JP2019502634A5 - - Google Patents

Download PDF

Info

Publication number
JP2019502634A5
JP2019502634A5 JP2018530537A JP2018530537A JP2019502634A5 JP 2019502634 A5 JP2019502634 A5 JP 2019502634A5 JP 2018530537 A JP2018530537 A JP 2018530537A JP 2018530537 A JP2018530537 A JP 2018530537A JP 2019502634 A5 JP2019502634 A5 JP 2019502634A5
Authority
JP
Japan
Prior art keywords
chamber
melting
furnace
term
melting chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2018530537A
Other languages
English (en)
Japanese (ja)
Other versions
JP2019502634A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2016/081523 external-priority patent/WO2017103170A1/de
Publication of JP2019502634A publication Critical patent/JP2019502634A/ja
Publication of JP2019502634A5 publication Critical patent/JP2019502634A5/ja
Pending legal-status Critical Current

Links

Images

JP2018530537A 2015-12-18 2016-12-16 石英ガラス調製時の二酸化ケイ素粉末の蒸気処理 Pending JP2019502634A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP15201111.0 2015-12-18
EP15201111 2015-12-18
PCT/EP2016/081523 WO2017103170A1 (de) 2015-12-18 2016-12-16 Wasserdampfbehandlung von siliziumdioxidpulver bei der herstellung von quarzglas

Publications (2)

Publication Number Publication Date
JP2019502634A JP2019502634A (ja) 2019-01-31
JP2019502634A5 true JP2019502634A5 (enExample) 2020-01-23

Family

ID=54850385

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018530537A Pending JP2019502634A (ja) 2015-12-18 2016-12-16 石英ガラス調製時の二酸化ケイ素粉末の蒸気処理

Country Status (6)

Country Link
US (1) US20190062194A1 (enExample)
EP (1) EP3390309A1 (enExample)
JP (1) JP2019502634A (enExample)
CN (1) CN108698884A (enExample)
TW (1) TW201733932A (enExample)
WO (1) WO2017103170A1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI794150B (zh) 2015-12-18 2023-03-01 德商何瑞斯廓格拉斯公司 自二氧化矽顆粒製備石英玻璃體
TWI813534B (zh) 2015-12-18 2023-09-01 德商何瑞斯廓格拉斯公司 利用露點監測在熔融烘箱中製備石英玻璃體
CN108698887B (zh) 2015-12-18 2022-01-21 贺利氏石英玻璃有限两合公司 由均质石英玻璃制得的玻璃纤维和预成形品
WO2017103125A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas
TWI720090B (zh) 2015-12-18 2021-03-01 德商何瑞斯廓格拉斯公司 於石英玻璃之製備中作為中間物之經碳摻雜二氧化矽顆粒的製備
JP6881776B2 (ja) 2015-12-18 2021-06-02 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 不透明石英ガラス体の調製
WO2017103124A2 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Erhöhen des siliziumgehalts bei der herstellung von quarzglas
WO2017103115A2 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung eines quarzglaskörpers in einem schmelztiegel aus refraktärmetall
WO2017103166A2 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung eines quarzglaskörpers in einem mehrkammerofen
TWI794149B (zh) 2015-12-18 2023-03-01 德商何瑞斯廓格拉斯公司 石英玻璃粉粒、不透明成型體及彼等之製備方法
WO2021013876A1 (de) * 2019-07-24 2021-01-28 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur herstellung einer siliziumoxidsuspension
EP4030204B1 (de) * 2021-01-19 2023-09-20 Heraeus Quarzglas GmbH & Co. KG Mikrostrukturierte optische faser und vorform dafür

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1642994A1 (de) * 1967-01-21 1971-06-03 Degussa Verfahren zum Reinigen von hochdispersen Oxiden
JPS60260434A (ja) * 1984-06-04 1985-12-23 Shin Etsu Chem Co Ltd 光伝送用無水ガラス素材の製造方法
JPS62246834A (ja) * 1986-04-17 1987-10-28 Mitsubishi Cable Ind Ltd 光フアイバ母材の製造方法
US5141786A (en) * 1989-02-28 1992-08-25 Shin-Etsu Chemical Co., Ltd. Synthetic silica glass articles and a method for manufacturing them
US6136736A (en) * 1993-06-01 2000-10-24 General Electric Company Doped silica glass
JP3751326B2 (ja) * 1994-10-14 2006-03-01 三菱レイヨン株式会社 高純度透明石英ガラスの製造方法
US5855860A (en) * 1994-10-27 1999-01-05 Shin-Etsu Chemical Co., Ltd. Method for porifying fine particulate silica
JP3546494B2 (ja) * 1994-10-27 2004-07-28 信越化学工業株式会社 微細シリカの精製法
JP2001220157A (ja) * 2000-02-01 2001-08-14 Tosoh Corp 非晶質合成シリカ粉体及びこれを用いたガラス成形体
DE10123950A1 (de) * 2001-05-17 2002-11-28 Degussa Granulate auf Basis von mittels Aerosol mit Aluminiumoxid dotiertem, pyrogen hergestelltem Siliziumdioxid, Verfahren zu ihrer Herstellung und ihre Verwendung
US20040118155A1 (en) * 2002-12-20 2004-06-24 Brown John T Method of making ultra-dry, Cl-free and F-doped high purity fused silica
JP4470479B2 (ja) * 2003-12-17 2010-06-02 旭硝子株式会社 光学部材用合成石英ガラスおよびその製造方法
US7166963B2 (en) * 2004-09-10 2007-01-23 Axcelis Technologies, Inc. Electrodeless lamp for emitting ultraviolet and/or vacuum ultraviolet radiation
EP1700828A1 (en) * 2005-03-09 2006-09-13 Degussa AG Method for producing ultra-high purity, optical quality, glass articles
EP1700824A1 (en) * 2005-03-09 2006-09-13 Degussa AG Granules based on pyrogenically prepared silicon dioxide, method for their preparation and use thereof
EP1717202A1 (en) * 2005-04-29 2006-11-02 Degussa AG Sintered silicon dioxide materials
JP2006335577A (ja) * 2005-05-31 2006-12-14 Shinetsu Quartz Prod Co Ltd 高透過性エキシマｕｖランプ用合成石英ガラス管およびその製造方法
DE102006039273A1 (de) * 2006-08-22 2008-02-28 Evonik Degussa Gmbh Pyrogenes Siliciumdioxid zur Verwendung als Hilfsstoff in pharmazeutischen und kosmetischen Zusammensetzungen
JP5529369B2 (ja) * 2006-09-11 2014-06-25 東ソー株式会社 熔融石英ガラスおよびその製造方法
WO2009096557A1 (ja) * 2008-01-30 2009-08-06 Asahi Glass Co., Ltd. エネルギー伝送用または紫外光伝送用光ファイバプリフォームおよびその製造方法

Similar Documents

Publication Publication Date Title
JP2019502634A5 (enExample)
JP2019503961A5 (enExample)
JP2019502630A5 (enExample)
JP2019503962A5 (enExample)
JP2019502642A5 (enExample)
JP2019502636A5 (enExample)
JP2019504810A5 (enExample)
JP2019502631A5 (enExample)
JP2019502638A5 (enExample)
JP2019502632A5 (enExample)
UA116770C2 (uk) Електронний виріб
CY1112421T1 (el) Εγκατασταση καμινου για συνεχη αναμειξη και τηξη ανοργανων αλατων
JP2012211079A5 (enExample)
EP3405737A4 (en) SURFACE ARRANGEMENT FOR A HEAT EXCHANGER, HEAT EXCHANGER WITH THE SURFACE ARRANGEMENT, LIQUID HEATING SYSTEM THEREWITH AND METHOD FOR THE PRODUCTION THEREOF
JP2019527805A5 (enExample)
PH12013501957A1 (en) Glass furnace, in particular for clear or ultra-clear glass, with lateral secondary recirculations
JP2017523307A5 (enExample)
FR3043411B1 (fr) Revetement ceramique multicouche de protection thermique a haute temperature, notamment pour application aeronautique, et son procede de fabrication
PL3710767T3 (pl) Piec wysokotemperaturowy, zastosowanie pieca wysokotemperaturowego i sposób bezemisyjnego ogrzewania w wysokiej temperaturze w piecu wysokotemperaturowym
MX2019000111A (es) Proceso para precalentar un fluido corriente arriba de un horno.
JP2015131959A5 (enExample)
FI20165714A (fi) Menetelmä ja laitteisto kiukaan ohjaamiseksi
PL419371A1 (pl) Sposób przepływu i podgrzewania powietrza do paleniska oraz podgrzewacz powietrza
CN105066721B (zh) 一种铸石熔化冲天炉余热利用装置
WO2015156749A3 (en) A heating system