JP2019530223A - 総直列抵抗が低減されたFinFET - Google Patents
総直列抵抗が低減されたFinFET Download PDFInfo
- Publication number
- JP2019530223A JP2019530223A JP2019513079A JP2019513079A JP2019530223A JP 2019530223 A JP2019530223 A JP 2019530223A JP 2019513079 A JP2019513079 A JP 2019513079A JP 2019513079 A JP2019513079 A JP 2019513079A JP 2019530223 A JP2019530223 A JP 2019530223A
- Authority
- JP
- Japan
- Prior art keywords
- type
- finfet device
- recess
- silicon
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 51
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 51
- 239000010703 silicon Substances 0.000 claims abstract description 51
- 229910000577 Silicon-germanium Inorganic materials 0.000 claims description 53
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 claims description 35
- 238000000151 deposition Methods 0.000 claims description 29
- 238000000034 method Methods 0.000 claims description 28
- 229910052698 phosphorus Inorganic materials 0.000 claims description 25
- 239000011574 phosphorus Substances 0.000 claims description 25
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 24
- 125000006850 spacer group Chemical group 0.000 claims description 21
- 229910052785 arsenic Inorganic materials 0.000 claims description 16
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 16
- 239000002019 doping agent Substances 0.000 claims description 13
- 238000005468 ion implantation Methods 0.000 claims description 12
- 238000000137 annealing Methods 0.000 claims description 8
- 238000005530 etching Methods 0.000 claims description 8
- 238000011065 in-situ storage Methods 0.000 claims description 7
- 238000002955 isolation Methods 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 238000001020 plasma etching Methods 0.000 claims 2
- 230000008021 deposition Effects 0.000 description 20
- 230000008569 process Effects 0.000 description 15
- 239000013078 crystal Substances 0.000 description 8
- 238000009792 diffusion process Methods 0.000 description 7
- 238000002513 implantation Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 229920005591 polysilicon Polymers 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 208000012868 Overgrowth Diseases 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- HAYXDMNJJFVXCI-UHFFFAOYSA-N arsenic(5+) Chemical compound [As+5] HAYXDMNJJFVXCI-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- -1 phosphorus ions Chemical class 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000003826 tablet Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/785—Field effect transistors with field effect produced by an insulated gate having a channel with a horizontal current flow in a vertical sidewall of a semiconductor body, e.g. FinFET, MuGFET
- H01L29/7851—Field effect transistors with field effect produced by an insulated gate having a channel with a horizontal current flow in a vertical sidewall of a semiconductor body, e.g. FinFET, MuGFET with the body tied to the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02524—Group 14 semiconducting materials
- H01L21/02532—Silicon, silicon germanium, germanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/0257—Doping during depositing
- H01L21/02573—Conductivity type
- H01L21/02576—N-type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02636—Selective deposition, e.g. simultaneous growth of mono- and non-monocrystalline semiconductor materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
- H01L21/26513—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors of electrically active species
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/08—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/0843—Source or drain regions of field-effect devices
- H01L29/0847—Source or drain regions of field-effect devices of field-effect transistors with insulated gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
- H01L29/161—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table including two or more of the elements provided for in group H01L29/16, e.g. alloys
- H01L29/165—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table including two or more of the elements provided for in group H01L29/16, e.g. alloys in different semiconductor regions, e.g. heterojunctions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
- H01L29/167—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table further characterised by the doping material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66787—Unipolar field-effect transistors with an insulated gate, i.e. MISFET with a gate at the side of the channel
- H01L29/66795—Unipolar field-effect transistors with an insulated gate, i.e. MISFET with a gate at the side of the channel with a horizontal current flow in a vertical sidewall of a semiconductor body, e.g. FinFET, MuGFET
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7842—Field effect transistors with field effect produced by an insulated gate means for exerting mechanical stress on the crystal lattice of the channel region, e.g. using a flexible substrate
- H01L29/7848—Field effect transistors with field effect produced by an insulated gate means for exerting mechanical stress on the crystal lattice of the channel region, e.g. using a flexible substrate the means being located in the source/drain region, e.g. SiGe source and drain
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/785—Field effect transistors with field effect produced by an insulated gate having a channel with a horizontal current flow in a vertical sidewall of a semiconductor body, e.g. FinFET, MuGFET
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- High Energy & Nuclear Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Thin Film Transistor (AREA)
Abstract
Description
本出願は、その全体が参照により本明細書に組み込まれている、2016年9月13日に出願した米国特許出願第15/264,519号の優先権を主張する。
105 バルクシリコン基板
110 シリコンフィン
115 ソース/ドレイン凹部
120 ゲート電極
125 スペーサ
130 スペーサ
140 シャロートレンチ分離領域
160 埋込み酸化物層
200 第1のエピタキシャルアンドープシリコンバッファ層
205 アンドープエピタキシャルシリコンゲルマニウム(SiGe)層
210 エピタキシャルシリコンキャップ層
300 ヒ素射影飛程
305 リン射影飛程
400 n型FinFETデバイス
600 デバイス
605 システムオンチップ(SoC)
610 周辺デバイス
615 システムバス
620 メモリ
625 ディスプレイコントローラ
630 ビデオプロセッサ
635 ディスプレイ
Claims (27)
- スペーサを有するゲートと、
前記スペーサに隣接する凹部を有するシリコンフィンと、
前記凹部内のn型ドープシリコンゲルマニウム層と、
前記n型ドープシリコンゲルマニウム層を覆うn型ドープシリコンキャップ層とを備える、n型FinFETデバイス。 - 前記凹部が、前記スペーサの側方縁部と位置合わせされた側方縁部を有する、請求項1に記載のn型FinFETデバイス。
- 前記凹部が、前記スペーサの側方縁部をアンダーカットする側方縁部を有する、請求項1に記載のn型FinFETデバイス。
- 前記シリコンフィンに隣接するシャロートレンチ分離領域をさらに備える、請求項1に記載のn型FinFETデバイス。
- 前記シリコンフィンの下に埋込み酸化物領域をさらに備える、請求項1に記載のn型FinFETデバイス。
- 前記凹部にライニングするシリコンバッファ層をさらに備え、前記n型ドープシリコンゲルマニウム層が、前記シリコンバッファ層と前記n型ドープシリコンキャップ層との間にある、請求項1に記載のn型FinFETデバイス。
- 前記シリコンバッファ層、前記n型ドープシリコンゲルマニウム層、および前記n型ドープシリコンキャップ層がすべて、選択的エピタキシャル成長層である、請求項6に記載のn型FinFETデバイス。
- 前記n型ドープシリコンキャップ層がヒ素およびリンでドープされ、前記n型ドープシリコンゲルマニウム層がリンでドープされる、請求項6に記載のn型FinFETデバイス。
- 前記n型ドープシリコンゲルマニウム層内の前記リンドーピングが、前記n型ドープシリコンゲルマニウム層と前記n型ドープシリコンキャップ層との間の接触面に隣接する前記n型ドープシリコンゲルマニウム層内でピークに達する射影飛程を有するイオン注入である、請求項8に記載のn型FinFETデバイス。
- 前記n型ドープシリコンキャップ層内の前記ヒ素ドーピングが、前記n型ドープシリコンキャップ層内でピークに達する射影飛程を有するイオン注入である、請求項8に記載のn型FinFETデバイス。
- 前記n型ドープシリコンキャップ層内の前記リンドーピングが、in-situリンドーピングである、請求項8に記載のn型FinFETデバイス。
- 前記凹部が丸形の底部を有する、請求項1に記載のn型FinFETデバイス。
- 前記n型ドープシリコンキャップ層に対するn型ドーパント濃度が、前記n型ドープシリコンゲルマニウム層に対するn型ドーパントの濃度より大きい、請求項1に記載のn型FinFETデバイス。
- 前記n型FinFETデバイスが、携帯電話、スマートフォン、携帯情報端末、タブレットコンピュータ、ラップトップコンピュータ、デジタルカメラ、および携帯ゲームデバイスからなる群から選択されたデバイスに含まれる、請求項1に記載のn型FinFETデバイス。
- FinFETデバイスを製造する方法であって、
ゲートスペーサに隣接するn型FinFETデバイスに対してシリコンフィン内で凹部をエッチングするステップと、
前記凹部にライニングするためにシリコンバッファ層をエピタキシャル堆積させるステップと、
前記凹部内の前記シリコンバッファ層の上にシリコンゲルマニウム層をエピタキシャル堆積させるステップと、
前記シリコンゲルマニウム層の上にシリコンキャップ層をエピタキシャル堆積させるステップとを含む、方法。 - 前記シリコンキャップ層をエピタキシャル堆積させるステップが、n型ドーパントで前記シリコンキャップ層をin-situドーピングするステップをさらに含む、請求項15に記載の方法。
- 前記n型ドーパントがリンである、請求項16に記載の方法。
- 前記シリコンゲルマニウム層をエピタキシャル堆積させるステップが、前記シリコンゲルマニウム層のin-situドーピングを含まない、請求項15に記載の方法。
- 前記凹部をエッチングするステップが、前記ゲートスペーサの側方縁部と位置合わせされた側方縁部を有するように前記凹部を異方的にエッチングする反応性イオンエッチングである、請求項15に記載の方法。
- 前記凹部をエッチングするステップが、前記ゲートスペーサの側方縁部をアンダーカットする側方縁部を有するように前記凹部を等方的にエッチングするウェットエッチングである、請求項15に記載の方法。
- 前記シリコンキャップ層にヒ素をイオン注入するステップと、
前記シリコンゲルマニウム層にリンをイオン注入するステップとをさらに含む、請求項15に記載の方法。 - 前記イオン注入に続いて前記シリコンキャップ層および前記シリコンゲルマニウム層をアニーリングするステップをさらに含む、請求項21に記載の方法。
- スペーサを有するゲートと、
前記スペーサに隣接する凹部を有するシリコンフィンと、
前記n型FinFETデバイスに対する総直列抵抗および接触抵抗を低減するために前記凹部を充填するヘテロ構造手段とを備え、前記ヘテロ構造手段がn型ドープシリコンゲルマニウム層を含む、n型FinFETデバイス。 - 前記凹部が、前記スペーサの側方縁部と位置合わせされた側方縁部を有する、請求項23に記載のn型FinFETデバイス。
- 前記凹部が、前記スペーサの側方縁部をアンダーカットする側方縁部を有する、請求項23に記載のn型FinFETデバイス。
- 前記シリコンフィンに隣接するシャロートレンチ分離領域をさらに備える、請求項23に記載のn型FinFETデバイス。
- 前記シリコンフィンの下に埋込み酸化物領域をさらに備える、請求項23に記載のn型FinFETデバイス。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15/264,519 | 2016-09-13 | ||
US15/264,519 US10304957B2 (en) | 2016-09-13 | 2016-09-13 | FinFET with reduced series total resistance |
PCT/US2017/045972 WO2018052578A1 (en) | 2016-09-13 | 2017-08-08 | Finfet with reduced series total resistance |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2019530223A true JP2019530223A (ja) | 2019-10-17 |
JP2019530223A5 JP2019530223A5 (ja) | 2020-08-27 |
JP7041126B2 JP7041126B2 (ja) | 2022-03-23 |
Family
ID=59631888
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019513079A Active JP7041126B2 (ja) | 2016-09-13 | 2017-08-08 | 総直列抵抗が低減されたFinFET |
Country Status (9)
Country | Link |
---|---|
US (1) | US10304957B2 (ja) |
EP (1) | EP3513436A1 (ja) |
JP (1) | JP7041126B2 (ja) |
KR (1) | KR102541383B1 (ja) |
CN (1) | CN109690787A (ja) |
BR (1) | BR112019004441B1 (ja) |
CA (1) | CA3032959A1 (ja) |
TW (1) | TWI737787B (ja) |
WO (1) | WO2018052578A1 (ja) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10658510B2 (en) * | 2018-06-27 | 2020-05-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Source/drain structure |
US11309404B2 (en) | 2018-07-05 | 2022-04-19 | Applied Materials, Inc. | Integrated CMOS source drain formation with advanced control |
US10867861B2 (en) * | 2018-09-28 | 2020-12-15 | Taiwan Semiconductor Manufacturing Company, Ltd. | Fin field-effect transistor device and method of forming the same |
US11177346B2 (en) | 2019-01-07 | 2021-11-16 | Samsung Electronics Co., Ltd. | Semiconductor device |
US11222980B2 (en) * | 2019-07-18 | 2022-01-11 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method of manufacturing a semiconductor device and a semiconductor device |
US10978344B2 (en) * | 2019-08-23 | 2021-04-13 | Taiwan Semiconductor Manufacturing Company, Ltd. | Melting laser anneal of epitaxy regions |
US11955482B2 (en) * | 2020-05-18 | 2024-04-09 | Intel Corporation | Source or drain structures with high phosphorous dopant concentration |
US11935793B2 (en) * | 2020-05-29 | 2024-03-19 | Taiwan Semiconductor Manufacturing Co., Ltd. | Dual dopant source/drain regions and methods of forming same |
US20220051945A1 (en) * | 2020-08-13 | 2022-02-17 | Taiwan Semiconductor Manufacturing Co., Ltd. | Embedded Stressors in Epitaxy Source/Drain Regions |
US11482594B2 (en) | 2020-08-27 | 2022-10-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor devices with backside power rail and method thereof |
CN114256323A (zh) * | 2020-09-21 | 2022-03-29 | 联华电子股份有限公司 | 高电压晶体管结构及其制造方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005101278A (ja) * | 2003-09-25 | 2005-04-14 | Matsushita Electric Ind Co Ltd | 半導体装置およびその製造方法 |
JP2009517867A (ja) * | 2005-12-27 | 2009-04-30 | インテル・コーポレーション | リセスのあるストレイン領域を有すマルチゲートデバイス |
JP2011103450A (ja) * | 2009-10-01 | 2011-05-26 | Taiwan Semiconductor Manufacturing Co Ltd | Finfetsおよびその形成方法 |
US20110287600A1 (en) * | 2010-05-20 | 2011-11-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Selective Etching in the Formation of Epitaxy Regions in MOS Devices |
US20130020612A1 (en) * | 2011-07-22 | 2013-01-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Re-growing Source/Drain Regions from Un-Relaxed Silicon Layer |
US20140349467A1 (en) * | 2013-05-27 | 2014-11-27 | United Microelectronics Corp. | Semiconductor process |
JP2017011272A (ja) * | 2015-06-22 | 2017-01-12 | グローバルファウンドリーズ・インコーポレイテッド | finFET構造を形成する方法、半導体基板とfinFETトランジスタを提供する方法、およびfinFETトランジスタ |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102005041225B3 (de) * | 2005-08-31 | 2007-04-26 | Advanced Micro Devices, Inc., Sunnyvale | Verfahren zur Herstellung vertiefter verformter Drain/Source-Gebiete in NMOS- und PMOS-Transistoren |
US7608515B2 (en) | 2006-02-14 | 2009-10-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | Diffusion layer for stressed semiconductor devices |
KR100809327B1 (ko) * | 2006-08-10 | 2008-03-05 | 삼성전자주식회사 | 반도체 소자 및 그 제조방법 |
JP5100137B2 (ja) * | 2007-01-26 | 2012-12-19 | 株式会社東芝 | 半導体装置の製造方法および半導体装置 |
CN101106079A (zh) * | 2007-04-26 | 2008-01-16 | 河北普兴电子科技股份有限公司 | 硅锗材料的一种生长方法 |
US7939889B2 (en) | 2007-10-16 | 2011-05-10 | Taiwan Semiconductor Manufacturing Company, Ltd. | Reducing resistance in source and drain regions of FinFETs |
US20090152590A1 (en) | 2007-12-13 | 2009-06-18 | International Business Machines Corporation | Method and structure for semiconductor devices with silicon-germanium deposits |
US8338259B2 (en) * | 2010-03-30 | 2012-12-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device with a buried stressor |
JP5614184B2 (ja) | 2010-09-06 | 2014-10-29 | 富士通セミコンダクター株式会社 | 半導体装置の製造方法 |
DE102011076696B4 (de) | 2011-05-30 | 2013-02-07 | Globalfoundries Inc. | Verfahren zur Leistungssteigerung in Transistoren durch Vorsehen eines eingebetteten verformungsinduzierenden Halbleitermaterials auf der Grundlage einer Saatschicht und entsprechendes Halbleiterbauelement |
US8735993B2 (en) | 2012-01-31 | 2014-05-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | FinFET body contact and method of making same |
US8785285B2 (en) | 2012-03-08 | 2014-07-22 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor devices and methods of manufacture thereof |
US9685509B2 (en) | 2013-07-30 | 2017-06-20 | Samsung Electronics Co., Ltd. | Finfet devices including high mobility channel materials with materials of graded composition in recessed source/drain regions |
US9263583B2 (en) * | 2013-10-14 | 2016-02-16 | Globalfoundries Inc. | Integrated finFET-BJT replacement metal gate |
US9312364B2 (en) | 2014-05-27 | 2016-04-12 | International Business Machines Corporation | finFET with dielectric isolation after gate module for improved source and drain region epitaxial growth |
US10263108B2 (en) | 2014-08-22 | 2019-04-16 | Taiwan Semiconductor Manufacturing Company, Ltd. | Metal-insensitive epitaxy formation |
US9318608B1 (en) * | 2014-09-29 | 2016-04-19 | Globalfoundries Inc. | Uniform junction formation in FinFETs |
US9343300B1 (en) * | 2015-04-15 | 2016-05-17 | Globalfoundries Inc. | Methods of forming source/drain regions for a PMOS transistor device with a germanium-containing channel region |
-
2016
- 2016-09-13 US US15/264,519 patent/US10304957B2/en active Active
-
2017
- 2017-08-08 CN CN201780055712.5A patent/CN109690787A/zh active Pending
- 2017-08-08 JP JP2019513079A patent/JP7041126B2/ja active Active
- 2017-08-08 EP EP17752552.4A patent/EP3513436A1/en active Pending
- 2017-08-08 WO PCT/US2017/045972 patent/WO2018052578A1/en active Search and Examination
- 2017-08-08 CA CA3032959A patent/CA3032959A1/en active Pending
- 2017-08-08 BR BR112019004441-8A patent/BR112019004441B1/pt active IP Right Grant
- 2017-08-08 KR KR1020197006823A patent/KR102541383B1/ko active IP Right Grant
- 2017-08-10 TW TW106127104A patent/TWI737787B/zh active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005101278A (ja) * | 2003-09-25 | 2005-04-14 | Matsushita Electric Ind Co Ltd | 半導体装置およびその製造方法 |
JP2009517867A (ja) * | 2005-12-27 | 2009-04-30 | インテル・コーポレーション | リセスのあるストレイン領域を有すマルチゲートデバイス |
JP2011103450A (ja) * | 2009-10-01 | 2011-05-26 | Taiwan Semiconductor Manufacturing Co Ltd | Finfetsおよびその形成方法 |
US20110287600A1 (en) * | 2010-05-20 | 2011-11-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Selective Etching in the Formation of Epitaxy Regions in MOS Devices |
US20130020612A1 (en) * | 2011-07-22 | 2013-01-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Re-growing Source/Drain Regions from Un-Relaxed Silicon Layer |
US20140349467A1 (en) * | 2013-05-27 | 2014-11-27 | United Microelectronics Corp. | Semiconductor process |
JP2017011272A (ja) * | 2015-06-22 | 2017-01-12 | グローバルファウンドリーズ・インコーポレイテッド | finFET構造を形成する方法、半導体基板とfinFETトランジスタを提供する方法、およびfinFETトランジスタ |
Also Published As
Publication number | Publication date |
---|---|
KR20190046846A (ko) | 2019-05-07 |
BR112019004441A2 (pt) | 2019-05-28 |
TWI737787B (zh) | 2021-09-01 |
EP3513436A1 (en) | 2019-07-24 |
TW201824541A (zh) | 2018-07-01 |
CA3032959A1 (en) | 2018-03-22 |
CN109690787A (zh) | 2019-04-26 |
JP7041126B2 (ja) | 2022-03-23 |
BR112019004441B1 (pt) | 2023-04-04 |
KR102541383B1 (ko) | 2023-06-08 |
WO2018052578A1 (en) | 2018-03-22 |
US20180076326A1 (en) | 2018-03-15 |
US10304957B2 (en) | 2019-05-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7041126B2 (ja) | 総直列抵抗が低減されたFinFET | |
US10164030B2 (en) | Semiconductor device and method of fabricating the same | |
US9825135B2 (en) | Semiconductor devices and methods for manufacturing the same | |
US9892912B2 (en) | Method of manufacturing stacked nanowire MOS transistor | |
US8415210B2 (en) | Field effect transistor and method for manufacturing the same | |
US11101369B2 (en) | FinFET device with controlled channel stop layer depth | |
TW201637081A (zh) | 在鰭式場效電晶體中形成擊穿中止區域的方法 | |
JP2019521513A (ja) | ラップアラウンドコンタクトを形成する方法および半導体デバイス | |
US20160087062A1 (en) | Semiconductor devices and methods for manufacturing the same | |
KR20130014041A (ko) | 치환 소스/드레인 finfet 제조 | |
US20140187011A1 (en) | Methods for Forming FinFETs with Self-Aligned Source/Drain | |
WO2014110852A1 (zh) | 半导体器件及其制造方法 | |
JP2009523326A (ja) | ゲートの頂部が拡張された半導体トランジスタ | |
US9673324B1 (en) | MOS device with epitaxial structure associated with source/drain region and method of forming the same | |
JP2008263162A (ja) | 半導体素子及びその製造方法 | |
US10290724B2 (en) | FinFET devices having a material formed on reduced source/drain region | |
KR20160054943A (ko) | 게이트 전극을 갖는 반도체 소자 형성 방법 | |
KR20080011511A (ko) | 다중 채널 모스 트랜지스터를 포함하는 반도체 장치의 제조방법 | |
CN105826374B (zh) | P型鳍式场效应晶体管及其形成方法 | |
CN110970300B (zh) | 堆叠环栅鳍式场效应管及其形成方法 | |
US20240178320A1 (en) | Semiconductor transistor with precise geometries and related manufacture method thereof | |
KR20080011488A (ko) | 다중 채널 모스 트랜지스터를 포함하는 반도체 장치의 제조방법 | |
TW202335292A (zh) | 電晶體結構 | |
CN106935490B (zh) | 一种半导体器件及其制备方法、电子装置 | |
TW202332061A (zh) | 電晶體結構 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20190314 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20200720 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20200720 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20210531 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20210607 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20210907 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20211207 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20220214 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20220310 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7041126 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |