JP2019532343A5 - - Google Patents
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- Publication number
- JP2019532343A5 JP2019532343A5 JP2019519707A JP2019519707A JP2019532343A5 JP 2019532343 A5 JP2019532343 A5 JP 2019532343A5 JP 2019519707 A JP2019519707 A JP 2019519707A JP 2019519707 A JP2019519707 A JP 2019519707A JP 2019532343 A5 JP2019532343 A5 JP 2019532343A5
- Authority
- JP
- Japan
- Prior art keywords
- alkali
- propylene glycol
- photoresist composition
- mass
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920005989 resin Polymers 0.000 claims 12
- 239000011347 resin Substances 0.000 claims 12
- 239000000203 mixture Substances 0.000 claims 8
- 229920002120 photoresistant polymer Polymers 0.000 claims 7
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims 6
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 6
- 229920002554 vinyl polymer Polymers 0.000 claims 6
- 238000000034 method Methods 0.000 claims 4
- 239000003960 organic solvent Substances 0.000 claims 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims 3
- 125000000217 alkyl group Chemical group 0.000 claims 3
- 229920000642 polymer Polymers 0.000 claims 3
- 150000007514 bases Chemical class 0.000 claims 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- 239000004014 plasticizer Substances 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 2
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 claims 2
- LEEANUDEDHYDTG-UHFFFAOYSA-N 1,2-dimethoxypropane Chemical compound COCC(C)OC LEEANUDEDHYDTG-UHFFFAOYSA-N 0.000 claims 1
- UHOPWFKONJYLCF-UHFFFAOYSA-N 2-(2-sulfanylethyl)isoindole-1,3-dione Chemical compound C1=CC=C2C(=O)N(CCS)C(=O)C2=C1 UHOPWFKONJYLCF-UHFFFAOYSA-N 0.000 claims 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 claims 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 claims 1
- 239000004721 Polyphenylene oxide Substances 0.000 claims 1
- 230000003321 amplification Effects 0.000 claims 1
- 150000002148 esters Chemical class 0.000 claims 1
- 229910052736 halogen Chemical group 0.000 claims 1
- 150000002367 halogens Chemical group 0.000 claims 1
- 150000002431 hydrogen Chemical group 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- SKTCDJAMAYNROS-UHFFFAOYSA-N methoxycyclopentane Chemical compound COC1CCCC1 SKTCDJAMAYNROS-UHFFFAOYSA-N 0.000 claims 1
- 238000003199 nucleic acid amplification method Methods 0.000 claims 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 claims 1
- 229920000570 polyether Polymers 0.000 claims 1
- 229920001289 polyvinyl ether Polymers 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP16002196 | 2016-10-12 | ||
| EP16002196.0 | 2016-10-12 | ||
| PCT/EP2017/075738 WO2018069274A1 (en) | 2016-10-12 | 2017-10-10 | Chemically amplified positive photoresist composition and pattern forming method using same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019532343A JP2019532343A (ja) | 2019-11-07 |
| JP2019532343A5 true JP2019532343A5 (enExample) | 2021-01-21 |
| JP7317704B2 JP7317704B2 (ja) | 2023-07-31 |
Family
ID=57144708
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019519707A Active JP7317704B2 (ja) | 2016-10-12 | 2017-10-10 | 化学増幅型ポジ型フォトレジスト組成物およびそれを用いたパターンの形成方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US11029599B2 (enExample) |
| EP (1) | EP3526644B1 (enExample) |
| JP (1) | JP7317704B2 (enExample) |
| KR (1) | KR102298153B1 (enExample) |
| CN (1) | CN109804311B (enExample) |
| SG (1) | SG11201900622UA (enExample) |
| TW (1) | TWI744391B (enExample) |
| WO (1) | WO2018069274A1 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102656151B1 (ko) * | 2017-09-29 | 2024-04-08 | 니폰 제온 가부시키가이샤 | 포지티브형 레지스트 조성물, 레지스트막 형성 방법, 및 적층체의 제조 방법 |
| CN112292637A (zh) * | 2018-06-22 | 2021-01-29 | 默克专利有限公司 | 光致抗蚀剂组合物、用于制造光致抗蚀剂涂层、经蚀刻的光致抗蚀剂涂层和经蚀刻的含硅层的方法以及制造使用其的器件的方法 |
| TWI833992B (zh) * | 2019-10-15 | 2024-03-01 | 美商羅門哈斯電子材料有限公司 | 光致抗蝕劑組成物及圖案形成方法 |
| JP7600752B2 (ja) * | 2020-03-18 | 2024-12-17 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| CN116284517B (zh) * | 2022-09-08 | 2025-06-27 | 上海八亿时空先进材料有限公司 | 一种分子量窄分布且高透光性phs树脂及其合成方法与应用 |
| CN115421354B (zh) * | 2022-09-29 | 2025-08-26 | 徐州博康信息化学品有限公司 | 一种正性光刻胶组合物及其制备与使用方法 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5861231A (en) * | 1996-06-11 | 1999-01-19 | Shipley Company, L.L.C. | Copolymers and photoresist compositions comprising copolymer resin binder component |
| JP2001290275A (ja) * | 2000-02-03 | 2001-10-19 | Fuji Photo Film Co Ltd | ポジ型フォトレジスト組成物 |
| JP2004198915A (ja) | 2002-12-20 | 2004-07-15 | Shin Etsu Chem Co Ltd | ポジ型レジスト組成物及びパターン形成方法 |
| JP4205078B2 (ja) * | 2005-05-26 | 2009-01-07 | 東京応化工業株式会社 | ポジ型レジスト組成物およびレジストパターン形成方法 |
| US7255970B2 (en) * | 2005-07-12 | 2007-08-14 | Az Electronic Materials Usa Corp. | Photoresist composition for imaging thick films |
| US20070105040A1 (en) | 2005-11-10 | 2007-05-10 | Toukhy Medhat A | Developable undercoating composition for thick photoresist layers |
| TW200739265A (en) * | 2005-12-06 | 2007-10-16 | Tokyo Ohka Kogyo Co Ltd | Positive photoresist composition and method of forming photoresist pattern using the same |
| JP4954576B2 (ja) | 2006-03-15 | 2012-06-20 | 東京応化工業株式会社 | 厚膜レジスト積層体およびその製造方法、レジストパターン形成方法 |
| JP5260094B2 (ja) * | 2007-03-12 | 2013-08-14 | ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． | フェノール系ポリマー及びこれを含有するフォトレジスト |
| JP4637221B2 (ja) * | 2007-09-28 | 2011-02-23 | 富士フイルム株式会社 | ポジ型感光性樹脂組成物及びそれを用いた硬化膜形成方法 |
| JP5729313B2 (ja) | 2011-01-19 | 2015-06-03 | 信越化学工業株式会社 | 化学増幅ポジ型レジスト材料及びパターン形成方法 |
| JP5707359B2 (ja) * | 2011-05-30 | 2015-04-30 | 富士フイルム株式会社 | パターン形成方法、感活性光線性又は感放射線性樹脂組成物、レジスト膜、電子デバイスの製造方法及び電子デバイス |
| JP6255717B2 (ja) | 2012-06-08 | 2018-01-10 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
| JP5919122B2 (ja) * | 2012-07-27 | 2016-05-18 | 富士フイルム株式会社 | 樹脂組成物及びそれを用いたパターン形成方法 |
| JP6200721B2 (ja) * | 2013-08-01 | 2017-09-20 | 富士フイルム株式会社 | パターン形成方法、及びこれを用いた電子デバイスの製造方法 |
| JP6238635B2 (ja) * | 2013-08-09 | 2017-11-29 | 東京応化工業株式会社 | 化学増幅型感光性樹脂組成物及びそれを用いたレジストパターンの製造方法 |
| US9316900B2 (en) * | 2013-10-11 | 2016-04-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Extreme ultraviolet lithography process and mask |
| JP6432170B2 (ja) * | 2014-06-09 | 2018-12-05 | 信越化学工業株式会社 | 化学増幅ポジ型レジスト材料及びパターン形成方法 |
| WO2016017232A1 (ja) * | 2014-07-31 | 2016-02-04 | 富士フイルム株式会社 | パターン形成方法、レジストパターン、電子デバイスの製造方法、及び、電子デバイス |
| KR102281050B1 (ko) * | 2014-08-08 | 2021-07-23 | 닛산 가가쿠 가부시키가이샤 | 평탄화막용 또는 마이크로렌즈용 수지 조성물 |
| US10527935B2 (en) * | 2016-12-31 | 2020-01-07 | Rohm And Haas Electronic Materials Llc | Radiation-sensitive compositions and patterning and metallization processes |
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2017
- 2017-10-10 KR KR1020197013599A patent/KR102298153B1/ko active Active
- 2017-10-10 SG SG11201900622UA patent/SG11201900622UA/en unknown
- 2017-10-10 WO PCT/EP2017/075738 patent/WO2018069274A1/en not_active Ceased
- 2017-10-10 JP JP2019519707A patent/JP7317704B2/ja active Active
- 2017-10-10 EP EP17778315.6A patent/EP3526644B1/en active Active
- 2017-10-10 CN CN201780062691.XA patent/CN109804311B/zh active Active
- 2017-10-10 US US16/340,413 patent/US11029599B2/en active Active
- 2017-10-11 TW TW106134662A patent/TWI744391B/zh active