JP2019502634A5 - - Google Patents

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Publication number
JP2019502634A5
JP2019502634A5 JP2018530537A JP2018530537A JP2019502634A5 JP 2019502634 A5 JP2019502634 A5 JP 2019502634A5 JP 2018530537 A JP2018530537 A JP 2018530537A JP 2018530537 A JP2018530537 A JP 2018530537A JP 2019502634 A5 JP2019502634 A5 JP 2019502634A5
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JP
Japan
Prior art keywords
chamber
melting
furnace
term
melting chamber
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Pending
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JP2018530537A
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English (en)
Japanese (ja)
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JP2019502634A (ja
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Priority claimed from PCT/EP2016/081523 external-priority patent/WO2017103170A1/de
Publication of JP2019502634A publication Critical patent/JP2019502634A/ja
Publication of JP2019502634A5 publication Critical patent/JP2019502634A5/ja
Pending legal-status Critical Current

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JP2018530537A 2015-12-18 2016-12-16 石英ガラス調製時の二酸化ケイ素粉末の蒸気処理 Pending JP2019502634A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP15201111 2015-12-18
EP15201111.0 2015-12-18
PCT/EP2016/081523 WO2017103170A1 (de) 2015-12-18 2016-12-16 Wasserdampfbehandlung von siliziumdioxidpulver bei der herstellung von quarzglas

Publications (2)

Publication Number Publication Date
JP2019502634A JP2019502634A (ja) 2019-01-31
JP2019502634A5 true JP2019502634A5 (enExample) 2020-01-23

Family

ID=54850385

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018530537A Pending JP2019502634A (ja) 2015-12-18 2016-12-16 石英ガラス調製時の二酸化ケイ素粉末の蒸気処理

Country Status (6)

Country Link
US (1) US20190062194A1 (enExample)
EP (1) EP3390309A1 (enExample)
JP (1) JP2019502634A (enExample)
CN (1) CN108698884A (enExample)
TW (1) TW201733932A (enExample)
WO (1) WO2017103170A1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180095880A (ko) 2015-12-18 2018-08-28 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 합성 석영 유리 결정립의 제조
KR20180095619A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 실리카 유리 제조 동안 규소 함량의 증가
CN108698890A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 利用在熔融烘箱中的露点监测制备石英玻璃体
WO2017103153A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt
TWI733723B (zh) 2015-12-18 2021-07-21 德商何瑞斯廓格拉斯公司 不透明石英玻璃體的製備
TWI808933B (zh) 2015-12-18 2023-07-21 德商何瑞斯廓格拉斯公司 石英玻璃體、二氧化矽顆粒、光導、施照體、及成型體及其製備方法
US11299417B2 (en) 2015-12-18 2022-04-12 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a quartz glass body in a melting crucible of refractory metal
CN108698892A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 从二氧化硅颗粒制备石英玻璃体
CN108698888A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在石英玻璃制备中作为中间物的经碳掺杂的二氧化硅颗粒的制备
CN108698894A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在多腔式烘箱中制备石英玻璃体
CN114423710B (zh) * 2019-07-24 2023-12-22 贺利氏石英玻璃有限两合公司 用于制备二氧化硅悬浮液的方法
EP4030204B1 (de) * 2021-01-19 2023-09-20 Heraeus Quarzglas GmbH & Co. KG Mikrostrukturierte optische faser und vorform dafür

Family Cites Families (20)

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Publication number Priority date Publication date Assignee Title
DE1642994A1 (de) * 1967-01-21 1971-06-03 Degussa Verfahren zum Reinigen von hochdispersen Oxiden
JPS60260434A (ja) * 1984-06-04 1985-12-23 Shin Etsu Chem Co Ltd 光伝送用無水ガラス素材の製造方法
JPS62246834A (ja) * 1986-04-17 1987-10-28 Mitsubishi Cable Ind Ltd 光フアイバ母材の製造方法
US5141786A (en) * 1989-02-28 1992-08-25 Shin-Etsu Chemical Co., Ltd. Synthetic silica glass articles and a method for manufacturing them
US6136736A (en) * 1993-06-01 2000-10-24 General Electric Company Doped silica glass
JP3751326B2 (ja) * 1994-10-14 2006-03-01 三菱レイヨン株式会社 高純度透明石英ガラスの製造方法
US5855860A (en) * 1994-10-27 1999-01-05 Shin-Etsu Chemical Co., Ltd. Method for porifying fine particulate silica
JP3546494B2 (ja) * 1994-10-27 2004-07-28 信越化学工業株式会社 微細シリカの精製法
JP2001220157A (ja) * 2000-02-01 2001-08-14 Tosoh Corp 非晶質合成シリカ粉体及びこれを用いたガラス成形体
DE10123950A1 (de) * 2001-05-17 2002-11-28 Degussa Granulate auf Basis von mittels Aerosol mit Aluminiumoxid dotiertem, pyrogen hergestelltem Siliziumdioxid, Verfahren zu ihrer Herstellung und ihre Verwendung
US20040118155A1 (en) * 2002-12-20 2004-06-24 Brown John T Method of making ultra-dry, Cl-free and F-doped high purity fused silica
JP4470479B2 (ja) * 2003-12-17 2010-06-02 旭硝子株式会社 光学部材用合成石英ガラスおよびその製造方法
US7166963B2 (en) * 2004-09-10 2007-01-23 Axcelis Technologies, Inc. Electrodeless lamp for emitting ultraviolet and/or vacuum ultraviolet radiation
EP1700828A1 (en) * 2005-03-09 2006-09-13 Degussa AG Method for producing ultra-high purity, optical quality, glass articles
EP1700824A1 (en) * 2005-03-09 2006-09-13 Degussa AG Granules based on pyrogenically prepared silicon dioxide, method for their preparation and use thereof
EP1717202A1 (en) * 2005-04-29 2006-11-02 Degussa AG Sintered silicon dioxide materials
JP2006335577A (ja) * 2005-05-31 2006-12-14 Shinetsu Quartz Prod Co Ltd 高透過性エキシマｕｖランプ用合成石英ガラス管およびその製造方法
DE102006039273A1 (de) * 2006-08-22 2008-02-28 Evonik Degussa Gmbh Pyrogenes Siliciumdioxid zur Verwendung als Hilfsstoff in pharmazeutischen und kosmetischen Zusammensetzungen
US8211817B2 (en) * 2006-09-11 2012-07-03 Tosoh Corporation Fused silica glass and process for producing the same
WO2009096557A1 (ja) * 2008-01-30 2009-08-06 Asahi Glass Co., Ltd. エネルギー伝送用または紫外光伝送用光ファイバプリフォームおよびその製造方法

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