JP2019502635A5 - - Google Patents
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- Publication number
- JP2019502635A5 JP2019502635A5 JP2018530539A JP2018530539A JP2019502635A5 JP 2019502635 A5 JP2019502635 A5 JP 2019502635A5 JP 2018530539 A JP2018530539 A JP 2018530539A JP 2018530539 A JP2018530539 A JP 2018530539A JP 2019502635 A5 JP2019502635 A5 JP 2019502635A5
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- melting
- treatment
- furnace
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000008018 melting Effects 0.000 description 10
- 238000002844 melting Methods 0.000 description 10
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- 239000012498 ultrapure water Substances 0.000 description 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000005049 silicon tetrachloride Substances 0.000 description 2
- XMSXQFUHVRWGNA-UHFFFAOYSA-N Decamethylcyclopentasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 XMSXQFUHVRWGNA-UHFFFAOYSA-N 0.000 description 1
- 241000282326 Felis catus Species 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229960000583 acetic acid Drugs 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- VEVRNHHLCPGNDU-MUGJNUQGSA-O desmosine Chemical compound OC(=O)[C@@H](N)CCCC[N+]1=CC(CC[C@H](N)C(O)=O)=C(CCC[C@H](N)C(O)=O)C(CC[C@H](N)C(O)=O)=C1 VEVRNHHLCPGNDU-MUGJNUQGSA-O 0.000 description 1
- 239000012362 glacial acetic acid Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000000156 glass melt Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- HTDJPCNNEPUOOQ-UHFFFAOYSA-N hexamethylcyclotrisiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1 HTDJPCNNEPUOOQ-UHFFFAOYSA-N 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000012488 sample solution Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP15201089.8 | 2015-12-18 | ||
| EP15201089 | 2015-12-18 | ||
| PCT/EP2016/081506 WO2017103156A2 (de) | 2015-12-18 | 2016-12-16 | Herstellung von quarzglaskörpern aus siliziumdioxidpulver |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019502635A JP2019502635A (ja) | 2019-01-31 |
| JP2019502635A5 true JP2019502635A5 (enExample) | 2020-01-30 |
| JP6927642B2 JP6927642B2 (ja) | 2021-09-01 |
Family
ID=54850377
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018530539A Active JP6927642B2 (ja) | 2015-12-18 | 2016-12-16 | 二酸化ケイ素粉末からの石英ガラス体の調製 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20190152827A1 (enExample) |
| EP (1) | EP3390295B1 (enExample) |
| JP (1) | JP6927642B2 (enExample) |
| KR (1) | KR20180095878A (enExample) |
| CN (1) | CN108779015B (enExample) |
| TW (1) | TWI728018B (enExample) |
| WO (1) | WO2017103156A2 (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017103131A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Verringern des erdalkalimetallgehalts von siliziumdioxidgranulat durch behandlung von kohlenstoffdotiertem siliziumdioxidgranulat bei hoher temperatur |
| CN109153593A (zh) | 2015-12-18 | 2019-01-04 | 贺利氏石英玻璃有限两合公司 | 合成石英玻璃粉粒的制备 |
| KR20180095619A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 실리카 유리 제조 동안 규소 함량의 증가 |
| WO2017103153A1 (de) * | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt |
| CN108698883A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 石英玻璃制备中的二氧化硅的喷雾造粒 |
| CN108698894A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在多腔式烘箱中制备石英玻璃体 |
| EP3390303B1 (de) | 2015-12-18 | 2024-02-07 | Heraeus Quarzglas GmbH & Co. KG | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
| KR20180094087A (ko) | 2015-12-18 | 2018-08-22 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 실리카 과립으로부터 실리카 유리 제품의 제조 |
| JP6940235B2 (ja) | 2015-12-18 | 2021-09-22 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 高融点金属の溶融坩堝内での石英ガラス体の調製 |
| TWI733723B (zh) | 2015-12-18 | 2021-07-21 | 德商何瑞斯廓格拉斯公司 | 不透明石英玻璃體的製備 |
| TWI667084B (zh) * | 2018-07-11 | 2019-08-01 | 成亞資源科技股份有限公司 | Waste copper dioxide regeneration method for waste packaging materials |
| DE112018008204T5 (de) * | 2018-12-14 | 2021-09-09 | Tosoh Quartz Corporation | Verfahren zum Herstellen eines opaken Quarzglases |
| JP7324931B2 (ja) * | 2019-07-24 | 2023-08-10 | ヘレーウス クヴァルツグラース ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフト | 二酸化ケイ素懸濁液の調製方法 |
| US11339077B2 (en) * | 2019-10-30 | 2022-05-24 | Owens-Brockway Glass Container Inc. | Fining glass using high temperature and low pressure |
| EP4030204B1 (de) * | 2021-01-19 | 2023-09-20 | Heraeus Quarzglas GmbH & Co. KG | Mikrostrukturierte optische faser und vorform dafür |
| KR102789380B1 (ko) * | 2021-01-21 | 2025-03-31 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 석영 유리체 |
| CN115321810B (zh) * | 2022-08-19 | 2023-09-19 | 北京科技大学 | 一种玻璃光纤制备方法 |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60260434A (ja) * | 1984-06-04 | 1985-12-23 | Shin Etsu Chem Co Ltd | 光伝送用無水ガラス素材の製造方法 |
| US5240488A (en) * | 1992-08-14 | 1993-08-31 | At&T Bell Laboratories | Manufacture of vitreous silica product via a sol-gel process using a polymer additive |
| US6136736A (en) * | 1993-06-01 | 2000-10-24 | General Electric Company | Doped silica glass |
| JP3751326B2 (ja) * | 1994-10-14 | 2006-03-01 | 三菱レイヨン株式会社 | 高純度透明石英ガラスの製造方法 |
| DE19962449C2 (de) * | 1999-12-22 | 2003-09-25 | Heraeus Quarzglas | Quarzglastiegel und Verfahren für seine Herstellung |
| JP2001220157A (ja) * | 2000-02-01 | 2001-08-14 | Tosoh Corp | 非晶質合成シリカ粉体及びこれを用いたガラス成形体 |
| JP2001220126A (ja) * | 2000-02-01 | 2001-08-14 | Tosoh Corp | 結晶質合成シリカ粉体及びこれを用いたガラス成形体 |
| DE10019693B4 (de) * | 2000-04-20 | 2006-01-19 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Bauteils aus opakem, synthetischen Quarzglas, nach dem Verfahren hergestelltes Quarzglasrohr, sowie Verwendung desselben |
| JP2003192331A (ja) * | 2001-12-26 | 2003-07-09 | Shin Etsu Chem Co Ltd | 親水性シリカ微粉末及びその製造方法 |
| US20040118155A1 (en) * | 2002-12-20 | 2004-06-24 | Brown John T | Method of making ultra-dry, Cl-free and F-doped high purity fused silica |
| DE10329806A1 (de) * | 2003-04-09 | 2004-10-21 | Silicaglas Ilmenau Gmbh | Verfahren und Vorrichtungen zur Herstellung von Kieselglasgranulaten mit definierten Formen der Granalien |
| DE102004006017B4 (de) * | 2003-12-08 | 2006-08-03 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von laseraktivem Quarzglas und Verwendung desselben |
| JP4470479B2 (ja) * | 2003-12-17 | 2010-06-02 | 旭硝子株式会社 | 光学部材用合成石英ガラスおよびその製造方法 |
| DE102004038602B3 (de) * | 2004-08-07 | 2005-12-29 | Heraeus Quarzglas Gmbh & Co. Kg | Elektrogeschmolzenes, synthetisches Quarzglas, insbesondere für den Einsatz in der Lampen- und in der Halbleiterfertigung und Verfahren zur Herstellung desselben |
| US7166963B2 (en) * | 2004-09-10 | 2007-01-23 | Axcelis Technologies, Inc. | Electrodeless lamp for emitting ultraviolet and/or vacuum ultraviolet radiation |
| EP1700828A1 (en) * | 2005-03-09 | 2006-09-13 | Degussa AG | Method for producing ultra-high purity, optical quality, glass articles |
| EP1717202A1 (en) * | 2005-04-29 | 2006-11-02 | Degussa AG | Sintered silicon dioxide materials |
| EP2014622B1 (de) * | 2007-07-06 | 2017-01-18 | Evonik Degussa GmbH | Verfahren zur Herstellung eines Kieselglasgranulats |
| JPWO2009096557A1 (ja) * | 2008-01-30 | 2011-05-26 | 旭硝子株式会社 | エネルギー伝送用または紫外光伝送用光ファイバプリフォームおよびその製造方法 |
| EP2522627A4 (en) * | 2010-01-07 | 2014-03-26 | Mitsubishi Materials Corp | SYNTHETIC AMORPHOUS SILICA POWDER |
| DE102010008162B4 (de) * | 2010-02-16 | 2017-03-16 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung von Quarzglas für einen Quarzglastiegel |
| GB201011582D0 (en) * | 2010-07-09 | 2010-08-25 | Heraeus Quartz Uk Ltd | High purity synthetic silica and items such as semiconductor jigs manufactured therefrom |
| DE102012008437B3 (de) * | 2012-04-30 | 2013-03-28 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung synthetischer Quarzglaskörnung |
| EP3000790B2 (de) * | 2014-09-29 | 2023-07-26 | Heraeus Quarzglas GmbH & Co. KG | Verfahren für die Herstellung von Bauteilen aus synthetischem Quarzglas aus SiO2-Granulat |
-
2016
- 2016-12-16 CN CN201680082068.6A patent/CN108779015B/zh active Active
- 2016-12-16 TW TW105141904A patent/TWI728018B/zh active
- 2016-12-16 JP JP2018530539A patent/JP6927642B2/ja active Active
- 2016-12-16 KR KR1020187020256A patent/KR20180095878A/ko not_active Withdrawn
- 2016-12-16 WO PCT/EP2016/081506 patent/WO2017103156A2/de not_active Ceased
- 2016-12-16 US US16/061,451 patent/US20190152827A1/en not_active Abandoned
- 2016-12-16 EP EP16809879.6A patent/EP3390295B1/de active Active
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