JP2009258586A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2009258586A5 JP2009258586A5 JP2008200248A JP2008200248A JP2009258586A5 JP 2009258586 A5 JP2009258586 A5 JP 2009258586A5 JP 2008200248 A JP2008200248 A JP 2008200248A JP 2008200248 A JP2008200248 A JP 2008200248A JP 2009258586 A5 JP2009258586 A5 JP 2009258586A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- solvent
- forming method
- pattern forming
- solvents
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims description 26
- 239000002904 solvent Substances 0.000 claims description 19
- 239000003960 organic solvent Substances 0.000 claims description 10
- 239000007788 liquid Substances 0.000 claims description 9
- 125000005843 halogen group Chemical group 0.000 claims description 6
- 230000007261 regionalization Effects 0.000 claims description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 5
- 125000003545 alkoxy group Chemical group 0.000 claims description 4
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 150000001408 amides Chemical class 0.000 claims description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 4
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 4
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 4
- 239000005456 alcohol based solvent Substances 0.000 claims description 3
- 239000003759 ester based solvent Substances 0.000 claims description 3
- 239000004210 ether based solvent Substances 0.000 claims description 3
- 239000005453 ketone based solvent Substances 0.000 claims description 3
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims description 2
- 239000004215 Carbon black (E152) Substances 0.000 claims description 2
- 239000002253 acid Substances 0.000 claims description 2
- 239000003513 alkali Substances 0.000 claims description 2
- -1 alkyl acetate Chemical compound 0.000 claims description 2
- 125000004448 alkyl carbonyl group Chemical group 0.000 claims description 2
- 125000004122 cyclic group Chemical group 0.000 claims description 2
- 230000018109 developmental process Effects 0.000 claims description 2
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 claims description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 claims description 2
- 229930195733 hydrocarbon Natural products 0.000 claims description 2
- 150000002430 hydrocarbons Chemical class 0.000 claims description 2
- 150000002596 lactones Chemical group 0.000 claims description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims description 2
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 2
- 239000011347 resin Substances 0.000 claims description 2
- 229920005989 resin Polymers 0.000 claims description 2
- 229910052717 sulfur Inorganic materials 0.000 claims description 2
- 125000004434 sulfur atom Chemical group 0.000 claims description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 2
- 206010047571 Visual impairment Diseases 0.000 claims 1
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 claims 1
- 150000002576 ketones Chemical class 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008200248A JP5433181B2 (ja) | 2008-03-28 | 2008-08-01 | ネガ型現像用レジスト組成物及びこれを用いたパターン形成方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008088779 | 2008-03-28 | ||
| JP2008088779 | 2008-03-28 | ||
| JP2008200248A JP5433181B2 (ja) | 2008-03-28 | 2008-08-01 | ネガ型現像用レジスト組成物及びこれを用いたパターン形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009258586A JP2009258586A (ja) | 2009-11-05 |
| JP2009258586A5 true JP2009258586A5 (enExample) | 2011-06-23 |
| JP5433181B2 JP5433181B2 (ja) | 2014-03-05 |
Family
ID=41386070
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008200248A Expired - Fee Related JP5433181B2 (ja) | 2008-03-28 | 2008-08-01 | ネガ型現像用レジスト組成物及びこれを用いたパターン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5433181B2 (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5537859B2 (ja) * | 2009-07-31 | 2014-07-02 | 富士フイルム株式会社 | 化学増幅型レジスト組成物によるパターン形成用の処理液及びそれを用いたレジストパターン形成方法 |
| JP5422402B2 (ja) * | 2010-01-08 | 2014-02-19 | 富士フイルム株式会社 | パターン形成方法、化学増幅型レジスト組成物及びレジスト膜 |
| JP2011154214A (ja) * | 2010-01-27 | 2011-08-11 | Jsr Corp | ネガ型感放射線性組成物、硬化パターン形成方法及び硬化パターン |
| JP5750272B2 (ja) * | 2010-02-18 | 2015-07-15 | 東京応化工業株式会社 | レジストパターン形成方法 |
| JP5775701B2 (ja) * | 2010-02-26 | 2015-09-09 | 富士フイルム株式会社 | パターン形成方法及びレジスト組成物 |
| JP5708082B2 (ja) * | 2010-03-24 | 2015-04-30 | 信越化学工業株式会社 | パターン形成方法及びネガ型レジスト組成物 |
| JP5639780B2 (ja) | 2010-03-26 | 2014-12-10 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、及びそれを用いたパターン形成方法 |
| JP2011227463A (ja) * | 2010-03-30 | 2011-11-10 | Jsr Corp | 感放射線性樹脂組成物およびパターン形成方法 |
| WO2011122336A1 (ja) * | 2010-03-30 | 2011-10-06 | Jsr株式会社 | 感放射線性樹脂組成物およびパターン形成方法 |
| WO2011158687A1 (ja) * | 2010-06-14 | 2011-12-22 | Jsr株式会社 | パターン形成方法及び感放射線性樹脂組成物 |
| EP2527919A1 (en) * | 2010-09-10 | 2012-11-28 | Rohm and Haas Electronic Materials LLC | Photoresist compositions and methods of forming photolithographic patterns |
| JP5716751B2 (ja) * | 2010-10-04 | 2015-05-13 | Jsr株式会社 | パターン形成方法及び感放射線性樹脂組成物 |
| WO2012046581A1 (ja) * | 2010-10-06 | 2012-04-12 | Jsr株式会社 | パターン形成方法及び感放射線性樹脂組成物 |
| JP5940455B2 (ja) * | 2010-10-15 | 2016-06-29 | Jsr株式会社 | レジストパターン形成方法 |
| KR101907705B1 (ko) | 2010-10-22 | 2018-10-12 | 제이에스알 가부시끼가이샤 | 패턴 형성 방법 및 감방사선성 조성물 |
| US20120122031A1 (en) * | 2010-11-15 | 2012-05-17 | International Business Machines Corporation | Photoresist composition for negative development and pattern forming method using thereof |
| JP5754444B2 (ja) * | 2010-11-26 | 2015-07-29 | Jsr株式会社 | 感放射線性組成物 |
| JP5244933B2 (ja) * | 2011-03-14 | 2013-07-24 | 富士フイルム株式会社 | レジスト組成物、並びに、それを用いたレジスト膜及びパターン形成方法 |
| JP5482722B2 (ja) | 2011-04-22 | 2014-05-07 | 信越化学工業株式会社 | パターン形成方法 |
| JP5353943B2 (ja) | 2011-04-28 | 2013-11-27 | 信越化学工業株式会社 | パターン形成方法 |
| TWI450038B (zh) | 2011-06-22 | 2014-08-21 | Shinetsu Chemical Co | 圖案形成方法及光阻組成物 |
| JP5740287B2 (ja) * | 2011-11-09 | 2015-06-24 | 富士フイルム株式会社 | パターン形成方法、及び、電子デバイスの製造方法 |
| JP2014222275A (ja) * | 2013-05-13 | 2014-11-27 | 富士フイルム株式会社 | パターン形成方法、それに用いられる感活性光線性又は感放射線性樹脂組成物、及び、これらを用いる電子デバイス及びその製造方法 |
| KR20160146881A (ko) * | 2014-06-13 | 2016-12-21 | 후지필름 가부시키가이샤 | 패턴 형성 방법, 감활성광선성 또는 감방사선성 수지 조성물, 감활성광선성 또는 감방사선성 막, 전자 디바이스의 제조 방법 및 전자 디바이스 |
| JP2016099438A (ja) * | 2014-11-19 | 2016-05-30 | 富士フイルム株式会社 | パターン形成方法、それに用いられる感活性光線性又は感放射線性樹脂組成物、及び、これらを用いる電子デバイス及びその製造方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU6056099A (en) * | 1998-09-23 | 2000-04-10 | E.I. Du Pont De Nemours And Company | Photoresists, polymers and processes for microlithography |
| JP3943741B2 (ja) * | 1999-01-07 | 2007-07-11 | 株式会社東芝 | パターン形成方法 |
| JP2003302762A (ja) * | 2002-04-11 | 2003-10-24 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物 |
| JP4386197B2 (ja) * | 2003-03-06 | 2009-12-16 | 日本電気株式会社 | 脂環式不飽和化合物、重合体、化学増幅レジスト組成物、及び該組成物を用いたパターン形成方法 |
| US20050170277A1 (en) * | 2003-10-20 | 2005-08-04 | Luke Zannoni | Fluorinated photoresists prepared, deposited, developed and removed in carbon dioxide |
-
2008
- 2008-08-01 JP JP2008200248A patent/JP5433181B2/ja not_active Expired - Fee Related
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2009258586A5 (enExample) | ||
| JP2010139996A5 (ja) | ネガ型現像用レジスト組成物を用いたパターン形成方法 | |
| JP2009258585A5 (enExample) | ||
| JP2010197619A5 (ja) | ネガ型現像用レジスト組成物を用いたパターン形成方法 | |
| JP2010164958A5 (enExample) | ||
| JP2008268931A5 (enExample) | ||
| JP2008309879A5 (enExample) | ||
| JP2009053657A5 (enExample) | ||
| JP2008292975A5 (enExample) | ||
| EP2746853A3 (en) | Organic solvent development or multiple development pattern-forming method using electron beams or EUV rays | |
| CN102834774B (zh) | 感光化射线性或感放射线性树脂组合物及使用其的光阻膜及图案形成方法 | |
| KR101263673B1 (ko) | 술포늄 화합물, 광산발생제 및 레지스트 조성물 | |
| EP2329320A4 (en) | POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND STRUCTURAL FORMING PROCESS | |
| JP2011219363A5 (enExample) | ||
| KR102208103B1 (ko) | 수지의 제조 방법, 및 감활성광선성 또는 감방사선성 조성물의 제조 방법 | |
| JP2009048182A5 (enExample) | ||
| EP1975705A3 (en) | Positive resist composition and pattern-forming method | |
| TW200731016A (en) | Composition for forming upper film and method for forming photoresist pattern | |
| JP2009258723A5 (enExample) | ||
| TWI456352B (zh) | 圖案形成方法 | |
| JP2004302198A5 (enExample) | ||
| KR102077500B1 (ko) | 패턴 형성 방법, 전자 디바이스의 제조 방법, 및 감활성광선성 또는 감방사선성 수지 조성물 | |
| JP2008107529A5 (enExample) | ||
| KR20130111997A (ko) | 포토레지스트 조성물 및 레지스트 패턴 형성 방법 | |
| JP2016081053A5 (enExample) |