JP2020502333A - オレフィンのカチオン重合用の開始剤システム - Google Patents
オレフィンのカチオン重合用の開始剤システム Download PDFInfo
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- JP2020502333A JP2020502333A JP2019532115A JP2019532115A JP2020502333A JP 2020502333 A JP2020502333 A JP 2020502333A JP 2019532115 A JP2019532115 A JP 2019532115A JP 2019532115 A JP2019532115 A JP 2019532115A JP 2020502333 A JP2020502333 A JP 2020502333A
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- Prior art keywords
- polymerization
- initiator system
- initiator
- alkyl
- bronsted
- Prior art date
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- 239000003999 initiator Substances 0.000 title claims abstract description 118
- 238000010538 cationic polymerization reaction Methods 0.000 title claims abstract description 11
- 150000001336 alkenes Chemical class 0.000 title description 2
- 238000006116 polymerization reaction Methods 0.000 claims abstract description 69
- 239000000178 monomer Substances 0.000 claims abstract description 39
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 22
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 21
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 19
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 18
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 16
- 229910052794 bromium Inorganic materials 0.000 claims abstract description 13
- 239000010955 niobium Substances 0.000 claims abstract description 12
- 125000003118 aryl group Chemical group 0.000 claims abstract description 11
- 229910052740 iodine Inorganic materials 0.000 claims abstract description 9
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 8
- 239000002253 acid Substances 0.000 claims abstract description 6
- 125000002619 bicyclic group Chemical group 0.000 claims abstract description 5
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 5
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims abstract description 5
- 125000006169 tetracyclic group Chemical group 0.000 claims abstract description 5
- 125000006168 tricyclic group Chemical group 0.000 claims abstract description 5
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims abstract description 5
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical group [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims abstract 3
- 150000001875 compounds Chemical class 0.000 claims description 39
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 23
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 21
- 229920000642 polymer Polymers 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 18
- -1 cycloalkyl ether Chemical compound 0.000 claims description 17
- 150000007516 brønsted-lowry acids Chemical class 0.000 claims description 15
- 230000000087 stabilizing effect Effects 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 15
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 claims description 12
- 229940050176 methyl chloride Drugs 0.000 claims description 6
- 150000005215 alkyl ethers Chemical class 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 230000000379 polymerizing effect Effects 0.000 claims description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 claims 4
- 239000005639 Lauric acid Substances 0.000 claims 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 30
- 239000011541 reaction mixture Substances 0.000 description 24
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 22
- 239000003446 ligand Substances 0.000 description 20
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 18
- 239000002904 solvent Substances 0.000 description 15
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 14
- 238000005481 NMR spectroscopy Methods 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 12
- 239000002244 precipitate Substances 0.000 description 12
- 238000003786 synthesis reaction Methods 0.000 description 12
- 229920002367 Polyisobutene Polymers 0.000 description 11
- 150000004696 coordination complex Chemical class 0.000 description 11
- 239000001257 hydrogen Substances 0.000 description 11
- 229910021645 metal ion Inorganic materials 0.000 description 11
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 229920002223 polystyrene Polymers 0.000 description 9
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 8
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 8
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 8
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 8
- 229910052760 oxygen Inorganic materials 0.000 description 8
- 239000002243 precursor Substances 0.000 description 8
- 238000010992 reflux Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 229920003251 poly(α-methylstyrene) Polymers 0.000 description 7
- 239000000725 suspension Substances 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 239000004793 Polystyrene Substances 0.000 description 6
- 239000003085 diluting agent Substances 0.000 description 6
- 238000001914 filtration Methods 0.000 description 6
- 239000012299 nitrogen atmosphere Substances 0.000 description 6
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 5
- 229920006158 high molecular weight polymer Polymers 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- 239000013110 organic ligand Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- WTKKCYNZRWIVKL-UHFFFAOYSA-N tantalum Chemical group [Ta+5] WTKKCYNZRWIVKL-UHFFFAOYSA-N 0.000 description 5
- RRBMVWQICIXSEO-UHFFFAOYSA-N tetrachlorocatechol Chemical compound OC1=C(O)C(Cl)=C(Cl)C(Cl)=C1Cl RRBMVWQICIXSEO-UHFFFAOYSA-N 0.000 description 5
- 239000002841 Lewis acid Substances 0.000 description 4
- 229920005549 butyl rubber Polymers 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 150000007517 lewis acids Chemical class 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000003505 polymerization initiator Substances 0.000 description 4
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- 238000004009 13C{1H}-NMR spectroscopy Methods 0.000 description 3
- AQSZAISVBFUJQG-UHFFFAOYSA-N 3,4,5,6-tetrafluorobenzene-1,2-diol Chemical compound OC1=C(O)C(F)=C(F)C(F)=C1F AQSZAISVBFUJQG-UHFFFAOYSA-N 0.000 description 3
- DXOSJQLIRGXWCF-UHFFFAOYSA-N 3-fluorocatechol Chemical compound OC1=CC=CC(F)=C1O DXOSJQLIRGXWCF-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- UAJRSHJHFRVGMG-UHFFFAOYSA-N 1-ethenyl-4-methoxybenzene Chemical compound COC1=CC=C(C=C)C=C1 UAJRSHJHFRVGMG-UHFFFAOYSA-N 0.000 description 2
- HNRMPXKDFBEGFZ-UHFFFAOYSA-N 2,2-dimethylbutane Chemical compound CCC(C)(C)C HNRMPXKDFBEGFZ-UHFFFAOYSA-N 0.000 description 2
- CXOWYJMDMMMMJO-UHFFFAOYSA-N 2,2-dimethylpentane Chemical compound CCCC(C)(C)C CXOWYJMDMMMMJO-UHFFFAOYSA-N 0.000 description 2
- ZFFMLCVRJBZUDZ-UHFFFAOYSA-N 2,3-dimethylbutane Chemical compound CC(C)C(C)C ZFFMLCVRJBZUDZ-UHFFFAOYSA-N 0.000 description 2
- OXMIDRBAFOEOQT-UHFFFAOYSA-N 2,5-dimethyloxolane Chemical compound CC1CCC(C)O1 OXMIDRBAFOEOQT-UHFFFAOYSA-N 0.000 description 2
- AFABGHUZZDYHJO-UHFFFAOYSA-N 2-Methylpentane Chemical compound CCCC(C)C AFABGHUZZDYHJO-UHFFFAOYSA-N 0.000 description 2
- SZNYYWIUQFZLLT-UHFFFAOYSA-N 2-methyl-1-(2-methylpropoxy)propane Chemical compound CC(C)COCC(C)C SZNYYWIUQFZLLT-UHFFFAOYSA-N 0.000 description 2
- PFEOZHBOMNWTJB-UHFFFAOYSA-N 3-methylpentane Chemical compound CCC(C)CC PFEOZHBOMNWTJB-UHFFFAOYSA-N 0.000 description 2
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- ZNSMNVMLTJELDZ-UHFFFAOYSA-N Bis(2-chloroethyl)ether Chemical compound ClCCOCCCl ZNSMNVMLTJELDZ-UHFFFAOYSA-N 0.000 description 2
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 239000012043 crude product Substances 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 238000002356 laser light scattering Methods 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- GDOPTJXRTPNYNR-UHFFFAOYSA-N methylcyclopentane Chemical compound CC1CCCC1 GDOPTJXRTPNYNR-UHFFFAOYSA-N 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 150000004812 organic fluorine compounds Chemical class 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920001195 polyisoprene Polymers 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 2
- 239000012453 solvate Substances 0.000 description 2
- 229920001897 terpolymer Polymers 0.000 description 2
- NUMQCACRALPSHD-UHFFFAOYSA-N tert-butyl ethyl ether Chemical compound CCOC(C)(C)C NUMQCACRALPSHD-UHFFFAOYSA-N 0.000 description 2
- ZUHZGEOKBKGPSW-UHFFFAOYSA-N tetraglyme Chemical compound COCCOCCOCCOCCOC ZUHZGEOKBKGPSW-UHFFFAOYSA-N 0.000 description 2
- LVGUZGTVOIAKKC-UHFFFAOYSA-N 1,1,1,2-tetrafluoroethane Chemical compound FCC(F)(F)F LVGUZGTVOIAKKC-UHFFFAOYSA-N 0.000 description 1
- GKDCWKGUOZVDFX-UHFFFAOYSA-N 1,1,1,4,4,4-hexafluoro-2,3-bis(trifluoromethyl)butane-2,3-diol Chemical compound FC(F)(F)C(C(F)(F)F)(O)C(O)(C(F)(F)F)C(F)(F)F GKDCWKGUOZVDFX-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- BPIUIOXAFBGMNB-UHFFFAOYSA-N 1-hexoxyhexane Chemical compound CCCCCCOCCCCCC BPIUIOXAFBGMNB-UHFFFAOYSA-N 0.000 description 1
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 description 1
- FXRLMCRCYDHQFW-UHFFFAOYSA-N 2,3,3,3-tetrafluoropropene Chemical compound FC(=C)C(F)(F)F FXRLMCRCYDHQFW-UHFFFAOYSA-N 0.000 description 1
- UWKQJZCTQGMHKD-UHFFFAOYSA-N 2,6-di-tert-butylpyridine Chemical compound CC(C)(C)C1=CC=CC(C(C)(C)C)=N1 UWKQJZCTQGMHKD-UHFFFAOYSA-N 0.000 description 1
- ROHFBIREHKPELA-UHFFFAOYSA-N 2-[(3,5-ditert-butyl-4-hydroxyphenyl)methyl]prop-2-enoic acid;methane Chemical compound C.CC(C)(C)C1=CC(CC(=C)C(O)=O)=CC(C(C)(C)C)=C1O.CC(C)(C)C1=CC(CC(=C)C(O)=O)=CC(C(C)(C)C)=C1O.CC(C)(C)C1=CC(CC(=C)C(O)=O)=CC(C(C)(C)C)=C1O.CC(C)(C)C1=CC(CC(=C)C(O)=O)=CC(C(C)(C)C)=C1O ROHFBIREHKPELA-UHFFFAOYSA-N 0.000 description 1
- BULHJTXRZFEUDQ-UHFFFAOYSA-N 2-chloro-2-(2-chloropropan-2-yloxy)propane Chemical compound CC(C)(Cl)OC(C)(C)Cl BULHJTXRZFEUDQ-UHFFFAOYSA-N 0.000 description 1
- RMGHERXMTMUMMV-UHFFFAOYSA-N 2-methoxypropane Chemical compound COC(C)C RMGHERXMTMUMMV-UHFFFAOYSA-N 0.000 description 1
- JWUJQDFVADABEY-UHFFFAOYSA-N 2-methyltetrahydrofuran Chemical compound CC1CCCO1 JWUJQDFVADABEY-UHFFFAOYSA-N 0.000 description 1
- KXYAVSFOJVUIHT-UHFFFAOYSA-N 2-vinylnaphthalene Chemical compound C1=CC=CC2=CC(C=C)=CC=C21 KXYAVSFOJVUIHT-UHFFFAOYSA-N 0.000 description 1
- CSDQQAQKBAQLLE-UHFFFAOYSA-N 4-(4-chlorophenyl)-4,5,6,7-tetrahydrothieno[3,2-c]pyridine Chemical compound C1=CC(Cl)=CC=C1C1C(C=CS2)=C2CCN1 CSDQQAQKBAQLLE-UHFFFAOYSA-N 0.000 description 1
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- 238000005727 Friedel-Crafts reaction Methods 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical compound [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 description 1
- VHOQXEIFYTTXJU-UHFFFAOYSA-N Isobutylene-isoprene copolymer Chemical compound CC(C)=C.CC(=C)C=C VHOQXEIFYTTXJU-UHFFFAOYSA-N 0.000 description 1
- XOBKSJJDNFUZPF-UHFFFAOYSA-N Methoxyethane Chemical compound CCOC XOBKSJJDNFUZPF-UHFFFAOYSA-N 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 1
- 238000004639 Schlenk technique Methods 0.000 description 1
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 150000001350 alkyl halides Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000003609 aryl vinyl group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 238000010533 azeotropic distillation Methods 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005517 carbenium group Chemical group 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 235000011089 carbon dioxide Nutrition 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical group 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- POLCUAVZOMRGSN-UHFFFAOYSA-N dipropyl ether Chemical compound CCCOCCC POLCUAVZOMRGSN-UHFFFAOYSA-N 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 238000004636 glovebox technique Methods 0.000 description 1
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- SKTCDJAMAYNROS-UHFFFAOYSA-N methoxycyclopentane Chemical compound COC1CCCC1 SKTCDJAMAYNROS-UHFFFAOYSA-N 0.000 description 1
- VNKYTQGIUYNRMY-UHFFFAOYSA-N methoxypropane Chemical compound CCCOC VNKYTQGIUYNRMY-UHFFFAOYSA-N 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 150000002821 niobium Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- YHBDIEWMOMLKOO-UHFFFAOYSA-I pentachloroniobium Chemical compound Cl[Nb](Cl)(Cl)(Cl)Cl YHBDIEWMOMLKOO-UHFFFAOYSA-I 0.000 description 1
- VYMDGNCVAMGZFE-UHFFFAOYSA-N phenylbutazonum Chemical compound O=C1C(CCCC)C(=O)N(C=2C=CC=CC=2)N1C1=CC=CC=C1 VYMDGNCVAMGZFE-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 150000003017 phosphorus Chemical class 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 150000003097 polyterpenes Chemical class 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- OEIMLTQPLAGXMX-UHFFFAOYSA-I tantalum(v) chloride Chemical compound Cl[Ta](Cl)(Cl)(Cl)Cl OEIMLTQPLAGXMX-UHFFFAOYSA-I 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- ZSDSQXJSNMTJDA-UHFFFAOYSA-N trifluralin Chemical compound CCCN(CCC)C1=C([N+]([O-])=O)C=C(C(F)(F)F)C=C1[N+]([O-])=O ZSDSQXJSNMTJDA-UHFFFAOYSA-N 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
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Abstract
Description
Mは、タンタル(Ta)、バナジウム(V)、又はニオブ(Nb)であり;
各R1は、独立に、H、OR6、F、Cl、Br、I、又はアルキルであり、ここで、R6は、H又はアルキルであり;
R2、R3、R4、及びR5は、同一であるか又は異なり、独立に、H、F、Cl、Br、I、アルキル、又はアリールであり、あるいは同じベンゼン環上のR2、R3、R4、及びR5の2つ以上が一緒になってそのベンゼン環と共に二環式、三環式、又は四環式基を形成し、但し、同じベンゼン環上のR2、R3、R4、及びR5の全てがHではないことを条件とし;Lは、存在しないか又はH+に配位する分子であり;かつ、
xは、Lが存在しない場合には0であり、Lが存在する場合には0.5以上である。)
の構造を有する。
より明確な理解のために、好ましい実施態様を、例示として、添付の図面を参照しながら以下に詳細に記述する。
全ての試験は、窒素雰囲気下、標準的なシュレンク技術又はグローブボックス技術を用いて行った。
H(Et2O)2[Ta(1,2−O2C6Cl4)2(1,2−O2H1C6Cl4)2] (III)の合成
1H NMR (400 MHz, CD2Cl2, 25℃): δ = 9.37 (br s, 3H, HO & H(Et2O)2), 4.00 (q, 8H, J = 7 Hz, CH 2 CH3)), 1.40 ppm (t, 12H, J = 7 Hz, CH2CH 3 )).
1H NMR (400 MHz, CD2Cl2, -85℃): δ = 16.73 (s, 1H, H(Et2O)2), 9.40 (s, 2H, HO), 4.03 (q, 8H, J = 7 Hz, CH2CH3)), 1.38 ppm (t, 6H, J = 7 Hz, CH2CH3)).
13C{1H} NMR (75 MHz, CD2Cl2, -85℃): δ = 150.0 (s), 145.3 (s), 144.3 (s), 139.8 (s), 125.0 (s), 121.6 (s), 121.1 (s), 118.6 (s), 116.7 (s), 70.3 (s), 13.3 ppm (s).
元素分析(%) 測定値: C, 28.30; H, 1.80. 計算値(C32H23Cl16O10Ta.CH2Cl2): C, 28.31; H,1.80.
開始剤(III)を用いたモノマーの重合は、以下の一般的手順により実施した。
表1は、様々な温度で開始剤(III)を使用した、n−ブチルビニルエーテルの重合についてのデータを示す。各実施例のデータは、少なくとも3つの別個の重合反応の平均値を表す。Mnの計算値=40,000g/mol。表1は、満足のいく高い分子量(Mn)を有するポリ(n−ブチルビニルエーテル)のかなりの収率が、−90℃より大幅に高い温度で達成され得ることを示している。
表2は、様々なモノマー対開始剤の比で開始剤(III)を使用した、n−ブチルビニルエーテルの重合についてのデータを示す。 各実施例のデータは、少なくとも3つの別個の重合反応の平均値を表す。表2は、収率を相対的に一定に保ちながら[M]:[I]を増加させることによって、ポリ(n−ブチルビニルエーテル)のMnを増加させることができることを示している。
表3は、様々な温度で開始剤(III)を用いたスチレンの重合反応に関するデータを示す。各実施例のデータは、少なくとも3つの別個の重合反応の平均値を表す。Mn計算値=40,000g/mol。表3は、−90℃より大幅に高い温度で、ポリスチレンの高収率と高分子量との間の優れたバランスが達成され得ることを示している。
表4は、様々なモノマー対開始剤の比で開始剤(III)を用いたスチレンの重合についてのデータを示す。各実施例のデータは、少なくとも3つの別個の重合反応の平均値を表す。表4は、収率を相対的に一定に保ちながら[M]:[I]を増加させることによって、スチレンのMnを増加させることができることを示している。
表5は、様々な量の微量水分の存在下で様々な温度で開始剤(III)を用いたスチレンの重合についてのデータを示す。指定した量の蒸留水を重合前に無水CH2Cl2に添加した。 表5は、微量水分の存在が、ポリスチレンの収率及び分子量を劇的に低下させ得ることを示している。
表6は、様々な温度で開始剤(III)を用いたα−メチルスチレンの重合についてのデータを示す。各実施例のデータは、少なくとも3つの別個の重合反応の平均値を表す。 Mn計算値=40,000g/mol。表6は、ポリ(α−メチルスチレン)の高収率と高分子量との良好なバランスが、−90℃より大幅に高い温度で達成され得ることを示している。
表7は、様々な温度で開始剤(III)を用いたイソプレンの重合についてのデータを示す。各実施例のデータは、少なくとも3つの別個の重合反応の平均を表す。Mn計算値=27,200g/mol。表7は、ポリ(イソプレン)の高収率及び良好な分子量が、−90℃よりはるかに高い温度で達成され得ることを示している。
H(Et2O)2[Ta(1,2−O2C6F4)2(1,2−O2H1C6F4)2] (IV)の合成
1H NMR (400 MHz, CD2Cl2, 25℃): δ = 11.3 (br, H(Et2O)2, 4.00 (q, 3JHH = 6.1 Hz, 8H, CH 2 CH3)), 1.31 ppm (t, 3JHH = 6.7 Hz, 12H, CH2CH 3 )).
1H NMR (400 MHz, CD2Cl2, -85℃): δ = 16.82 (s, 1H, H(Et2O)2), 9.72 (s, 1H, OH), 4.11 (q, 3JHH = 6.7 Hz, 8H, CH 2 CH3)), 1.44 (t, 3JHH = 7.0 Hz, 12H, CH2CH 3 )).
13C{1H} NMR (75 MHz, CD2Cl2, -85℃): δ = 138.4 (s, Ar-C), 136.1 (s, Ar-C), 133.6 (s, Ar-C), 131.9 (s, Ar-C), 128.1 (s, Ar-C), 128.9 (d, 2JTaC= 12.4 Hz, Ar-C), 128.1 (s, Ar-C), 126.8 (s, Ar-C), 113.1 (s, Ar-C), 70.9 (s, OCH2CH3)), 13.8 (s, OCH2CH3)).
19F{1H}NMR (282 MHz, CD2Cl2, -85℃): δ = 160.9-161.1 (dd, 2JCF = 9.5 Hz, O2C6F4), 165.3 (br, O2C6H1F4), 167.7-167.8 (dd, 2JCF = 9.5 Hz, O2C6F4), 170.7 (br, O2C6H1F4) ppm.
開始剤(IV)を用いたモノマーの重合を、開始剤(III)について上述した一般的手順に従って行った。表8は、開始剤(IV)を用いたn−ブチルビニルエーテル、スチレン、及びα−メチルスチレンの重合についてのデータを示す。表8は、ポリ(n−ブチルビニルエーテル)、ポリ(スチレン)、及びポリ(α−メチルスチレン)についての高収率及び高分子量の良好なバランスが、−90℃よりはるかに高い温度で達成され得ることを示している。
H(THF)2[Ta(1,2−O2C6Cl4)2(1,2−O2H1C6Cl4)2] (V)の合成
1H NMR (400 MHz, CD2Cl2, 25℃): δ = 8.18 (br, OH), 3.91 (br, 8H, OCH 2 CH2), 1.95 ppm (br, 8H, OCH2CH 2 ).
1H NMR (400 MHz, CD2Cl2, -85℃): δ = 16.94 (s, 1H, H(THF)2), 9.22 (s, 1H, OH), 3.84 (br, 8H, OCH 2 CH2), 1.89 (br, 8H, OCH2CH 2 ).
13C{1H} NMR (75 MHz, CD2Cl2, -85℃): δ = 152.6 (s, Ar-C), 150.5 (s, Ar-C), 144.9 (s, Ar-C), 141.3 (s, Ar-C), 124.9 (s, Ar-C), 124.4 (d, 2JTaC= 13.2 Hz, Ar-C), 121.2 (s, Ar-C), 117.7 (s, Ar-C), 115.4 (s, Ar-C), 68.5 (s, OCH2CH2), 25.2 (s, OCH2 CH2) ppm.
開始剤(V)を用いたモノマーの重合を、開始剤(III)について上述した一般的手順に従って行った。表9は、開始剤(V)を用いたn−ブチルビニルエーテル、スチレン、及びα−メチルスチレンの重合についてのデータを示す。表9は、ポリ(n−ブチルビニルエーテル)、ポリ(スチレン)、及びポリ(α−メチルスチレン)についての高収率及び高分子量の良好なバランスが、−90℃よりはるかに高い温度で達成され得ることを示している。
H((CH3)3COCH3)2[Ta(1,2−O2C6Cl4)2(1,2−O2H1C6Cl4)2] (VI)の合成
1H NMR (400 MHz, CD2Cl2, 25℃): δ = 8.57 (br, OH), 3.20 (br, 6H, (CH 3 ))3COCH3)), 1.19 ppm (br, 18H, (CH3))3COCH 3 )).
1H NMR (400 MHz, CD2Cl2, -85℃): δ = 18.11 (s, 1H, H[(CH3))3COCH3))]2), 9.94 (s, 1H, OH), 3.13(br, 6H, (CH 3 ))3COCH3)), 1.10 (br, 18H, (CH3)3COCH 3 )) ppm.
開始剤(VI)を用いたモノマーの重合を、開始剤(III)について上述した一般的手順に従って行った。表10は、開始剤(VI)を用いたn−ブチルビニルエーテルの重合についてのデータを示す。表10は、ポリ(n−ブチルビニルエーテル)についての収率と高分子量との良好なバランスが、−90℃より高い温度で達成され得ることを示す。
H(Et2O)2[Nb(1,2−O2C6Cl4)2(1,2−O2H1C6Cl4)2] (VII)の合成
1H NMR (400 MHz, CD2Cl2, 25℃): δ = 5.88 (br, OH), 3.56 (br, 8H, CH 2 CH3), 1.24 ppm (br, 12H, CH2CH 3 )).
1H NMR (400 MHz, CD2Cl2, -85℃): δ = 16.75 (s, 1H, H(Et2O)2), 9. (s, 1H, OH), 4.13 (br, 8H, CH 2 CH3), 1.44 (br, 12H, CH2CH 3 ) ppm.
開始剤(VII)を用いたモノマーの重合を、開始剤(III)について上述した一般的手順に従って行った。表11は、開始剤(VII)を用いたn−ブチルビニルエーテル及びスチレンの重合についてのデータを示す。表11は、ニオブ錯体も、n−ブチルビニルエーテル及びスチレンのカチオン重合を開始させ得ることを示している。
H(OEt2)2[Ta(1,2−O2C6H3F)2(1,2−O2C6H4F)2] (VIII)の合成
1H NMR (400 MHz, CD2Cl2, -80℃): δ = 18.75 (s, 1H, H(Et2O)2), 10.41 (s, 1H, OH), 6.00-7.00 (m, Ar-H), 4.22 (br, 8H, CH 2 CH3), 1.55 (br, 12H, CH2CH 3 ) ppm.
H(OEt2)2[Ta(1,2−O2C6H4)2(1,2−O2C6H5)2]/H[(OEt2)]2[Ta(1,2−O2C6H4)3] (IX)の合成
1H NMR (400 MHz, CD2Cl2, 25℃): δ = 8.07-6.28 (m, Ar-H), 3.62 (br, 8H, OCH 2 CH3), 1.24 (t, 3JHH = 6.7H, OCH2CH 3 )).
1H NMR (400 MHz, CD2Cl2, -85℃): δ = 15.57 (s, 1H, H(OEt2)2), 10.28 (s, OH), 8.27-6.78 (m, Ar-H), 4.19 (br, 8H, OCH 2 CH3), 1.51 ppm (br, 12H, OCH2CH 3 ) ppm.
開始剤(IX)を用いたモノマーの重合を、開始剤(III)について上述した一般的手順に従って行った。表12は、開始剤(IX)を、対応する4−配位子タンタル錯体と共に用いた、n−ブチルビニルエーテル、スチレン、及びα−メチルスチレンの重合についてのデータを示す。表12は、収率と分子量とのバランスが、一般に、塩素化類似体(III)についてのものよりも悪いことを示している。
以下の手順により、開始剤(III)、(IV)、及び(VII)を使用して、イソブチレンポリマー(PIB)及びイソブチレン−イソプレンコポリマー(IIR−ブチルゴム)を調製した。
Claims (19)
- エチレン性不飽和モノマーのカチオン重合のためのブレンステッドローリー酸開始剤システムであって、無水の重合媒体中の式(I):
Mは、タンタル(Ta)、バナジウム(V)、又はニオブ(Nb)であり;
各R1は、独立に、H、OR6、F、Cl、Br、I、又はアルキルであり、ここで、R6は、H又はアルキルであり;
R2、R3、R4、及びR5は、同一であるか又は異なり、独立に、H、F、Cl、Br、I、アルキル、又はアリールであり、あるいは同じベンゼン環上のR2、R3、R4、及びR5の2つ以上が一緒になってそのベンゼン環と共に二環式、三環式、又は四環式基を形成し、但し、同じベンゼン環上のR2、R3、R4、及びR5の全てがHではないことを条件とし;Lは、存在しないか又はH+に配位する分子であり;かつ、
xは、Lが存在しない場合には0であり、Lが存在する場合には0.5以上である。)
の構造を有する開始剤を含む、ブレンステッドローリー酸開始剤システム。 - MがTaである、請求項1に記載のブレンステッドローリー酸開始剤システム。
- Lが、1つ以上の非共有電子対を有する、H+のための安定化分子である、請求項1又は2に記載のブレンステッドローリー酸開始剤システム。
- Lが、立体障害を有する分子である、請求項3に記載のブレンステッドローリー酸開始剤システム。
- Lが、アルキルエーテル又はシクロアルキルエーテルである、請求項1又は2に記載のブレンステッドローリー酸開始剤システム。
- Lが、ジエチルエーテルである、請求項1又は2に記載のブレンステッドローリー酸開始剤システム。
- R2、R3、R4、及びR5は、同一であり、F又はClである、請求項1〜6のいずれか一項に記載のブレンステッドローリー酸開始剤システム。
- MがTaであり、両方のR1がOHであり、R2、R3、R4、及びR5がClであり、LがEt2Oであり、xが2である、請求項1に記載のブレンステッドローリー酸開始剤システム。
- 前記重合媒体が、ジクロロメタン又はメチルクロライドを含む、請求項1〜8のいずれか一項に記載のブレンステッドローリー酸開始剤システム。
- 実質的に水を全く含まない、請求項1〜9のいずれか一項に記載のブレンステッドローリー酸開始剤システム。
- ポリマーの製造方法であって、請求項1〜10のいずれか一項に記載のブレンステッドローリー酸開始剤システムを用いて1種以上のエチレン性不飽和モノマーを重合する工程を含む、方法。
- 前記重合を、−85℃以上の温度で実施する、請求項11に記載の方法。
- 式(I):
Mは、タンタル(Ta)、バナジウム(V)、又はニオブ(Nb)であり;
各R1は、独立に、H、OR6、F、Cl、Br、I、又はアルキルであり、ここで、R6は、H又はアルキルであり;
R2、R3、R4、及びR5は、同一であるか又は異なり、独立に、H、F、Cl、Br、I、アルキル、又はアリールであり、あるいは同じベンゼン環上のR2、R3、R4、及びR5の2つ以上が一緒になってそのベンゼン環と共に二環式、三環式、又は四環式基を形成し、但し、同じベンゼン環上のR2、R3、R4、及びR5の全てがHではないことを条件とし;Lは、存在しないか又はH+に配位する分子であり;かつ、
xは、Lが存在しない場合には0であり、Lが存在する場合には0.5以上である。)
の化合物。 - MがTaである、請求項13に記載の化合物。
- Lが、1つ以上の非共有電子対を有する、H+のための安定化分子である、請求項13又は14に記載の化合物。
- Lが、立体障害を有する分子である、請求項15に記載の化合物。
- Lが、アルキルエーテル又はシクロアルキルエーテルである、請求項13又は14に記載の化合物。
- R2、R3、R4、及びR5は、同一であり、F又はClである、請求項13〜17のいずれか一項に記載の化合物。
- MがTaであり、両方のR1がOHであり、R2、R3、R4、及びR5がClであり、LがEt2Oであり、xが2である、請求項13に記載の化合物。
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EP16204669.2A EP3336111A1 (en) | 2016-12-16 | 2016-12-16 | Initiator system for cationic polymerization of olefins |
EP16204669.2 | 2016-12-16 | ||
PCT/CA2017/051517 WO2018107295A1 (en) | 2016-12-16 | 2017-12-14 | Initiator system for cationic polymerization of olefins |
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US3361778A (en) * | 1964-04-20 | 1968-01-02 | Du Pont | Chelated compounds of vanadium and substituted phenols |
JPH04214704A (ja) * | 1990-02-12 | 1992-08-05 | Minnesota Mining & Mfg Co <3M> | 新規カチオン重合用開始剤 |
JPH11315109A (ja) * | 1997-04-25 | 1999-11-16 | Mitsui Chem Inc | オレフィン重合用触媒、遷移金属化合物、オレフィンの重合方法およびα−オレフィン・共役ジエン共重合体 |
JP2001510500A (ja) * | 1997-02-06 | 2001-07-31 | ビーエーエスエフ アクチェンゲゼルシャフト | ハロゲン不含の反応性ポリイソブテンの製造方法 |
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US3919180A (en) * | 1968-07-03 | 1975-11-11 | Bridgestone Tire Co Ltd | Method of producing alternating copolymers of donor monomer and acceptor monomer from not less than three monomers |
US5124417A (en) * | 1990-02-12 | 1992-06-23 | Minnesota Mining And Manufacturing Company | Initiators for cationic polymerization |
TWI246520B (en) * | 1997-04-25 | 2006-01-01 | Mitsui Chemicals Inc | Processes for olefin polymerization |
EP1358230B1 (en) * | 2000-12-20 | 2006-06-07 | ExxonMobil Chemical Patents Inc. | Process for polymerizing cationically polymerizable monomers |
US20100273964A1 (en) * | 2009-04-22 | 2010-10-28 | Stewart Lewis | Heterogeneous lewis acid catalysts for cationic polymerizations |
WO2011054785A1 (de) | 2009-11-04 | 2011-05-12 | Basf Se | Verfahren zur herstellung von homo- oder copolymeren |
-
2016
- 2016-12-16 EP EP16204669.2A patent/EP3336111A1/en not_active Withdrawn
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2017
- 2017-12-14 KR KR1020197020643A patent/KR20190112721A/ko not_active Application Discontinuation
- 2017-12-14 EP EP17880374.8A patent/EP3555035B1/en active Active
- 2017-12-14 US US16/470,046 patent/US20200010644A1/en not_active Abandoned
- 2017-12-14 WO PCT/CA2017/051517 patent/WO2018107295A1/en unknown
- 2017-12-14 RU RU2019122156A patent/RU2756274C2/ru active
- 2017-12-14 CN CN201780085482.7A patent/CN110312699A/zh active Pending
- 2017-12-14 CA CA3046829A patent/CA3046829A1/en not_active Abandoned
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3361778A (en) * | 1964-04-20 | 1968-01-02 | Du Pont | Chelated compounds of vanadium and substituted phenols |
JPH04214704A (ja) * | 1990-02-12 | 1992-08-05 | Minnesota Mining & Mfg Co <3M> | 新規カチオン重合用開始剤 |
JP2001510500A (ja) * | 1997-02-06 | 2001-07-31 | ビーエーエスエフ アクチェンゲゼルシャフト | ハロゲン不含の反応性ポリイソブテンの製造方法 |
JPH11315109A (ja) * | 1997-04-25 | 1999-11-16 | Mitsui Chem Inc | オレフィン重合用触媒、遷移金属化合物、オレフィンの重合方法およびα−オレフィン・共役ジエン共重合体 |
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EP3336111A1 (en) | 2018-06-20 |
RU2756274C2 (ru) | 2021-09-29 |
RU2019122156A (ru) | 2021-01-18 |
KR20190112721A (ko) | 2019-10-07 |
EP3555035A4 (en) | 2020-06-03 |
EP3555035A1 (en) | 2019-10-23 |
RU2019122156A3 (ja) | 2021-03-30 |
US20200010644A1 (en) | 2020-01-09 |
JP6825107B2 (ja) | 2021-02-03 |
CN110312699A (zh) | 2019-10-08 |
CA3046829A1 (en) | 2018-06-21 |
WO2018107295A1 (en) | 2018-06-21 |
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