JP2019537271A5 - - Google Patents

Download PDF

Info

Publication number
JP2019537271A5
JP2019537271A5 JP2019529208A JP2019529208A JP2019537271A5 JP 2019537271 A5 JP2019537271 A5 JP 2019537271A5 JP 2019529208 A JP2019529208 A JP 2019529208A JP 2019529208 A JP2019529208 A JP 2019529208A JP 2019537271 A5 JP2019537271 A5 JP 2019537271A5
Authority
JP
Japan
Prior art keywords
feature
lithography method
imprint lithography
substrate
size range
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2019529208A
Other languages
English (en)
Japanese (ja)
Other versions
JP2019537271A (ja
JP6925423B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2017/051444 external-priority patent/WO2018102002A1/en
Publication of JP2019537271A publication Critical patent/JP2019537271A/ja
Publication of JP2019537271A5 publication Critical patent/JP2019537271A5/ja
Application granted granted Critical
Publication of JP6925423B2 publication Critical patent/JP6925423B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2019529208A 2016-12-02 2017-09-14 インプリントリソグラフィプロセスにおける光学層の構成 Active JP6925423B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201662429214P 2016-12-02 2016-12-02
US62/429,214 2016-12-02
PCT/US2017/051444 WO2018102002A1 (en) 2016-12-02 2017-09-14 Configuring optical layers in imprint lithography processes

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2021127297A Division JP7008157B2 (ja) 2016-12-02 2021-08-03 インプリントリソグラフィプロセスにおける光学層の構成

Publications (3)

Publication Number Publication Date
JP2019537271A JP2019537271A (ja) 2019-12-19
JP2019537271A5 true JP2019537271A5 (https=) 2020-11-12
JP6925423B2 JP6925423B2 (ja) 2021-08-25

Family

ID=62240094

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2019529208A Active JP6925423B2 (ja) 2016-12-02 2017-09-14 インプリントリソグラフィプロセスにおける光学層の構成
JP2021127297A Active JP7008157B2 (ja) 2016-12-02 2021-08-03 インプリントリソグラフィプロセスにおける光学層の構成

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2021127297A Active JP7008157B2 (ja) 2016-12-02 2021-08-03 インプリントリソグラフィプロセスにおける光学層の構成

Country Status (8)

Country Link
US (2) US10747107B2 (https=)
EP (2) EP4357298A3 (https=)
JP (2) JP6925423B2 (https=)
KR (1) KR102231664B1 (https=)
CN (2) CN110023234B (https=)
CA (1) CA3045096C (https=)
IL (1) IL266851B2 (https=)
WO (1) WO2018102002A1 (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110023234B (zh) 2016-12-02 2024-01-09 分子印记公司 在压印光刻工艺中配置光学层
EP3577522A4 (en) * 2017-02-01 2020-01-01 Molecular Imprints, Inc. CONFIGURATION OF OPTICAL LAYERS IN PRINT LITHOGRAPHY
KR102383721B1 (ko) 2017-10-20 2022-04-08 매직 립, 인코포레이티드 임프린트 리소그래피 프로세스들에서의 광학 층들의 구성
US11249405B2 (en) * 2018-04-30 2022-02-15 Canon Kabushiki Kaisha System and method for improving the performance of a nanoimprint system
KR101990122B1 (ko) * 2018-11-21 2019-06-19 주식회사 기가레인 임프린트 리소그래피용 리플리카 몰드 제작 장치 및 그 제작 방법
CN115190837A (zh) * 2020-02-28 2022-10-14 奇跃公司 制造用于形成具有一体间隔件的目镜的模具的方法
CN113885295B (zh) * 2020-07-01 2024-03-08 吉佳蓝科技股份有限公司 纳米压印用复制模制作装置
EP4485070A3 (en) * 2020-08-20 2025-03-12 Toppan Inc. Diffraction sheet, method for manufacturing same, three-dimensional display device, light-beam reproduction device, three-dimensional space display system, light-beam reproduction method, and program
CN114002915B (zh) * 2021-11-18 2024-08-16 北京驭光科技发展有限公司 压印衬底及压印方法
CN114995055A (zh) * 2022-08-08 2022-09-02 歌尔光学科技有限公司 一种双面压印方法以及双面压印产品
WO2024123308A1 (en) 2022-12-05 2024-06-13 Magic Leap, Inc. Optically functional structures for augmented reality devices
CN118782509B (zh) * 2024-09-13 2025-02-07 度亘核芯光电技术(苏州)有限公司 一种芯片制备方法
CN121325507B (zh) * 2025-12-15 2026-02-24 深圳大学 一种双面压印成形方法及双面微纳结构元件

Family Cites Families (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0413365B1 (en) * 1989-08-18 1995-04-05 Mitsubishi Denki Kabushiki Kaisha Method of manufacturing a diffraction grating
EP0698804A3 (en) * 1994-08-26 1998-09-02 Omron Corporation Optical low pass filter, polariser and liquid crystal display devices using such
US5544268A (en) * 1994-09-09 1996-08-06 Deacon Research Display panel with electrically-controlled waveguide-routing
US5907436A (en) * 1995-09-29 1999-05-25 The Regents Of The University Of California Multilayer dielectric diffraction gratings
US6396559B1 (en) 1998-11-17 2002-05-28 Sharp Kabushiki Kaisha LCD including spacers used in combination with polymer walls
CN100365507C (zh) * 2000-10-12 2008-01-30 德克萨斯州大学系统董事会 用于室温下低压微刻痕和毫微刻痕光刻的模板
US7077992B2 (en) * 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
EP1443344A1 (en) * 2003-01-29 2004-08-04 Heptagon Oy Manufacturing micro-structured elements
KR100893251B1 (ko) * 2004-12-03 2009-04-17 샤프 가부시키가이샤 반사 방지재, 광학 소자, 및 표시 장치 및 스탬퍼의 제조방법 및 스탬퍼를 이용한 반사 방지재의 제조 방법
US7573640B2 (en) * 2005-04-04 2009-08-11 Mirage Innovations Ltd. Multi-plane optical apparatus
US20070013293A1 (en) * 2005-07-12 2007-01-18 Eastman Kodak Company OLED device having spacers
US20070178666A1 (en) * 2006-01-31 2007-08-02 Stats Chippac Ltd. Integrated circuit system with waferscale spacer system
JP5934459B2 (ja) * 2006-04-17 2016-06-15 オムニビジョン テクノロジーズ， インコーポレイテッド アレイ化撮像システムおよび関連方法
CN101573419A (zh) 2006-12-28 2009-11-04 株式会社理光 再充填用墨水和墨盒
US7564067B2 (en) * 2007-03-29 2009-07-21 Eastman Kodak Company Device having spacers
US8293354B2 (en) * 2008-04-09 2012-10-23 The Regents Of The University Of Michigan UV curable silsesquioxane resins for nanoprint lithography
WO2010007010A1 (en) 2008-07-18 2010-01-21 Asml Netherlands B.V. Scatterometry method and measurement system for lithography
US20100052216A1 (en) * 2008-08-29 2010-03-04 Yong Hyup Kim Nano imprint lithography using an elastic roller
US8039399B2 (en) * 2008-10-09 2011-10-18 Micron Technology, Inc. Methods of forming patterns utilizing lithography and spacers
JP2011071500A (ja) * 2009-08-31 2011-04-07 Fujifilm Corp パターン転写装置及びパターン形成方法
US9416461B2 (en) * 2009-10-14 2016-08-16 Sharp Kabushiki Kaisha Die and method for manufacturing die, and anti-reflection coating
US8427747B2 (en) * 2010-04-22 2013-04-23 3M Innovative Properties Company OLED light extraction films laminated onto glass substrates
KR101182234B1 (ko) * 2010-05-28 2012-09-12 삼성디스플레이 주식회사 유기 발광 표시 장치 및 그 제조 방법
CN102193310B (zh) * 2011-05-17 2012-09-05 西安交通大学 一种机床测量用光栅两步固化辊压印成型方法
US9676649B2 (en) * 2011-08-26 2017-06-13 Corning Incorporated Glass substrates with strategically imprinted B-side features and methods for manufacturing the same
US9616614B2 (en) * 2012-02-22 2017-04-11 Canon Nanotechnologies, Inc. Large area imprint lithography
US10032270B2 (en) * 2013-03-15 2018-07-24 Richard H. Turner System and methods for the in vitro detection of particles and soluble chemical entities in body fluids
EP3011608B1 (en) 2013-06-20 2017-01-11 Philips Lighting Holding B.V. Light emitting device
JP6171740B2 (ja) * 2013-09-02 2017-08-02 セイコーエプソン株式会社 光学デバイス及び画像表示装置
JP2015093399A (ja) * 2013-11-11 2015-05-18 セイコーエプソン株式会社 転写用の型、転写用の型を用いた回折格子及び光学装置、転写用の型を用いた凹凸形成方法、並びに凹凸形成方法を用いた回折格子の製造方法
US10677969B2 (en) 2013-11-27 2020-06-09 Magic Leap, Inc. Manufacturing for virtual and augmented reality systems and components
KR102396551B1 (ko) * 2013-12-19 2022-05-12 코닝 인코포레이티드 디스플레이 응용을 위한 텍스쳐링된 표면
CN103996778B (zh) * 2014-03-14 2017-06-13 苏州大学 一种偏振出光发光二极管
AU2015323940B2 (en) * 2014-09-29 2021-05-20 Magic Leap, Inc. Architectures and methods for outputting different wavelength light out of waveguides
JP6672585B2 (ja) * 2014-12-15 2020-03-25 凸版印刷株式会社 表示体
US9891436B2 (en) * 2016-02-11 2018-02-13 Microsoft Technology Licensing, Llc Waveguide-based displays with anti-reflective and highly-reflective coating
CN110023234B (zh) 2016-12-02 2024-01-09 分子印记公司 在压印光刻工艺中配置光学层

Similar Documents

Publication Publication Date Title
JP2019537271A5 (https=)
JP6925423B2 (ja) インプリントリソグラフィプロセスにおける光学層の構成
IL299643B1 (en) Liquid crystal light-refracting devices with a nanoscale pattern and methods for their manufacture
JP2007103915A5 (https=)
JP5110924B2 (ja) モールド、モールドの製造方法、加工装置及び加工方法
IL273853B1 (en) Configuring optical layers in imprint lithography processes
EP2881790A3 (en) Photomask blank
JP2017532231A5 (https=)
JP2021500746A5 (https=)
TWI538011B (zh) 經由多階壓印處理之高對比對準標記
JP2014517937A5 (https=)
CN103631086A (zh) 一种用于集成光电子器件的微纳图形的制作方法及应用
JP2014232745A (ja) テンプレート基板、テンプレートブランク、ナノインプリント用テンプレート、および、テンプレート基板の製造方法、並びに、テンプレート基板の再生方法
JP2008527736A5 (https=)
CN103730339A (zh) 微纳尺度图纹压印模具的制作方法
JP2019527938A (ja) 導電性材料のインプリントリソグラフィの方法、インプリントリソグラフィのためのスタンプ、及びインプリントリソグラフィのための装置
JP6394114B2 (ja) テンプレートの製造方法およびテンプレート
TWI748051B (zh) 光學層及組構光學層之壓印微影方法
JP7139751B2 (ja) インプリントモールドの製造方法
US12197126B2 (en) Nanostamping method and nano-optical component
JP2005272623A (ja) 用紙
CN205439741U (zh) 雕刻刀具
JP2018098470A (ja) パターン形成方法及びレプリカモールドの製造方法
JP2018157144A (ja) インプリントモールド用マスクブランク及びその製造方法、インプリントモールド及びその製造方法、並びにインプリント方法
JP2018022722A (ja) パターン構造体の製造方法およびインプリント用モールドの製造方法