JP2019526053A5 - - Google Patents

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JP2019526053A5
JP2019526053A5 JP2019504839A JP2019504839A JP2019526053A5 JP 2019526053 A5 JP2019526053 A5 JP 2019526053A5 JP 2019504839 A JP2019504839 A JP 2019504839A JP 2019504839 A JP2019504839 A JP 2019504839A JP 2019526053 A5 JP2019526053 A5 JP 2019526053A5
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Japan
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path
irradiation
measurement system
images
light sources
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JP2019504839A
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Japanese (ja)
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JP2019526053A (ja
JP6771647B2 (ja
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Priority claimed from US15/222,503 external-priority patent/US10048132B2/en
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JP2019504839A 2016-07-28 2017-07-28 複数の目標からのオーバレイ信号の同時取得 Active JP6771647B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/222,503 US10048132B2 (en) 2016-07-28 2016-07-28 Simultaneous capturing of overlay signals from multiple targets
US15/222,503 2016-07-28
PCT/US2017/044528 WO2018023078A1 (en) 2016-07-28 2017-07-28 Simultaneous capturing of overlay signals from multiple targets

Publications (3)

Publication Number Publication Date
JP2019526053A JP2019526053A (ja) 2019-09-12
JP2019526053A5 true JP2019526053A5 (enExample) 2020-09-10
JP6771647B2 JP6771647B2 (ja) 2020-10-21

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JP2019504839A Active JP6771647B2 (ja) 2016-07-28 2017-07-28 複数の目標からのオーバレイ信号の同時取得

Country Status (7)

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US (2) US10048132B2 (enExample)
JP (1) JP6771647B2 (enExample)
KR (1) KR102180433B1 (enExample)
CN (2) CN109564160B (enExample)
SG (2) SG11201900509YA (enExample)
TW (1) TWI728157B (enExample)
WO (1) WO2018023078A1 (enExample)

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US11360399B2 (en) 2018-09-19 2022-06-14 Asml Netherlands B.V. Metrology sensor for position metrology
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US11073768B2 (en) 2019-06-26 2021-07-27 Kla Corporation Metrology target for scanning metrology
US11359916B2 (en) * 2019-09-09 2022-06-14 Kla Corporation Darkfield imaging of grating target structures for overlay measurement
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US11640118B2 (en) 2020-08-17 2023-05-02 Tokyo Electron Limited Method of pattern alignment for field stitching
US11428642B2 (en) * 2021-01-04 2022-08-30 Kla Corporation Scanning scatterometry overlay measurement
US20220357674A1 (en) * 2021-05-04 2022-11-10 Kla Corporation Oblique illumination for overlay metrology
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WO2024033035A1 (en) * 2022-08-10 2024-02-15 Asml Netherlands B.V. Metrology method and associated metrology device
KR20240108945A (ko) 2023-01-03 2024-07-10 삼성전자주식회사 기판 검사 장치 및 기판 검사 방법
US12411420B2 (en) * 2023-09-29 2025-09-09 Kla Corporation Small in-die target design for overlay measurement
US20250306477A1 (en) * 2024-03-27 2025-10-02 Kla Corporation Single grab pupil landscape via outside the objective lens broadband illumination

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