JP2019502632A5 - - Google Patents
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- Publication number
- JP2019502632A5 JP2019502632A5 JP2018530535A JP2018530535A JP2019502632A5 JP 2019502632 A5 JP2019502632 A5 JP 2019502632A5 JP 2018530535 A JP2018530535 A JP 2018530535A JP 2018530535 A JP2018530535 A JP 2018530535A JP 2019502632 A5 JP2019502632 A5 JP 2019502632A5
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- melting
- furnace
- treatment
- octamethylcyclotetrasiloxane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000008018 melting Effects 0.000 description 10
- 238000002844 melting Methods 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000005049 silicon tetrachloride Substances 0.000 description 2
- XMSXQFUHVRWGNA-UHFFFAOYSA-N Decamethylcyclopentasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 XMSXQFUHVRWGNA-UHFFFAOYSA-N 0.000 description 1
- 241000282326 Felis catus Species 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- VEVRNHHLCPGNDU-MUGJNUQGSA-O desmosine Chemical compound OC(=O)[C@@H](N)CCCC[N+]1=CC(CC[C@H](N)C(O)=O)=C(CCC[C@H](N)C(O)=O)C(CC[C@H](N)C(O)=O)=C1 VEVRNHHLCPGNDU-MUGJNUQGSA-O 0.000 description 1
- 239000000156 glass melt Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- HTDJPCNNEPUOOQ-UHFFFAOYSA-N hexamethylcyclotrisiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1 HTDJPCNNEPUOOQ-UHFFFAOYSA-N 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP15201095.5 | 2015-12-18 | ||
| EP15201095 | 2015-12-18 | ||
| PCT/EP2016/081515 WO2017103162A1 (de) | 2015-12-18 | 2016-12-16 | Herstellung eines quarzglaskörpers in einem stehendem sintertiegel |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2019502632A JP2019502632A (ja) | 2019-01-31 |
| JP2019502632A5 true JP2019502632A5 (enExample) | 2020-01-23 |
Family
ID=54850380
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018530535A Pending JP2019502632A (ja) | 2015-12-18 | 2016-12-16 | 立設式焼結坩堝内での石英ガラス体の調製 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20190031554A1 (enExample) |
| EP (1) | EP3390300A1 (enExample) |
| JP (1) | JP2019502632A (enExample) |
| KR (1) | KR20180095617A (enExample) |
| CN (1) | CN108779014A (enExample) |
| TW (1) | TW201731781A (enExample) |
| WO (1) | WO2017103162A1 (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108698892A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 从二氧化硅颗粒制备石英玻璃体 |
| CN108698888A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在石英玻璃制备中作为中间物的经碳掺杂的二氧化硅颗粒的制备 |
| KR20180095619A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 실리카 유리 제조 동안 규소 함량의 증가 |
| CN108698894A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在多腔式烘箱中制备石英玻璃体 |
| CN108698890A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 利用在熔融烘箱中的露点监测制备石英玻璃体 |
| WO2017103153A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt |
| US11299417B2 (en) | 2015-12-18 | 2022-04-12 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a melting crucible of refractory metal |
| TWI808933B (zh) | 2015-12-18 | 2023-07-21 | 德商何瑞斯廓格拉斯公司 | 石英玻璃體、二氧化矽顆粒、光導、施照體、及成型體及其製備方法 |
| TWI733723B (zh) | 2015-12-18 | 2021-07-21 | 德商何瑞斯廓格拉斯公司 | 不透明石英玻璃體的製備 |
| KR20180095880A (ko) | 2015-12-18 | 2018-08-28 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 합성 석영 유리 결정립의 제조 |
| CN111495383B (zh) * | 2020-04-22 | 2023-03-10 | 陕西延长石油（集团）有限责任公司 | 一种己二醇与氨气制备己二胺的方法及催化剂 |
| EP4030204B1 (de) * | 2021-01-19 | 2023-09-20 | Heraeus Quarzglas GmbH & Co. KG | Mikrostrukturierte optische faser und vorform dafür |
| CN114146643B (zh) * | 2021-12-23 | 2023-09-15 | 成都瑞德琅科技有限公司 | 一种粉末涂料加工装置 |
| CN115124225A (zh) * | 2022-07-12 | 2022-09-30 | 上海强华实业股份有限公司 | 一种石英器件的处理方法 |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60260434A (ja) * | 1984-06-04 | 1985-12-23 | Shin Etsu Chem Co Ltd | 光伝送用無水ガラス素材の製造方法 |
| DE3815974C1 (enExample) * | 1988-05-10 | 1989-08-24 | Heraeus Quarzschmelze | |
| US5141786A (en) * | 1989-02-28 | 1992-08-25 | Shin-Etsu Chemical Co., Ltd. | Synthetic silica glass articles and a method for manufacturing them |
| DE4212099C2 (de) * | 1992-04-10 | 1994-07-21 | Heraeus Quarzglas | Verfahren und Vorrichtung zur Herstellung eines Verbundkörpers aus Glas |
| US6136736A (en) * | 1993-06-01 | 2000-10-24 | General Electric Company | Doped silica glass |
| JP3751326B2 (ja) * | 1994-10-14 | 2006-03-01 | 三菱レイヨン株式会社 | 高純度透明石英ガラスの製造方法 |
| EP1088789A3 (en) * | 1999-09-28 | 2002-03-27 | Heraeus Quarzglas GmbH & Co. KG | Porous silica granule, its method of production and its use in a method for producing quartz glass |
| DE19962451C1 (de) * | 1999-12-22 | 2001-08-30 | Heraeus Quarzglas | Verfahren für die Herstellung von opakem Quarzglas und für die Durchführung des Verfahrens geeignetes Si0¶2¶-Granulat |
| DE10019693B4 (de) * | 2000-04-20 | 2006-01-19 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Bauteils aus opakem, synthetischen Quarzglas, nach dem Verfahren hergestelltes Quarzglasrohr, sowie Verwendung desselben |
| US6632086B1 (en) * | 2000-05-22 | 2003-10-14 | Stanley M. Antczak | Quartz fusion crucible |
| US6739155B1 (en) * | 2000-08-10 | 2004-05-25 | General Electric Company | Quartz making an elongated fused quartz article using a furnace with metal-lined walls |
| JP2003192331A (ja) * | 2001-12-26 | 2003-07-09 | Shin Etsu Chem Co Ltd | 親水性シリカ微粉末及びその製造方法 |
| US20040118155A1 (en) * | 2002-12-20 | 2004-06-24 | Brown John T | Method of making ultra-dry, Cl-free and F-doped high purity fused silica |
| WO2005054139A1 (de) * | 2003-12-08 | 2005-06-16 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur herstellung von laseraktivem quarzglas und verwendung desselben |
| DE102004006017B4 (de) * | 2003-12-08 | 2006-08-03 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von laseraktivem Quarzglas und Verwendung desselben |
| JP4470479B2 (ja) * | 2003-12-17 | 2010-06-02 | 旭硝子株式会社 | 光学部材用合成石英ガラスおよびその製造方法 |
| WO2006015763A1 (de) * | 2004-08-02 | 2006-02-16 | Heraeus Quarzglas Gmbh & Co. Kg | Vertikal-tiegelziehverfahren zur herstellung eines glaskörpers mit hohem kieselsäuregehalt und vorrichtung zur durchführung des verfahrens |
| DE102004038602B3 (de) * | 2004-08-07 | 2005-12-29 | Heraeus Quarzglas Gmbh & Co. Kg | Elektrogeschmolzenes, synthetisches Quarzglas, insbesondere für den Einsatz in der Lampen- und in der Halbleiterfertigung und Verfahren zur Herstellung desselben |
| US7166963B2 (en) * | 2004-09-10 | 2007-01-23 | Axcelis Technologies, Inc. | Electrodeless lamp for emitting ultraviolet and/or vacuum ultraviolet radiation |
| US8211817B2 (en) * | 2006-09-11 | 2012-07-03 | Tosoh Corporation | Fused silica glass and process for producing the same |
| WO2009096557A1 (ja) * | 2008-01-30 | 2009-08-06 | Asahi Glass Co., Ltd. | エネルギー伝送用または紫外光伝送用光ファイバプリフォームおよびその製造方法 |
| DE102008033945B4 (de) * | 2008-07-19 | 2012-03-08 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von mit Stickstoff dotiertem Quarzglas sowie zur Durchführung des Verfahrens geeignete Quarzglaskörnung, Verfahren zur Herstellung eines Quarzglasstrangs und Verfahren zur Herstellung eines Quarzglastiegels |
| CN102859050B (zh) * | 2010-03-29 | 2015-07-15 | 住友电气工业株式会社 | 制造半导体单晶的方法 |
| JP5894409B2 (ja) * | 2011-10-24 | 2016-03-30 | 長州産業株式会社 | タングステン製品の製造方法 |
| WO2015137340A1 (ja) * | 2014-03-12 | 2015-09-17 | 株式会社アライドマテリアル | 坩堝およびそれを用いた単結晶サファイアの製造方法 |
| CN103925791B (zh) * | 2014-04-16 | 2015-09-02 | 嵩县开拓者钼业有限公司 | 一种真空加热炉 |
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2016
- 2016-12-16 JP JP2018530535A patent/JP2019502632A/ja active Pending
- 2016-12-16 CN CN201680082038.5A patent/CN108779014A/zh active Pending
- 2016-12-16 KR KR1020187020259A patent/KR20180095617A/ko not_active Withdrawn
- 2016-12-16 US US16/061,585 patent/US20190031554A1/en not_active Abandoned
- 2016-12-16 WO PCT/EP2016/081515 patent/WO2017103162A1/de not_active Ceased
- 2016-12-16 EP EP16815838.4A patent/EP3390300A1/de not_active Withdrawn
- 2016-12-16 TW TW105141907A patent/TW201731781A/zh unknown