JP2019503961A5 - - Google Patents

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Publication number
JP2019503961A5
JP2019503961A5 JP2018530538A JP2018530538A JP2019503961A5 JP 2019503961 A5 JP2019503961 A5 JP 2019503961A5 JP 2018530538 A JP2018530538 A JP 2018530538A JP 2018530538 A JP2018530538 A JP 2018530538A JP 2019503961 A5 JP2019503961 A5 JP 2019503961A5
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JP
Japan
Prior art keywords
chamber
melting
furnace
term
melting chamber
Prior art date
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Pending
Application number
JP2018530538A
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English (en)
Japanese (ja)
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JP2019503961A (ja
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Publication date
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Priority claimed from PCT/EP2016/081525 external-priority patent/WO2017103171A1/de
Publication of JP2019503961A publication Critical patent/JP2019503961A/ja
Publication of JP2019503961A5 publication Critical patent/JP2019503961A5/ja
Pending legal-status Critical Current

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JP2018530538A 2015-12-18 2016-12-16 石英ガラスの調製における二酸化ケイ素粉末のアンモニア処理 Pending JP2019503961A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP15201116.9 2015-12-18
EP15201116 2015-12-18
PCT/EP2016/081525 WO2017103171A1 (de) 2015-12-18 2016-12-16 Ammoniakbehandlung von siliziumdioxidpulver bei der herstellung von quarzglas

Publications (2)

Publication Number Publication Date
JP2019503961A JP2019503961A (ja) 2019-02-14
JP2019503961A5 true JP2019503961A5 (enExample) 2020-01-23

Family

ID=54850387

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018530538A Pending JP2019503961A (ja) 2015-12-18 2016-12-16 石英ガラスの調製における二酸化ケイ素粉末のアンモニア処理

Country Status (6)

Country Link
US (1) US20180370838A1 (enExample)
EP (1) EP3390301A1 (enExample)
JP (1) JP2019503961A (enExample)
CN (1) CN108698882A (enExample)
TW (1) TW201733930A (enExample)
WO (1) WO2017103171A1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180095880A (ko) 2015-12-18 2018-08-28 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 합성 석영 유리 결정립의 제조
KR20180095619A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 실리카 유리 제조 동안 규소 함량의 증가
CN108698890A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 利用在熔融烘箱中的露点监测制备石英玻璃体
WO2017103153A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt
TWI733723B (zh) 2015-12-18 2021-07-21 德商何瑞斯廓格拉斯公司 不透明石英玻璃體的製備
TWI808933B (zh) 2015-12-18 2023-07-21 德商何瑞斯廓格拉斯公司 石英玻璃體、二氧化矽顆粒、光導、施照體、及成型體及其製備方法
US11299417B2 (en) 2015-12-18 2022-04-12 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a quartz glass body in a melting crucible of refractory metal
CN108698892A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 从二氧化硅颗粒制备石英玻璃体
CN108698888A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在石英玻璃制备中作为中间物的经碳掺杂的二氧化硅颗粒的制备
CN108698894A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在多腔式烘箱中制备石英玻璃体
US11111172B2 (en) * 2016-11-30 2021-09-07 Corning Incorporated Basic additives for silica soot compacts and methods for forming optical quality glass
JP7567316B2 (ja) * 2020-09-23 2024-10-16 三菱ケミカル株式会社 造粒シリカ粉体及び造粒シリカ粉体の製造方法

Family Cites Families (21)

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US3043660A (en) * 1958-03-10 1962-07-10 British Titan Products Production of silicon dioxide
DE3320968A1 (de) * 1983-06-10 1984-12-13 Degussa Ag, 6000 Frankfurt Pyrogen hergestelltes siliciumdioxid, verfahren zu seiner herstellung und verwendung
JPS60260434A (ja) * 1984-06-04 1985-12-23 Shin Etsu Chem Co Ltd 光伝送用無水ガラス素材の製造方法
US5141786A (en) * 1989-02-28 1992-08-25 Shin-Etsu Chemical Co., Ltd. Synthetic silica glass articles and a method for manufacturing them
JPH05229839A (ja) * 1991-09-06 1993-09-07 Furukawa Electric Co Ltd:The 石英系ガラス成形体の製造方法
US6136736A (en) * 1993-06-01 2000-10-24 General Electric Company Doped silica glass
JP3152410B2 (ja) * 1994-04-14 2001-04-03 信越化学工業株式会社 合成石英ガラス部材の製造方法
JP3751326B2 (ja) * 1994-10-14 2006-03-01 三菱レイヨン株式会社 高純度透明石英ガラスの製造方法
JP2001089125A (ja) * 1999-09-28 2001-04-03 Shinetsu Quartz Prod Co Ltd 多孔質シリカ顆粒、その製造方法及び該多孔質シリカ顆粒を用いた合成石英ガラス粉の製造方法
DE10123950A1 (de) * 2001-05-17 2002-11-28 Degussa Granulate auf Basis von mittels Aerosol mit Aluminiumoxid dotiertem, pyrogen hergestelltem Siliziumdioxid, Verfahren zu ihrer Herstellung und ihre Verwendung
US20040118155A1 (en) * 2002-12-20 2004-06-24 Brown John T Method of making ultra-dry, Cl-free and F-doped high purity fused silica
DE10329806A1 (de) * 2003-04-09 2004-10-21 Silicaglas Ilmenau Gmbh Verfahren und Vorrichtungen zur Herstellung von Kieselglasgranulaten mit definierten Formen der Granalien
JP2005170706A (ja) * 2003-12-09 2005-06-30 Tosoh Corp 紫外線吸収合成石英ガラス及びその製造方法
JP4470479B2 (ja) * 2003-12-17 2010-06-02 旭硝子株式会社 光学部材用合成石英ガラスおよびその製造方法
DE102004038602B3 (de) * 2004-08-07 2005-12-29 Heraeus Quarzglas Gmbh & Co. Kg Elektrogeschmolzenes, synthetisches Quarzglas, insbesondere für den Einsatz in der Lampen- und in der Halbleiterfertigung und Verfahren zur Herstellung desselben
US7166963B2 (en) * 2004-09-10 2007-01-23 Axcelis Technologies, Inc. Electrodeless lamp for emitting ultraviolet and/or vacuum ultraviolet radiation
EP1700828A1 (en) * 2005-03-09 2006-09-13 Degussa AG Method for producing ultra-high purity, optical quality, glass articles
EP1717202A1 (en) * 2005-04-29 2006-11-02 Degussa AG Sintered silicon dioxide materials
US8211817B2 (en) * 2006-09-11 2012-07-03 Tosoh Corporation Fused silica glass and process for producing the same
DE102007017004A1 (de) * 2007-02-27 2008-08-28 Heraeus Quarzglas Gmbh & Co. Kg Optisches Bauteil aus synthetischem Quarzglas mit erhöhter Strahlenbeständigkeit, sowie Verfahren zur Herstellung des Bauteils
WO2009096557A1 (ja) * 2008-01-30 2009-08-06 Asahi Glass Co., Ltd. エネルギー伝送用または紫外光伝送用光ファイバプリフォームおよびその製造方法

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