JP2019512729A - ワイヤグリッド偏光板製造方法 - Google Patents
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- 238000004519 manufacturing process Methods 0.000 title abstract description 17
- 239000000758 substrate Substances 0.000 claims abstract description 76
- 238000000034 method Methods 0.000 claims abstract description 32
- 230000003287 optical effect Effects 0.000 claims abstract description 31
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 23
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 18
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 18
- 239000006117 anti-reflective coating Substances 0.000 claims abstract description 18
- 238000000151 deposition Methods 0.000 claims abstract description 15
- 238000003384 imaging method Methods 0.000 claims abstract description 10
- 239000010410 layer Substances 0.000 claims description 39
- 239000000463 material Substances 0.000 claims description 10
- 238000000059 patterning Methods 0.000 claims description 9
- 238000005286 illumination Methods 0.000 claims description 8
- 230000005855 radiation Effects 0.000 claims description 7
- 238000009826 distribution Methods 0.000 claims description 5
- 230000007423 decrease Effects 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 2
- 239000005350 fused silica glass Substances 0.000 claims description 2
- 230000005499 meniscus Effects 0.000 claims description 2
- 229910001634 calcium fluoride Inorganic materials 0.000 claims 1
- 239000011248 coating agent Substances 0.000 abstract description 5
- 238000000576 coating method Methods 0.000 abstract description 5
- 238000000025 interference lithography Methods 0.000 abstract description 3
- 238000005530 etching Methods 0.000 description 9
- 239000011521 glass Substances 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 210000002858 crystal cell Anatomy 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
- G02F1/133548—Wire-grid polarisers
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- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Polarising Elements (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Description
[0002] 液晶ディスプレイ(LCD)は、交差した偏光板の間に挟まれた液晶の光変調特性を利用して、画像を表示するディスプレイである。LCDは、限定するものではないが、高精細度テレビ、コンピュータモニタ、及びモバイル装置などを含む広範囲にわたる応用で利用されている。典型的なLCDでは、液晶セルは互いに直交するように配向された2つのリニア偏光板の間で整列される。
Claims (15)
- フラットパネルディスプレイをパターン形成するためのシステムであって、
レーザーゲージと、
レーザーゲージミラーと、
複数のハーフDyson光学系とを備え、前記ハーフDyson光学系の各々は、
一次ミラーと、
正レンズと、
レチクルと
を備えるシステム。 - 前記正レンズは、溶融石英又はフッ化カルシウムを含む、請求項1に記載のシステム。
- メニスカスレンズと、
基板ステージと
を更に備える、請求項1に記載のシステム。 - 更にブリッジを備え、前記ブリッジは、前記基板ステージの上方に離間されており、その上に配置された複数のハーフDyson光学系を有する、請求項3に記載のシステム。
- 前記一次ミラーは、中心に、照射ビームへのアクセスを提供するための開口部を有し、前記照射ビームはコリメートされた光で対物回折格子を照射し、いかなるゼロ次回折も除去する手段を提供する、請求項1に記載のシステム。
- 一次ミラーは、対物面の回折格子からの±1次回折を反射する、請求項1に記載のシステム。
- アルミニウム被覆基板の上に底部反射防止被覆層を堆積することと、
前記底部反射防止被覆層の上にフォトレジスト層を堆積することと、
前記基板上に位相マスク回折格子を結像することによって、前記基板をパターン形成することとを含む方法であって、前記基板のパターン形成は、
レーザー照射ビームを一次ミラーの開口部を通して、前記位相マスク回折格子を含むレチクルへ向けることと、
前記レーザー照射ビームを前記レチクルから前記一次ミラーのエッジ近傍の対向領域に回折させることと、
前記基板上に±1次の回折を結像すること
を含む方法。 - 前記底部反射防止被覆層は前記アルミニウム被覆基板の上に堆積されて、前記アルミニウム被覆基板に接触し、前記フォトレジスト層は前記底部反射防止被覆層の上に堆積されて、前記底部反射防止被覆層に接触する、請求項7に記載の方法。
- 前記底部反射防止被覆層は、355nm光を吸収し、400nm以上の光に対して透明な材料を含む、請求項7に記載の方法。
- 前記フォトレジスト層を現像することを更に含む、請求項7に記載の方法。
- 前記基板の上方でアルミニウムエッチングを実施することを更に含む、請求項7に記載の方法。
- 中心線と、
各回折格子ラインが前記中心線からある距離だけ離れている複数の回折格子ラインと
を含む回折格子ラインパターンであって、前記中心線からの距離が前記中心線からある距離離れた点まで増大するにつれて、前記複数の回折格子ラインの各々の高さは増大する、回折格子ラインパターン。 - 前記中心線に近い回折格子ラインの高さは、前記中心線から遠い回折格子ラインの高さを下回る、請求項12に記載の回折格子ラインパターン。
- 前記回折格子ラインの高さは、ガウス分布形状のレーザー照射ビームの強度に逆比例し、前記回折格子ラインの高さは、レーザー照射ビームの露光時間に比例する、請求項13に記載の回折格子ラインパターン。
- 前記中心線から前記ある距離離れた前記点を超えると、前記中心線から遠い前記回折格子ラインの高さは0mmまで漸減する、請求項12に記載の回折格子ラインパターン。
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US62/401,451 | 2016-09-29 | ||
PCT/US2017/017319 WO2017151291A1 (en) | 2016-03-04 | 2017-02-10 | Wire grid polarizer manufacturing method |
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WO2018212943A1 (en) | 2017-05-16 | 2018-11-22 | Applied Materials, Inc. | Wire grid polarizer manufacturing methods using frequency doubling interference lithography |
CN107219723B (zh) * | 2017-08-02 | 2021-01-22 | 京东方科技集团股份有限公司 | 一种金属光栅的制作方法、金属光栅及显示装置 |
US11036145B2 (en) * | 2018-12-21 | 2021-06-15 | Applied Materials, Inc. | Large area self imaging lithography based on broadband light source |
CN112965288B (zh) * | 2021-02-02 | 2022-04-26 | 深圳市华星光电半导体显示技术有限公司 | 内置偏光片的制备方法及偏光片 |
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WO2017151291A1 (en) | 2017-09-08 |
US10983389B2 (en) | 2021-04-20 |
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