-01-19 | 1997-07-31 | Hitachi Ltd | 静電吸着電極およびそれを用いたプラズマ処理装置 |
| JP2754194B2 (ja) * | 1996-03-19 | 1998-05-20 | 工業技術院長 | 水圧破砕用パッカー |
| JPH09260472A (ja) * | 1996-03-19 | 1997-10-03 | Sony Corp | 静電チャック |
| JP3455026B2 (ja) * | 1996-09-30 | 2003-10-06 | 京セラ株式会社 | 静電チャック |
| FI101565B (fi) * | 1997-01-17 | 1998-07-15 | Flaekt Woods Ab | Haihdutinpuhallin ja sen siipipyörä |
| US6129808A (en) * | 1998-03-31 | 2000-10-10 | Lam Research Corporation | Low contamination high density plasma etch chambers and methods for making the same |
| JP4651166B2 (ja) * | 2000-06-30 | 2011-03-16 | 京セラ株式会社 | 耐食性部材 |
| JP3920551B2 (ja) * | 2000-09-29 | 2007-05-30 | 株式会社山武 | 接合方法 |
| US6620520B2 (en) * | 2000-12-29 | 2003-09-16 | Lam Research Corporation | Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof |
| US7001543B2 (en) * | 2001-10-23 | 2006-02-21 | Kyocera Corporation | Apparatus and method for manufacturing semiconductor grains |
| FR2842903B1 (fr) * | 2002-07-23 | 2004-11-19 | Schlumberger Services Petrol | Dispositif a helice pour acquisition de donnees dans un ecoulement |
| JP4057443B2 (ja) * | 2003-02-10 | 2008-03-05 | 日本碍子株式会社 | 半導体製造装置用部材とその製造方法 |
| US7001482B2 (en) * | 2003-11-12 | 2006-02-21 | Tokyo Electron Limited | Method and apparatus for improved focus ring |
| US7220497B2 (en) * | 2003-12-18 | 2007-05-22 | Lam Research Corporation | Yttria-coated ceramic components of semiconductor material processing apparatuses and methods of manufacturing the components |
| US7942969B2 (en) * | 2007-05-30 | 2011-05-17 | Applied Materials, Inc. | Substrate cleaning chamber and components |
| US8932690B2 (en) * | 2011-11-30 | 2015-01-13 | Component Re-Engineering Company, Inc. | Plate and shaft device |
| US8684256B2 (en) * | 2011-11-30 | 2014-04-01 | Component Re-Engineering Company, Inc. | Method for hermetically joining plate and shaft devices including ceramic materials used in semiconductor processing |
| US9624137B2 (en) * | 2011-11-30 | 2017-04-18 | Component Re-Engineering Company, Inc. | Low temperature method for hermetically joining non-diffusing ceramic materials |
| US9850568B2 (en) * | 2013-06-20 | 2017-12-26 | Applied Materials, Inc. | Plasma erosion resistant rare-earth oxide based thin film coatings |
| RU2642191C2 (ru) * | 2013-10-03 | 2018-01-24 | Энерджи Рикавери Инк. | Система гидравлического разрыва пласта с системой передачи гидравлической энергии |
| CN204344509U (zh) * | 2014-12-12 | 2015-05-20 | 上海德耐泵业有限公司 | 泵轴 |
| US9999947B2 (en) * | 2015-05-01 | 2018-06-19 | Component Re-Engineering Company, Inc. | Method for repairing heaters and chucks used in semiconductor processing |
| KR20180075667A (ko) * | 2015-11-02 | 2018-07-04 | 컴포넌트 알이-엔지니어링 컴퍼니, 인코포레이티드 | 고온 반도체 프로세싱에서의 클램핑을 위한 정전 척 및 그 제조 방법 |
| CN105479030A (zh) * | 2016-01-07 | 2016-04-13 | 哈尔滨工业大学 | 活性耐腐蚀SnZn基钎料及其制备方法与低温超声钎焊陶瓷和/或复合材料及铝、镁合金方法 |
-
2018
- 2018-03-21 WO PCT/US2018/023644 patent/WO2018175647A1/en not_active Ceased
- 2018-03-21 KR KR1020197030563A patent/KR20190132425A/ko not_active Ceased
- 2018-03-21 US US15/927,788 patent/US20180354861A1/en not_active Abandoned
- 2018-03-21 WO PCT/US2018/023666 patent/WO2018175665A1/en not_active Ceased
- 2018-03-21 KR KR1020197030565A patent/KR20190127863A/ko not_active Ceased
- 2018-03-21 US US15/927,940 patent/US20190066980A1/en not_active Abandoned
- 2018-03-21 EP EP18770360.8A patent/EP3601803A4/en not_active Withdrawn
- 2018-03-21 JP JP2019552095A patent/JP2020512691A/ja active Pending
- 2018-03-21 CN CN201880024954.2A patent/CN110520628A/zh active Pending
- 2018-03-21 JP JP2019552021A patent/JP2020514237A/ja active Pending
- 2018-03-21 TW TW107109650A patent/TW201841869A/zh unknown
- 2018-03-21 EP EP18770520.7A patent/EP3602603A4/en not_active Withdrawn
- 2018-03-21 CN CN201880029761.6A patent/CN110582834A/zh active Pending
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